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Fused silica has become the preferred optical material in the field of inertial confinement fusion (ICF) due to its excellent performance; however, these costly optical elements are vulnerable, and their manufacture is time-consuming. Therefore, the restoration of laser-induced damage for these optical elements is of great value. To restrain the post-restoration raised rim problem in the CO2 laser repair process to improve the restoration quality, the separate influences of key parameters of laser power, irradiation duration, and laser beam diameter on post-restoration pit morphology are compared in combined simulation and experimental studies. An optimized, patterned CO2 laser strategy is proposed and verified; the results indicate that, with the strategy, the rim height decreases from 2.6 μm to 1.52 μm, and maximal photo thermal absorption is decreased from 784.2 PPM to 209.43 PPM. [ABSTRACT FROM AUTHOR]

There are strict requirements on the surface-shape accuracy, cracks, scratches, and subsurface damage of photomask glass substrates with the advancement of photo-etching technology. In this study, photomask quartz glass substrates were etched with the hydrofluoric (HF) acid etching method after chemical mechanical polishing (CMP), so that the polishing hydrolysis layer could be completely removed. In addition, the surface scratches caused by CMP were observed with a surface quality detection device and a white light interferometer. Second, the high-efficiency array-type magnetorheological polishing technology was employed to eliminate the surface-shape error on the surface of quartz photomask glass substrates. Finally, the removal function rotation angle based magnetorheological polishing technology was utilized to evenly remove the mid-frequency ripples and scratches caused in the preceding technological process. The experimental results demonstrated that these technologies can be used to realize rapid damage removal and high-quality processing of photomask glass substrates. [ABSTRACT FROM AUTHOR]

In the high-power laser system, the mid-spatial frequency error of the surface of the high-power laser component will affect the normal operation of the high-power laser system. In order to improve the mid-spatial frequency error of the high-power laser component after magnetorheological finishing, the causes and influencing factors of the ribbon fluctuation in magnetorheological finishing are studied, and the influence of different ribbon fluctuation on the mid-spatial frequency error of the surface is studied. Firstly, the influence of different ribbon fluctuations on the mid-spatial frequency error of the machined surface is simulated by a computer. Secondly, the magnetic field in the circumferential direction of the polishing wheel, the fluctuation amount and frequency of the magnetorheological polishing ribbon are measured, and then the causes of the fluctuation of the magnetorheological polishing ribbon are analyzed. Moreover, through the principle of a single variable, the influence of process parameters on the fluctuation of magnetorheological polishing ribbon is explored. Finally, the fused silica component is scanned uniformly under the process parameters of magnetorheological polishing ribbon fluctuation of 40 μm, 80 μm, 150 μm, and 200 μm. The experimental results show that the greater the ribbon fluctuation, the greater the surface mid-spatial frequency error of the component, and the ribbon fluctuation is approximately linear with the RMS of the PSD2 in the mid-spatial frequency band on the surface of the component. Therefore, the fluctuation of the ribbon can be controlled by controlling the magnetorheological processing parameters, and the mid-spatial frequency band error on the surface of the high-power laser component can be significantly reduced by optimizing process parameters after magnetorheological finishing. [ABSTRACT FROM AUTHOR]

The magnetorheological (MR) repair method can effectively repair the small-scale damage of fused silica optics and further improve the laser-induced damage threshold of fused silica optics. However, at present, the rules of MR repair of small-scale damage of fused silica are not clear and cannot provide further guidance for the repair process. In this paper, the fused silica damage samples were repaired layer by layer by the MR method. The number and size changes of all the surface damage, the morphology, the fluorescence area distribution, and photothermal-absorption value of a single typical small-scale damage were measured. Through dark field scattering imaging, it is found that when the repair depth is 5 μm, the repair completion rate of damage with a transverse size less than 50 μm can reach 44%, and the repair efficiency decreases gradually with the repair process. Focusing on the whole repair process of a single typical, small-scale damage—due to the flexible shear removal mechanism of the MR method—the repair process of damage can be divided into three stages, which as a whole is a top-down, from outside to inside process. The first stage is the process of removing the surface of the damage layer by layer. In this process, MR fluid will introduce pollution to the inside of the damage. In the second stage, MR fluid begins to repair the inside of the damage. In the third stage, the MR ribbon completely covers the inside of the damage, and the repair effect is the most obvious. The measurement results of photothermal absorption and fluorescence area distribution of damage confirm this process. The photothermal absorption value and fluorescence area distribution of damage do not simply decrease with the repair process. On the contrary, they gradually increase first, and then decrease significantly when the damage depth reaches less than 1 μm. As the thickness of the MR ribbon is 1 μm, the reduction in the photothermal absorption value and fluorescence area of the damage is due to the process of repairing the inside of the damage. The results show that the absorbent impurities inside the small-scale damage of fused silica are the main factor affecting the performance. The key to repairing the small-scale damage of fused silica by the MR method is that the damaged interior must be repaired effectively. This paper outlines the MR repair method of small-scale damage of fused silica, which is of great significance to optimize the MR repair process. [ABSTRACT FROM AUTHOR]

• The phenomena of laser energy deposition and light-field enhancement caused by ripple structures was cleared through FEM simulation. • A combined technique of low–stress CCOS and IBF was used to polishing ripple–structure optical surface, and its suitability was verified for fused silica laser optics. • The changes of anti-laser damage characteristics at different processing stage were studied. The correlation between processing parameters, photo-thermal absorption, laser induced damage threshold was cleared. In AMRF (arrayed magnetorheological finishing) process of fused silica laser optics, ripple structures would generate on the optical surface. The ripple structures could cause nonlinear self-focusing and localized energy deposition, finally induced laser damage. In this work, the removal of ripple structures and the improvement of anti-laser damage characteristics were studied. First, the heat deposition and light-field enhancement induced by ripple structures were analyzed by finite element simulation method, and the negative impact of ripple structures was clarified. Then, the ripple-structure surface was polished by a combined technique of low-stress CCOS (computer control optical surfacing) and ion beam finishing (IBF). After the combined polishing process, the ripple structures and the hydrolyzed layer on the surface were removed, the photo-thermal absorption decreased from 0.736 ppm to 0.124 ppm, and the laser induced damage threshold (LIDT) increased from 6.3 J/cm2 to 7.4 J/cm2. In this work, the combined technique was able to remove the ripple structures while maintaining the processing efficiency, and it also could improve the anti-laser damage characteristics of the optics. The relative research results had important reference value for ultra-precision manufacturing of large-aperture laser optics. [ABSTRACT FROM AUTHOR]