Search

Ultrafast carrier thermalization in n-type indium nitride (InN) with an electron concentration of 3.8×1018 cm-3 was investigated by femtosecond transient transmission measurements at room temperature with different wavelengths. An extremely fast carrier external thermalization time on the order of 400 fs was observed, which is much faster than all previous reports. This observed femtosecond thermalization time is consistent with a prediction based on a Coulomb screening effect. Through wavelength dependent and power dependent studies, even with a 400 fs thermalization time, we did not observe any evidence of the existence of the hot phonon effect, which agrees with a recent report that a longitudinal optical phonon lifetime could be shorter than 300 fs in specific InN samples. [ABSTRACT FROM AUTHOR]

Carrier thermalization dynamics in heavily doped n-type InN was investigated at room temperature with a femtosecond transient transmission measurement. The dependence of hot carrier cooling time on the total electron density indicates that the plasma screening of electron-LO phonon interactions is responsible for the reduction in energy-loss rate. Under low excitation, the carriers with different excess energies can be found to cool down with a fixed thermalization time of 1.4 ps. Intensity dependent study suggests that this relatively slow carrier cooling time could be attributed to the screening effect by high-background-doping plasma rather than the hot phonon effect. [ABSTRACT FROM AUTHOR]