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Introduction: Repetitive peripheral magnetic stimulation (rPMS) therapy is an innovative and minimally invasive neurorehabilitative technique and has been shown to facilitate neural plasticity. However, there is at present no research that clarifies the dose–response of rPMS therapy on the recovery of upper limb hemiparesis after stroke. This trial aims to clarify the dose–response of rPMS therapy combined with intensive occupational therapy (OT) for chronic stroke patients with moderate to severe upper limb hemiparesis. Methods and analysis: This multicenter, prospective, assessor-blinded, randomized controlled study with 3 parallel groups will be conducted from January 20, 2020 to September 30, 2022. Fifty patients will be randomly assigned in a ratio of 1:2:2 to the control group, the group receiving daily 2400 pulses of rPMS, or the group receiving daily 4800 pulses of rPMS, respectively. From the day after admission (Day 1), rPMS therapy and intensive OT will be initiated. The primary outcome is the change in the motor function of the affected upper extremity (Fugl-Meyer Assessment) between the time of admission (Day 0) and the day after 2 weeks of treatment (Day 14). Secondary outcomes will include the changes in spasticity, active range of motion, motor evoked potential, and activity of daily living. Ethics and dissemination: The study was approved by the Jikei University Certified Review Board for all institutions (reference number: JKI19–020). Results of the primary and secondary outcomes will be published in a peer-reviewed journal and presented at international congresses. The results will also be disseminated to patients. Trial registration number: jRCTs032190191.

A 0.6-V 2-2 cascaded audio delta-sigma ADC is described. It uses a resistor-based sampling technique which achieves high linearity and low-voltage operation without subjecting the devices to large terminal voltages. A low-distortion feed-forward topology combined with nonlinear local feedback results in enhanced linearity by reducing the sensitivity to opamp distortion, and allows increased input amplitude, resulting in higher SNDR. The modulator achieves 82-dB dynamic range and 81-dB peak SNDR in the A-weighted audio signal bandwidth with an OSR of 64. The total power consumption of the modulator is 1 mW from a 0.6-V supply. The prototype occupies 2.9 mm/sup 2/ using a 0.35-/spl mu/m CMOS technology.

A new lithography technique using continuous wave (CW) 266 nm radiation from an all solid state frequency quadrupled Nd:YAG laser is described and demonstrated. This laser has proved to be a highly efficient and promising deep UV light source in fabrication of 0.25 micron design rule device. Furthermore, we obtained 0.2 micron L/S pattern with phase shift mask. Speckle free images are obtained with rotating diffuser. The performance and potential of this new laser as a light source of microlithography are discussed and compared with KrF excimer laser theoretically and experimentally.© (1995) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.