1. Measurement of the nonlinear refractive index in optical thin films
- Author
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Steinecke, M., Jupé, M., Kiedrowski, K., Ristau, D., Exarhos, Gregory J., Gruzdev, Vitaly E., Menapace, Joseph A., Ristau, Detlev, and Soileau, M.J.
- Subjects
Nonlinear optics ,Materials science ,Kerr effect ,Wavefronts ,Thin films ,Propagation modeling ,Theoretical approach ,Dewey Decimal Classification::600 | Technik::620 | Ingenieurwissenschaften und Maschinenbau ,Refractive index ,Physics::Optics ,Substrate (electronics) ,Deformation (meteorology) ,Optics ,Kerr-effect ,Self-focusing ,Optical thin films ,Thin film ,Optical Kerr effect ,Konferenzschrift ,Z-scan method ,business.industry ,Deformation ,Nonlinear refractive index ,Interferometry ,Optical materials ,Substrate material ,ddc:620 ,business ,Laser damage ,Layer (electronics) ,Dielectric layer ,Beam (structure) - Abstract
Based on the z-scan method, an interferometric set-up for measuring the optical Kerr-effect was engineered and optimized. Utilizing a Mach-Zehnder configuration, the wave front deformation caused by the Kerr induced selffocusing is monitored. Fitting this deformation to a theoretical approach basing on a beam propagation model, the nonlinear refractive index is obtained. The procedure can be applied to measure the nonlinear refractive index of both, the substrate material as well as the deposited dielectric layer on top of the substrate. The nonlinear refractive index of a layer specially deposited for this purpose as well as for several substrate materials was measured and the results presented. © 2017 SPIE.
- Published
- 2018
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