1. On the diffusion behaviour of Os in the binary Ni-Os system.
- Author
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Youssef, Y. M., Lee, P. D., Mills, K. C., and Reed, R. C.
- Subjects
NICKEL ,ALLOYS ,SOLID solutions ,HEAT resistant alloys ,MICROSTRUCTURE - Abstract
The diffusion of Os in Ni is characterised by measuring interdiffusion coefficients in the binary Ni-Os system, in the temperature range 1200-1350°C. The results are compared with data for Ni-Re. Theoretical calculations indicate that Os should display a diffusion coefficient comparable with Re, among the lowest displayed by elements from the d-block transition elements. The authors' experimental findings confirm these predictions, and suggest that alloying with Os is likely to improve the high temperature properties of the nickel-based superalloys. [ABSTRACT FROM AUTHOR]
- Published
- 2010
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