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In practical terms, those plasmas produced by a DC voltage power supply do not attain densities above the 108 to 109 cm-3 band. Here we present a power supply, controlled in current and voltage, which has been successfully designed and constructed delivering plasma densities in the orders of 109 – 1010 cm-3. Its experimental performance test was conducted within one toroidal and one cylindrical chambers capable of 29 and 35 litres, respectively, using nitrogen gas. The DC plasma was characterized by a double electric probe. Several physical phenomena present in the PIII process have been keenly investigated including plasma sheath dynamics, interaction of plasma and surface, etc. In this paper we analyze the effect of the implantation voltage, plasma density and pulse time in the PIII average heating power and fluence density. © 2006 American Institute of Physics [ABSTRACT FROM AUTHOR]

Some recent results obtained from nitriding AISI 304 stainless steel samples, 1.2 cm in diameter and 0.5 cm thick are reported here in the case of an 85% hydrogen and 15% nitrogen mixture work gas. The process was carried out from 300 to 400 W for (13.56 MHz) inductively coupled plasma within a 60 cm long pyrex glass tube 3.5 cm in diameter where the samples were biased up to -300 V with respect to earth. The resulting hardness appears to be a function of the substrate temperature which varied from 200 °C at a 0 V bias to 550 °C at -300 V. The plasma density at 400 W reached 3×1010 cm-3 with a 4 eV electron temperature. Prior to nitriding, all the samples were polished with 0.05 μm diamond paste, leading to a 30 nm average roughness (Ra). After nitriding at -300 V, the Ra rose until ∼400 nm while hardness values of 1500 HV under 300 g loads were measured. X ray diffraction indicates that the extended phase amplitude (γN), Fe and Cr nitride depends on the substrate temperature. © 2006 American Institute of Physics [ABSTRACT FROM AUTHOR]