Search

Sub‐nanosecond (≈540 ps) resistive switching with high off/on resistance ratio is demonstrated in an Au/YIG/n‐Si resistive random access memory (RRAM) at room temperature and 85 °C in article number 1800418 by Yuewei Yin, Xiaoguang Li, and co‐workers. Five discrete resistance levels with ultrafast switching clearly show reliable retentions. Such an RRAM is promising for next‐generation non‐volatile memories with ultrahigh speed, low power consumption, and high density. [ABSTRACT FROM AUTHOR]

Resistive random access memory (RRAM) with ultrafast and multilevel switching is extremely promising for next‐generation nonvolatile memory. Here, ultrafast unipolar resistive switchings (≈540 ps) with high off/on resistance ratio (≈104) are obtained in yttrium iron garnet Y3Fe5O12 (YIG)‐based resistive memory on n‐Si substrate. The sub‐nanosecond operation is also successfully performed up to 85 °C with an off/on resistance ratio of ≈103. In addition, by using different compliance currents for the set process, five discrete resistance levels with ultrafast switchings among them are achieved and the multilevel states show reliable retention (>104 s). The large, stable, reproducible, and reliable switching behaviors of the Au/YIG/n‐Si RRAM cell shows its great potential for ultrafast multilevel memory applications. By fabricating an Au/YIG/n‐Si resistive random access memory (RRAM) on silicon, ultrafast unipolar resistive switchings (≈540 ps) with high off/on resistance ratio are demonstrated at both room temperature and 85 °C. Five discrete resistance levels with ultrafast switchings are obtained and show reliable retention. Such an ultrafast multilevel unipolar RRAM is promising for ultrafast multilevel memory applications. [ABSTRACT FROM AUTHOR]