1. Mesoporous materials from SiO 2 and NiTiO 3.
- Author
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Achhal, E., Jabraoui, H., Ouaskit, S., and Gibaud, A.
- Subjects
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MESOPOROUS materials , *SILICON oxide , *NICKEL-titanium alloys , *THIN films , *SURFACE active agents , *CHEMICAL synthesis - Abstract
In this work, we synthesized and characterized mesoporous thin films of SiO2and NiTiO3structured by a surfactant called Brij58. These films were fabricated by the method of dip coating and the best conditions for well-structured thin films were investigated as a function of surfactant concentration and different types of substrates. These films have been characterized by X-ray reflectivity which was calculated using the matrix formalism. We demonstrated that the silicon substrate had a great effect on the structure and porosity of the fabricated films for both SiO2and NiTiO3. Furthermore, we found that mesoporosity has been increased as a function of the surfactant concentration in the solution. This experimental procedure allows also to produce NiTiO3powders which have been characterized by X-ray diffraction. The XRD coupled to the crystallographic software “Maud”shows that the samples are constituted by 98, 2% NiTiO3powders. [ABSTRACT FROM AUTHOR]
- Published
- 2016
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