1. High-Resolution X-ray Microprobe Using a Spatial Filter and Its Application to Micro-XAFS Measurements.
- Author
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Terada, Y., Tanida, H., Uruga, T., Takeuchi, A., Suzuki, Y., and Goto, S.
- Subjects
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OPTICAL resolution , *BEAMFORMING , *OPTICAL reflection , *TRACE element analysis , *X-ray microscopes , *MEASUREMENT , *MONOCHROMATORS - Abstract
An x-ray microprobe system with total-reflection mirror optics for trace element analysis has been developed at beamline 37XU of SPring-8. To achieve sub-microprobe, a spatial filter has been installed downstream of a monochromator. Focusing tests have been performed in the x-ray energy range of 6-14 keV. A focused beam size of 0.83 μm(V)×1.35 μm(H) has been obtained at an x-ray energy of 10 keV, and using a spatial filter in the horizontal direction, the beam size is down to 0.84 μm. Micro-x-ray absorption fine structure (XAFS) spectroscopy of submicrometer particles has been done by utilizing the total-reflection mirror optics. It was clearly observed from the nickel K-edge XAFS spectra that the oxidation state of nickel was a mixture of metal and oxide even in the single submicrometer particle. [ABSTRACT FROM AUTHOR]
- Published
- 2011
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