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Gap plasmonic nanostructures are of great interest due to their ability to concentrate light into small volumes. Theoretical studies, considering quantum mechanical effects, have predicted the optimal spatial gap between adjacent nanoparticles to be in the subnanometer regime in order to achieve the strongest possible field enhancement. Here, we present a technology to fabricate gap plasmonic structures with subnanometer resolution, high reliability, and high throughput using collapsible nanofingers. This approach enables us to systematically investigate the effects of gap size and tunneling barrier height. The experimental results are consistent with previous findings as well as with a straightforward theoretical model that is presented here.

Nanoimprint lithography is a promising technology for patterning large-area structures in nanometer scale at a low cost. In order to fabricate large-area nanoimprint master mold, interference lithography is widely used in defining periodical structures. However, neither roughness nor structural dimension can be effectively controlled via interference exposure. In this paper, we report a fabrication technique based on V-shaped master mold that can adjust line width of gratings as well as reduce the sidewall roughness. The fabrication of the V-shaped grating master mold is demonstrated, and the line width tuning and smoothening processes are discussed. With the help of the smoothening process, the optical efficiency of smoothened guided-mode resonance grating increased by 75 % from the original sample. [ABSTRACT FROM AUTHOR]

Nanoimprint lithography (NIL) is an indispensable tool to realize a fast and accurate nanoscale patterning in nanophotonics due to high resolution and high yield. The number of publication on NIL has increased from less than a hundred per year to over three thousand per year. In this paper, the most recent developments on NIL patterning transfer processes and its applications on nanophotonics are discussed and reviewed. NIL has been opening up new opportunities for nanophotonics, especially in fabricating optical meta-materials. With more researches on this low-cost high-throughput fabrication technology, we should anticipate a brighter future for nanophotonics and NIL. [ABSTRACT FROM AUTHOR]