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1. Evaluation and Solutions for P/E Window Instability Induced by Electron Trapping in High- $\kappa$ Intergate Dielectrics of Flash Memory Cells.

2. Read and Pass Disturbance in the Programmed States of Floating Gate Flash Memory Cells With High-\kappa Interpoly Gate Dielectric Stacks.

3. A Comprehensive Understanding of the Erase of TANOS Memories Through Charge Separation Experiments and Simulations.

4. Electron Trapping in HfAlO High-\kappa Stack for Flash Memory Applications: An Origin of Vth Window Closure During Cycling Operations.

5. Fast VTH Transients After the Program/Erase of Flash Memory Stacks With High-k Dielectrics.

6. Applying Complementary Trap Characterization Technique to Crystalline \gamma-Phase-\Al2 \O3 for Improved Understanding of Nonvolatile Memory Operation and Reliability.

7. A New Multipulse Technique for Probing Electron Trap Energy Distribution in High- \kappa Materials for Flash Memory Application.

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