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Micromirror based spatial light modulators (SLMs) developed by the Fraunhofer Institute for Photonic Microsystems are well established in microlithography applications. Serving, e.g., as reflective, programmable photomasks in deep-UV mask writers, they enable highly flexible pattern generation. During operation, the micromirror bow significantly impacts contrast and the resolvable feature size of generated patterns. In some situations, MEMS micromirrors tend to change their bow during laser irradiation. A test regime including a characterization unit for the in situ analysis of MEMS micromirror topology has been developed to measure the bow change under various irradiation conditions. Experiments in which SLMs were irradiated by a 1-kHz, 248-nm pulse laser revealed that mirror bowing can occur in both directions (concave and convex). The bowing direction is dependent upon the applied irradiation parameters such as pulse-energy density, pulse number, and the deposited energy. Sustained irradiation at energy densities exceeding a certain limit can potentially become a limiting factor for the resolvable feature sizes of the patterns generated and, therefore, for the usable SLM lifespan.