Search

We study voltage-controlled magnetic anisotropy (VCMA) and other magnetic properties in annealed MojCoFeBjMgO layered structures. The interfacial perpendicular magnetic anisotropy (PMA) is observed to increase with annealing over the studied temperature range, and a VCMA coefficient of about 40 fJ/V-m is sustained after annealing at temperatures as high as 430 °C. Ab initio electronic structure calculations of interfacial PMA as a function of strain further show that strain relaxation may lead to the increase of interfacial PMA at higher annealing temperatures. Measurements also show that there is no significant VCMA and interfacial PMA dependence on the CoFeB thickness over the studied range, which illustrates the interfacial origin of the anisotropy and its voltage dependence, i.e., the VCMA effect. The high thermal annealing stability of MojCoFeBjMgO structures makes them compatible with advanced CMOS back-end-of-line processes, and will be important for integration of magnetoelectric random access memory into on-chip embedded applications. [ABSTRACT FROM AUTHOR]

The article presents a study focusing on strain-induced modulation of perpendicular magnetic anisotropy (PMA) in tantalum(Ta)/cobalt iron boron (CoFeB)/magnesium oxide (MgO) structures investigated by ferromagnetic resonance. The findings include strain-induced change in PMA extracted from the experimental ferromagnetic resonance (FMR) spectra, modulation of the PMA of an ultrathin CoFeB layer by voltage-induced strain and dependence of the effective damping constant as a function of strain.

The anomalous Nernst effect in a perpendicularly magnetized Ir22Mn78/Co20Fe60B20/MgO thin film is measured using well-defined in-plane temperature gradients. The anomalous Nernst coefficient reaches 1.8 μV/K at room temperature, which is almost 50 times larger than that of a Ta/Co20Fe60B20/MgO thin film with perpendicular magnetic anisotropy. The anomalous Nernst and anomalous Hall results in different sample structures revealing that the large Nernst coefficient of the Ir22Mn78/Co20Fe60B20/MgO thin film is related to the interface between CoFeB and IrMn. [ABSTRACT FROM AUTHOR]

In this work, we experimentally study the temperature dependence of the perpendicular magnetic anisotropy (PMA) and of the voltage-controlled magnetic anisotropy (VCMA) in nanoscale MgO|CoFeB|Ta-based magnetic tunnel junctions. We demonstrate that the temperature dependences of both the PMA and the VCMA coefficient follow power laws of the saturation magnetization, but with different exponents. We also find that the linear dependence of the PMA on electric field is maintained over a wide temperature range, although the VCMA strength decreases faster as a function of temperature as compared to the PMA. Possible mechanisms leading to the different exponents are discussed. [ABSTRACT FROM AUTHOR]

We studied the impact of different insertion layers (Ta, Pt, and Mg) at the CoFeB∣MgO interface on voltage-controlled magnetic anisotropy (VCMA) effect and other magnetic properties. Inserting a very thin Mg layer of 0.1-0.3 nm yielded a VCMA coefficient of 100 fJ/V-m, more than 3 times higher than the average values of around 30 fJ/V-m reported in Ta∣CoFeB∣MgO-based structures. Ta and Pt insertion layers also showed a small improvement, yielding VCMA coefficients around 40 fJ/V-m. Electrical, magnetic, and X-ray diffraction results reveal that a Mg insertion layer of around 1.2 nm gives rise to the highest perpendicular magnetic anisotropy, saturation magnetization, as well as the best CoFe and MgO crystallinity. Other Mg insertion thicknesses give rise to either under- or over-oxidation of the CoFe∣MgO interface; a strong over-oxidation of the CoFe layer leads to the maximum VCMA effect. These results show that precise control over the Mg insertion thickness and CoFe oxidation level at the CoFeB∣MgO interface is crucial for the development of electric-field-controlled perpendicular magnetic tunnel junctions with low write voltage. [ABSTRACT FROM AUTHOR]

Compared with current-controlled magnetization switching in a perpendicular magnetic tunnel junction(MTJ), electric field- or voltage-induced magnetization switching reduces the writing energy of the memory cell, which also results in increased memory density. In this work, an ultra-thin PZT film with high dielectric constant was integrated into the tunneling oxide layer to enhance the voltage-controlled magnetic anisotropy (VCMA) effect. The growth of MTJ stacks with an MgO/PZT/MgO tunnel barrier was performed using a combination of sputtering and atomic layer deposition techniques. The fabricated MTJs with the MgO/PZT/MgO barrier demonstrate a VCMA coefficient, which is ~40% higher (19.8 ± 1.3 fJ/V m) than the control sample MTJs with an MgO barrier (14.3 ± 2.7 fJ/V m). The MTJs with the MgO/PZT/MgO barrier also possess a sizeable tunneling magnetoresistance (TMR) of more than 50% at room temperature, comparable to the control MTJs with an MgO barrier. The TMR and enhanced VCMA effect demonstrated simultaneously in this work make the MgO/PZT/MgO barrier-based MTJs potential candidates for future voltage-controlled, ultralow-power, and high-density magnetic random access memory devices. [ABSTRACT FROM AUTHOR]