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Al2O3–AlGaN/GaN metal–insulator–semiconductor high-electron-mobility transistors (MIS-HEMTs) featuring indium tin oxide transparent gate electrode are fabricated for the purpose of evaluating the gate reliability. The transparent gate electrode allows electroluminescence (EL) observation in the region directly under the gate, which cannot be performed in conventional MIS-HEMTs with opaque gate electrode. Normally OFF transparent-gate MIS-HEMTs were realized by implanting fluorine ions into the AlGaN barrier prior to the deposition of Al2O3. The dependence of EL on bias condition was investigated with the color of EL resolved by filters. Gate dielectric degradation in MIS-HEMTs was induced by OFF state drain-bias stress, as detected by the increased gate leakage current. Location of the gate degradation could be clearly identified by EL imaging through the transparent gate. From the EL image, the passivation layer under the overhang of T-shaped gate is found to be vulnerable to OFF-state stress, which is confirmed by simulation. [ABSTRACT FROM AUTHOR]

In this paper, a surface potential-based terminal charge and capacitance model, including parasitic components for AlGaN/GaN HEMTs is developed. First, by solving the charge control equations, the sheet charge density in the channel is modeled with a close-form expression. Then, using this result, based on the surface potential definition, the intrinsic terminal charges and capacitances are derived consistently with current model. Finally, by introducing parasitic components, the capacitances for the full structure of the HEMT devices are given. The model is evaluated step-by-step with good agreements compared with the TCAD simulations and the experimental data. Meanwhile, the effects of bulk traps and surface traps in the capacitances are analyzed. The complete model, including currents and capacitances has been implemented in i-MOS platform for evaluations and circuit simulations. [ABSTRACT FROM PUBLISHER]