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Routinely, in membrane technology, the decay from radioactive particles or the bombardment of ions with MeV energy per nucleon have been employed for the production of narrow and long pores in membranes. Presently, the ion lithography is proposed to make the fabrication cost more affordable. It is prospective for the use of medium capacity accelerators making more feasible the fabrication of customized membranes. Thin polyethylene terephthalate foils have been patterned using 12 MeV O5+ ions and then processed to obtain good aspect ratio ion track pores in membranes. Pores of micrometric diameter with the following profiles were fabricated in the membranes: truncated cone, double conical, ideal cone, and cylindrical. Monitoring of the shape and size of pores has been attempted with a combination of Scanning Transmission Ion Microscope and a newly designed simulation program. This study is focused on the use of low-energy ions, accomplished in all laboratories, for the fabrication of membranes where the pores are not randomly traced and exhibit higher surface density and negligible overlapping than in membranes commonly manufactured. The good reproducibility and the ordered pore locations can be potentially utilized in applications such as microfluidics and organ-on-chip microsystems, where cells growing over porous substrates are used in simulation of biological barriers and transport processes. [ABSTRACT FROM AUTHOR]

Abstract: Fast heavy ion beam-based lithography using masks of self-assembled materials has been applied for transferring well-ordered nano- and micropatterns to rutile TiO2 single crystals. As the induced damage has a high etching selectivity the patterns can be developed in hydrofluoric acid with very high-contrast. Here we present resulting patterns when using a mask of self-ordered silica spheres. The obtained pattern are replicas of the mass distribution of the mask. In addition the shape and size of the regular structures depend on the applied ion energy and fluence. Direct modifications of the optical properties of TiO2 in a well-defined pattern are also presented. [Copyright &y& Elsevier]

Ordered nanoporous alumina samples with a pore diameter of 70 nm, an array period of 100 nm and several thicknesses were considered as possible masks for pattern transfer by MeV ion lithography. A simple procedure for the sample alignment using a 2 MeV He+ beam was utilized. The energy distributions of transmitted ions as well as backscattering spectra were studied in aligned and non-aligned orientations. The best transmission, comparable to the relative surface area covered by pores, was reached for 2 μm thick samples and was independent on ion species. Although the transmission for thicker membranes was generally lower, it significantly depended on the quality of each individual sample. The presented ion beam technique can therefore be used as a tool for the characterization of porous materials. The acceptance angle for transmission through pores and the effective atomic density of samples can be obtained from the experimental data and it is shown that nanoporous alumina can be used as a mask for MeV ion lithography. [Copyright &y& Elsevier]