1. Boron-Doped Diamond MOSFETs With High Output Current and Extrinsic Transconductance.
- Author
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Liu, Jiangwei, Teraji, Tokuyuki, Da, Bo, and Koide, Yasuo
- Subjects
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METAL oxide semiconductor field-effect transistors , *FIELD-effect transistors , *EPITAXIAL layers , *DIAMONDS , *STRAY currents , *METAL oxide semiconductor capacitors , *THERMAL stability - Abstract
Boron-doped diamond (B-diamond) metal–oxide–semiconductor (MOS) capacitor and MOS field-effect transistor (MOSFET) are fabricated on a flat diamond epitaxial layer. Their electrical properties and thermal stabilities after annealing at 500 °C are investigated. Annealing makes the leakage current density of the B-diamond MOS capacitor increase slightly. There is a larger stretch-out for the capacitance-voltage curve in the depletion region after annealing than that before annealing. The drain-current maxima for the as-fabricated and 500 °C-annealed MOSFETs are obtained as −0.49 and −0.60 mA/mm, respectively. Extrinsic transconductance maxima are 18.7 and $21.4~\mu \text{S}$ /mm, respectively. These obtained values are considerably larger than those obtained by the previously reported B-diamond MOSFETs. [ABSTRACT FROM AUTHOR]
- Published
- 2021
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