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We investigated the effects of sputtering conditions for the deposition of an Iridium (Ir) layer in a [Co/Pt]m/Co/Ir/[Co/Pt]n/Co/W/CoFeB synthetic antiferromagnetic reference layer (Ir-SyF) on the magnetic properties and tunnel magnetoresistance ratio (TMR ratio) of magnetic tunnel junctions (MTJs) stacks annealed at 400 °C for 1 h. The exchange coupling field ($H_{\mathrm {ex}}$) of Ir-SyF was improved by reducing the energy of Ir recoil ions and two times larger than that with Ru-SyF. Energy dispersive X-ray (EDX) spectrometry line analysis revealed greater interlayer diffusion in Ir when Ir was sputtered by using a conditions with large recoiled energy. This could cause the deterioration of the $H_{\mathrm {ex}}$ of the Ir-SyF. Despite the larger $H_{\mathrm {ex}}$ , the TMR ratio of the MTJ with Ir-SyF is smaller than that with Ru-SyF. The $m$ – $H$ curve of MTJ with Ru-SyF showed a large plateau region around zero magnetic field, whereas that with Ir-SyF did not. These results indicated the degradation of perpendicular magnetic anisotropy (PMA) in the top part of the Co/Pt multilayer with CoFeB reference layer and a large biquadratic coupling effect in the thin Ir layer. This causes the deterioration of the TMR ratio of the MTJ with Ir-SyF. TEM image of the Co/Pt layer in the MTJ with Ir shows some lattice defects. The EDX line analysis revealed that a large amount of Pt in the top Co/Pt layer diffused toward CoFeB reference layer in the Ir-SyF, resulting in the degradation of PMA. The structural analysis by X-ray diffraction showed the lattice spacing of CoPt (111) in Ir-SyF to be larger than that in Ru-SyF, indicating the occurrence of strain relaxation at the Co/Pt interface. These crystallographic changes in Ir-SyF might be related to a larger Pt diffusion. Suppression of Pt diffusion as well as low damage Ir deposition in the reference layer is crucial to utilize Ir-SyF. [ABSTRACT FROM AUTHOR]

Dynamic magnetic properties of Ta-O/Co20Fe60B20 bilayer films are strongly influenced by the oxidation condition of the Ta-O layer. The oxidation of the Ta-O layer by a slight amount of oxygen with a pressure (POxygen) of 0.03 Pa decreases in-plane damping constant (αIP), and increases the effective magnetization (4πMs,eff). Then, both αIP and 4πMs,eff maintain their values by increasing POxygen up to 0.3 Pa. The out-of-plane damping constant (αOP) showed a similar tendency to that of αIP against POxygen, although αOP is much smaller than αIP in every POxygen. αOP reaches to 0.0033 for sample oxidized at 0.03 Pa. It was suggested that αIP consists of both the intrinsic damping and the extrinsic damping, while αOP is closer to the intrinsic damping. The control of αOP and αIP by the oxidation would be beneficial in designing the high frequency spintronic devices. [ABSTRACT FROM AUTHOR]

We developed perpendicular magnetic tunnel junctions (MTJs) with four synthetic anti-ferromagnetically coupled Co/Pt layers (quad-SyF) and investigated their magnetic and transport properties. The quad-SyF comprised four Co/Pt layers and three 0.9 nm-thick Ru coupling layers, which consisted of Co/[Co/Pt] ${}_{a}$ /Ru/Co/[Co/Pt] ${}_{b}$ /Ru/Co/[Co/Pt] ${}_{c}$ /Ru/Co/[Co/Pt] ${}_{d}$ from top to bottom. The exchange coupling field ($H_{\mathrm {ex}}$) reached a maximum of 1 T when the values of $a$ , $b$ , $c$ , and $d$ were 1, 2, 2, and 1, respectively. The tunnel magnetoresistance ratio of the MTJ with the quad-SyF and the second-peak conventional double-SyF increased as the annealing temperature was increased up to 400 °C, whereas that of the MTJ with the first-peak conventional double-SyF degraded at temperatures of more than 350 °C in blanket films. A 55 nm diameter MTJ with quad-SyF was found to be stable even against an external magnetic field up to 300 mT. On the contrary, in the conventional double-SyF, the reference-layer (RL) magnetization direction flips at around 250 mT. The shift magnetic field of the MTJ with quad-SyF becomes approximately zero when the values of $a$ , $b$ , $c$ , and $d$ are 1, 4, 1, and 2, respectively. No back-hopping of the MTJ with quad-SyF was observed even for the write pulsewidth ($t_{W}$) down to 10 ns. On the contrary, an MTJ with conventional double-SyF exhibited back-hopping. In the patterned MTJ with conventional double-SyF, as the MTJ size decreases, the coercive field of Co/Pt significantly increases and $H_{\mathrm {ex}}$ decreases, causing the $m$ – $H$ curve of the RL to cross the zero magnetic field. This enables both parallel and antiparallel configurations for the top and bottom Co/Pt layers in double-SyF at the zero magnetic field, which could induce back-hopping. However, the $m$ – $H$ curves of the RL in the patterned MTJ with quad-SyF are far from the zero magnetic field owing to the high $H_{\mathrm {ex}}$ and low $H_{c}$ , which could lead to the suppression of back-hopping. [ABSTRACT FROM AUTHOR]

In order to recover the patterning damage and improve the electric and magnetic properties of the patterned magnetic tunnel junctions (MTJs), the novel post-treatment process using oxygen ions has been studied. Generally, the oxygen is known as an unsuitable gas for the MTJs patterning because it causes degradation of the patterned MTJs by over-oxidation of MgO. By the way, if the damaged layer could be oxidized selectively without over-oxidation of the damage-less area, oxygen can be the most effective gas to recover the patterning damage of the MTJs. In this study, for the selective oxidation, we proposed the non-reactive oxygen treatment scheme called the oxygen showering post-treatment process (OSP) using an ozone diffusion chamber. By the specific OSP conditions, 8 l/min of the flow rate, 250 °C of the temperature, and 30 s of the time, the magneto-resistance (MR) was increased from 103% to 110%, and the switching current was decreased from 41.1 μA to 31.6 μA when compared with reference data at the same resistance level. These results show that the electric and magnetic properties of the patterned MTJs by the OSP treatment have been improved compared to the reference sample. The improvement in electric and magnetic properties by the OSP treatment is assumed because the reference sample already contains slight patterning damages at the edge of the MTJs despite the optimized patterning process, and these damages have been oxidized by the OSP treatment. Moreover, by the OSP treatment, the proportion of the electric short fail was dramatically decreased from 1.51% to 0%, which is a remarkable improvement in terms of a successful commercialization of spintronic devices. [ABSTRACT FROM AUTHOR]

We investigated the effects of surface modification treatment (SMT) on the perpendicular magnetic anisotropy (PMA) and the thermal tolerance of top-pinned magnetic tunnel junctions (MTJs) with a Co/Pt synthetic ferrimagnetic coupling reference layer. Applying an SMT to the bottom Pt layer increased the PMA of the overlying Co/Pt multilayer. X-ray diffraction spectrum analysis revealed that the SMT resulted in a higher crystallinity and smaller lattice spacing in the Co/Pt multilayer in the thinner bottom Pt layer, which may have increased the PMA in the Co/Pt multilayer. The tunnel magnetoresistance (TMR) ratio of the MTJ with SMT increased as the annealing temperature was increased up to 400 °C; conversely, the TMR ratio of the MTJ without SMT decreased at an annealing temperature of 400 °C. Evaluation of the m-H loops revealed that, after annealing at 400 °C, the reference layers in the MTJs after SMT possessed better magnetic properties than those in the MTJs without an SMT; this is attributable to the higher PMA of the reference layers with SMT. EDX line analysis revealed that SMT suppressed Pt diffusion to the MgO barrier, resulting in a higher thermal tolerance and larger PMA of the reference layer. [ABSTRACT FROM AUTHOR]

We have successfully observed the process-induced microstructure of the ultrafine CoFeB–MgO-based magnetic tunnel junctions with a perpendicular easy axis (p-MTJs) down to junction size of less than 20 nm using scanning transmission electron microscope (STEM) tomography combined with energy-dispersive X-ray spectroscopy (EDX). This made it possible to examine 3-dimensionally the precise structural information inside the entire MTJ. By this, the root cause of the change in the resistance of the MTJ was found to be the altered region consisting of Fe-dipping attached to the edge of the MgO and ultrathin TaO layer uniformly formed on the MTJ surface. This altered region is caused by etching during patterning of the MTJ, and the resistance value of the MTJ changes depending on the degree of adhesion of insulating TaO and Fe atoms at the edge of the MgO barrier layer. Furthermore, it was found that the unevenness of the MgO/CoFeB interface inside the MTJ was not a factor that caused the change in the thickness of the MgO barrier layer in the current process. Our results show that STEM tomography is an effective tool for failure analysis to clarify the relationship between the detailed structure of fine MTJs and magnetic properties. Unlike the conventional cross-sectional STEM observation, since the STEM tomographic observation includes the whole view of the MTJ, this enables higher resolution observation as the MTJ size decreases without overlooking the cause of failure inside the MTJ. [ABSTRACT FROM AUTHOR]

We investigated the influence of hard mask (HM) materials on tunnel magnetoresistance (TMR) properties and magnetic properties for the magnetic tunnel junctions with pependicular easy axis (p-MTJs) with double CoFeB/MgO interface annealed at 400 °C for 0.5–10 h. After annealing at 400 °C for 5 h, the TMR ratio of the MTJ with TiN HM was significantly decreased, whereas the TMR ratio of the MTJ with Ta-HM was maintained at a value of more than 120%. The analysis results by secondary-ion mass spectrometry (SIMS) and energy-dispersive X-ray spectroscopy (EDX) revealed that Ru in Ru-cap for the MTJ with TiN-HM diffused into the free layer through the MgO-cap layer, resulting in the degradation of the magnetic and TMR properties of the MTJ with TiN-HM. In contrast, Ru did not diffuse into the free layer for the MTJ with Ta-HM, which results from suppression of Ru diffusion into the free layer due to the formation of Ta–Ru alloy. Furthermore, in both the MTJs with TiN-HM and Ta-HM annealed at 400 °C for 10 h, EDX analysis revealed Pt diffusion into the CoFeB reference layer, which could degrade the magnetic properties of the reference layer, resulting in the degradation of TMR properties. To obtain a double CoFeB/MgO interface p-MTJ with higher thermal tolerance, it is necessary to design an HM material that suppresses the diffusion of the cap material into the free layer in addition to suppressing the Pt diffusion of the reference layer. [ABSTRACT FROM AUTHOR]

Magnetic properties of Co film in Pt/Co/α-Cr2O3/Pt/α-Al2O3 structure were investigated. Co layer thickness tCo dependence of perpendicular magnetic anisotropy energy density K reveals that the bulk magnetic anisotropy plays an important role in the system in addition to the interfacial anisotropy. Damping constant α monotonically increases with the decrease of tCo but not proportionally to 1/tCo. Both K and α increase with the increase of Pt layer thickness tPt from 3 nm to 5 nm and keeps almost constant in the tPt range between 5 nm to 20 nm. These results are of importance to understand the magnetization switching behavior driven by the magneto-electric (ME) effect as well as to design the spintronics device using the ME effect. [ABSTRACT FROM AUTHOR]

We investigate the effect of the capping layer on the thermal tolerance of magnetic tunnel junctions (MTJs) with free layer of MgO/CoFeB/spacer layer/CoFeB/MgO/capping layers (CoFeB, Ru, or Ta). We observe the largest perpendicular magnetic anisotropy energy density for the free layer with CoFeB capping layer using Ta spacer after annealing at 400°C for 1 h. Energy-dispersive X-ray (EDX) line analysis along film normal direction reveals the absorption of oxygen in MgO by Ta in the stack with Ta capping layer and Ru diffusion into CoFeB free layer in the stack with Ru capping layer, which could cause the reduction of perpendicular magnetic anisotropy. We also evaluate annealing temperature dependence of magnetic properties for the MTJ stacks with different spacer layer. We again observe the largest perpendicular magnetic anisotropy energy density for the MTJ stack using the CoFeB capping layer. The present study reveals that CoFeB capping layer is effective for achieving improved robustness against annealing. [ABSTRACT FROM AUTHOR]

We have studied the magnetic and electrical properties of double CoFeB–MgO interface magnetic tunnel junctions (MTJs) with various W insertion layer thicknesses $t_{\mathrm {W}}$ annealed at 400 °C and evaluated $t_{\mathrm {W}}$ dependence of thermal stability factor $\Delta $ , intrinsic critical current $I_{\mathrm {C0}}$ and damping constant $\alpha $. It was found that spin-transfer torque efficiency ($\Delta /I_{\mathrm {C0}}$) values increased with decreasing $t_{\mathrm {W}}$ as compared with the same MTJ size $D$. $\alpha $ measured by ferromagnetic resonance increased with an increase in $t_{\mathrm {W}}$ , which is consistent with those calculated from $\Delta /I_{\mathrm {C0}}$. This result indicates that lower damping constant of MTJ with thin W insertion layer contributes to higher $\Delta /I_{\mathrm {C0}}$. [ABSTRACT FROM AUTHOR]

We investigated annealing temperature Ta dependence of tunnel magnetoresistance (TMR) ratio and magnetic properties for perpendicular-anisotropy (CoFe)100–XBX/MgO magnetic tunnel junctions (MTJs) with single (CoFe)100–XBX/MgO interface (s-MTJ) and double CoFeB–MgO interface (d-MTJ) structures with various boron compositions X. High TMR ratio over 100% was observed in the s-MTJ with $X= 35$ at.% after annealing at 360 °C–400 °C, whereas the s-MTJ with X = 30$ at.% showed the degradation of TMR ratio with the increase of X = 25$ at.% maintained high TMR ratio up to owing to its higher perpendicular anisotropy compared with the s-MTJ. The difference of perpendicular anisotropy between the s-MTJ and the d-MTJ can be attributed to higher interfacial anisotropy together with lower saturation magnetization of the d-MTJs. The lower saturation magnetization is attributable to two MgO layers that suppress boron diffusion from CoFeB layers, which was verified by cross-sectional line analysis using electron energy-loss spectroscopy. [ABSTRACT FROM PUBLISHER]