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In practical terms, those plasmas produced by a DC voltage power supply do not attain densities above the 108 to 109 cm-3 band. Here we present a power supply, controlled in current and voltage, which has been successfully designed and constructed delivering plasma densities in the orders of 109 – 1010 cm-3. Its experimental performance test was conducted within one toroidal and one cylindrical chambers capable of 29 and 35 litres, respectively, using nitrogen gas. The DC plasma was characterized by a double electric probe. Several physical phenomena present in the PIII process have been keenly investigated including plasma sheath dynamics, interaction of plasma and surface, etc. In this paper we analyze the effect of the implantation voltage, plasma density and pulse time in the PIII average heating power and fluence density. © 2006 American Institute of Physics [ABSTRACT FROM AUTHOR]

Conventional wisdom assigns the DC glow discharge regime to plasma currents below ∼500 mA values, beyond which the discharge falls into the anomalous glow and the turbulent arc regimes. However, we have found evidence that, during toroidal discharges, this barrier can be ostensibly extended up to 800 mA. Thus, a computer simulation has been applied to the evolution of the main electrical characteristics of such a glow discharge plasma in a toroidal vessel in order to design and construct a respective voltage/current controlled source. This should be able to generate a DC plasma in the glow regime with which currents in the range 10-3–100 A can be experimented and 109–1010 cm-3 plasma densities can be achieved to PIII optimization purposes. The plasma is modelled as a voltage-controlled current source able to be turned on whenever the breakdown voltage is reached across the gap between the anode and the vessel wall. The simulation outcome fits well our experimental measurements showing that the plasma current obeys power laws that are dependent on the power current and other control variables such as the gas pressure. © 2006 American Institute of Physics [ABSTRACT FROM AUTHOR]

The simulation of a water purification system within a coaxial cylinder reactor operated by 1 kHz frequency plasma discharges in pre-arcing regimes is presented. In contrast with precedent works, this computational model considers three mechanisms of the system operation: (a) the relevant physical characteristics of water, (b) the ionisation and expansion processes in the spark channel including the near-breakdown electric current generated by the rate of change of the effective capacitance and resistance in the discharge, and (c) the energy associated with this initial spark in the water. The outcome of the model seems to meet all main requirements to allow the design and construction of specific water purification technology devices. © 2006 American Institute of Physics [ABSTRACT FROM AUTHOR]

A non-thermal atmospheric-like plasma source able to operate at room temperature represents, by its physical nature, a considerable potential for biological applications, given its highly accurate action and extremely controllable penetration on the surface of biological tissue. As we start up a research line into this technology, we report the electrical characterization of a room pressure plasma discharge by means of a coupling network model. The discharge is produced by a 13.56MHz commercial generator. As it is impossible to measure directly its state variables (voltage and current intensity) due to the considerable perturbation created by introducing a low impedance at the system output, then an indirect estimation of such variables is achieved from experimental diagnostics at the input, so to validate the proposed electrical model. © 2006 American Institute of Physics [ABSTRACT FROM AUTHOR]

Some recent results obtained from nitriding AISI 304 stainless steel samples, 1.2 cm in diameter and 0.5 cm thick are reported here in the case of an 85% hydrogen and 15% nitrogen mixture work gas. The process was carried out from 300 to 400 W for (13.56 MHz) inductively coupled plasma within a 60 cm long pyrex glass tube 3.5 cm in diameter where the samples were biased up to -300 V with respect to earth. The resulting hardness appears to be a function of the substrate temperature which varied from 200 °C at a 0 V bias to 550 °C at -300 V. The plasma density at 400 W reached 3×1010 cm-3 with a 4 eV electron temperature. Prior to nitriding, all the samples were polished with 0.05 μm diamond paste, leading to a 30 nm average roughness (Ra). After nitriding at -300 V, the Ra rose until ∼400 nm while hardness values of 1500 HV under 300 g loads were measured. X ray diffraction indicates that the extended phase amplitude (γN), Fe and Cr nitride depends on the substrate temperature. © 2006 American Institute of Physics [ABSTRACT FROM AUTHOR]