1. High-Resistance State Reduction During Initial Cycles of AlO x N y -Based RRAM.
- Author
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Duan, Yiwei, Gao, Haixia, Shen, Xuping, Sun, Yuxin, Guo, Jingshu, Yu, Zhenxi, Wu, Shuliang, Yang, Mei, Ma, Xiaohua, and Yang, Yintang
- Subjects
NONVOLATILE random-access memory ,ION migration & velocity - Abstract
In this work, the mechanism of reliability of high resistance state (HRS) in AlOxNy-based resistive random access memory (RRAM) has been studied. The Ta/AlOxNy/Pt devices with high quality of the Schottky contact in the Ta/AlOxNy interface show excellent HRS reliability and low power consumption characteristics. We propose that the resistive switching (RS) process is caused by the migration of oxygen ions in the AlOxNy-based RRAM device, and the quality of the metal–semiconductor Schottky contact directly determines HRS reliability in AlOxNy-based RRAM. [ABSTRACT FROM AUTHOR]
- Published
- 2021
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