1. Improvement of the Effective Spin Hall Angle by Inserting an Interfacial Layer in Sputtered BiSb Topological Insulator (Bottom)/Ferromagnet With In-Plane Magnetization
- Author
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M. Ho, H. Takano, S. Le, Pham Nam Hai, C. Hwang, J. Sasaki, Quang Le, N. H. D. Khang, Brian R. York, H. H. Huy, and X. Liu
- Subjects
Magnetization ,Materials science ,Ferromagnetism ,Condensed matter physics ,Electrical resistivity and conductivity ,Topological insulator ,Spin Hall effect ,Sapphire ,Condensed Matter::Strongly Correlated Electrons ,Electrical and Electronic Engineering ,Sputter deposition ,Electronic, Optical and Magnetic Materials ,Spin-½ - Abstract
The topological insulator BiSb is promising for spin-orbit torque applications thanks to its high electrical conductivity and giant spin Hall effect. Previous works have reported a large spin Hall angle for BiSb deposited on top of a ferromagnetic layer (FM) with perpendicular magnetic anisotropy. However, since BiSb has large surface roughness, obtaining a large spin Hall angle in BiSb (bottom)/FM is more challenging than in FM/BiSb(top) structures, especially when the FM layer is very thin. Here, we investigate the role of an interfacial layer on the effective spin Hall angle in BiSb (bottom)/FM with in-plane magnetization deposited by magnetron sputtering on sapphire substrates. We showed that inserting an interfacial layer with optimized thickness helps improve the effective spin Hall angle. We achieved a relatively high effective spin Hall angle of 1.7 in BiSb (bottom)/Ru 1 nm/ Co 1 nm/ Pt 1 nm structure.
- Published
- 2022
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