1. Microstructure evolution in carbon-ion implanted sapphire.
- Author
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Orwa, J. O., Peng, J. L., McCallum, J. C., Jamieson, D. N., Rubanov, S., and Prawer, S.
- Subjects
PHYSICS research ,SAPPHIRES ,ION implantation ,ION bombardment ,NANOSTRUCTURED materials ,SEMICONDUCTOR industry - Abstract
Carbon ions of MeV energy were implanted into sapphire to fluences of 1×10
17 or 2×1017 cm-2 and thermally annealed in forming gas (4% H in Ar) for 1 h. Secondary ion mass spectroscopy results obtained from the lower dose implant showed retention of implanted carbon and accumulation of H near the end of range in the C implanted and annealed sample. Three distinct regions were identified by transmission electron microscopy of the implanted region in the higher dose implant. First, in the near surface region, was a low damage region (L1 ) composed of crystalline sapphire and a high density of plateletlike defects. Underneath this was a thin, highly damaged and amorphized region (L2 ) near the end of range in which a mixture of i-carbon and nanodiamond phases are present. Finally, there was a pristine, undamaged sapphire region (L3 ) beyond the end of range. In the annealed sample some evidence of the presence of diamond nanoclusters was found deep within the implanted layer near the projected range of the C ions. These results are compared with our previous work on carbon implanted quartz in which nanodiamond phases were formed only a few tens of nanometers from the surface, a considerable distance from the projected range of the ions, suggesting that significant out diffusion of the implanted carbon had occurred. [ABSTRACT FROM AUTHOR]- Published
- 2010
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