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38 results on '"Heinrich, Christoph"'

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1. Experimental characterization of a concentrating photovoltaic system varying the light concentration

2. Noise spectroscopy as a tool for the characterization of perovskite, organic and silicon solar cells

3. Graphenic carbon as etching mask: patterning with laser lithography and KOH etching

4. Hole-mobility limits for the Zn(OC)2organic semiconductor obtained by SCLC and field-effect measurements

5. Sensitive photoreceiver based on carbon nanotube/tobacco cell composite material

6. Light irradiation tuning of surface wettability, optical, and electric properties of graphene oxide thin films

7. Electrical Hole Transport Properties of an Ambipolar Organic Compound With Zn-Atoms on a Crystalline Silicon Heterostructure

8. History of the amorphous silicon on crystalline silicon heterojunction solar cell

9. Electronic memory effect in a crystalline silicon/polyether heterostructure

10. Parameter extraction during thermal cycling and optical backreflection measurements of bidirectional optoelectronic modules

11. Thermal ageing of bulk heterojunction polymer solar cells investigated by electric noise analysis

12. Sensitivity of proton implanted VCSELs to electrostatic discharge pulses

13. Sensitivity of multimode bidirectional optoelectronic modules to electrostatic discharges

14. Characterization of polymer:fullerene solar cells by low-frequency noise spectroscopy

15. Investigation of the optical characteristics of a combination of InP/ZnS-quantum dots with MWCNTs in a PMMA matrix

16. Reliability of InGaAsInP based separate absorption grading multiplication avalanche photodiodes

17. WAVEGUIDING STRUCTURE EXHIBITING VARIOUS NONLINEAR OPTICAL TRANSFER FUNCTIONS REALIZED WITH A WANNIER-STARK MODULATOR CONTAINING AN InGaAs/InP SUPERLATTICE

18. Metal‐Oxide‐Semiconductor Capacitance Measurements on Amorphous Silicon

19. Determination of Generation Lifetime in Trap‐Rich and Layered Semiconductors by Metal‐Oxide‐ Semiconductor Measurements

20. Transient microwave detected photoconductivity as a tool for in-situ evaluation of intrinsic a-Si:H films deposited and annealed at different temperatures

21. Optical in situ characterization of isotactic polypropylene crystallization using an LED array in avalanche-photoreceiver mode

22. Memory operation of a InGaAs/InP waveguide modulator with two coupled quantum wells in Self-Electrooptic Effect Device configuration

23. InGaAs-InP superlattice electroabsorption waveguide modulator

24. Self-electro-optic effect device in waveguiding configuration as optical switch and power discriminator

25. Degradation of proton implanted VCSEL's due to electrostatic discharge pulses

26. Optically multistable operation of a waveguide device based on the Wannier–Stark effect in an InGaAs/InP superlattice

27. Polarisation-independent InGaAsP/InGaAsP MQW waveguide electroabsorption modulator

28. High temperature stability and electrostatic discharge sensibility of InGaAs/InP avalanche photodetectors

29. Influence Of The Device Geometry And Inhomogeneity On The Electrostatic Discharge Sensitivity Of InGaAs/InP Avalanche Photodetectors

30. Leakage current detection in InGaAsP laser diodes by imaging of the optical emission within the confining InP layers

31. Transfer of excess charge carriers in an a-Si:H/crystalline-silicon heterojunction measured during the growth of the amorphous silicon layer

32. Direct In-Situ Observation of Charge Carrier Separation During Formation of an Amorphous Silicon / Crystalline Silicon Heterojunction

33. The influence of deposition temperature and annealing temperature on the optoelectronic properties of hydrogenated amorphous silicon films

34. In-situ characterization of a-Si:H devices during growth by microwave detected transient photoconductivity

35. Proton Damage in Amorphous Silicon/Crystalline Silicon Heterojunction Solar Cells

36. In situ thickness control during plasma deposition of hydrogenated amorphous silicon films by time-resolved microwave conductivity measurements

37. Charge carrier kinetics during growth of a-Si:H layers

38. Surface passivation of single crystalline silicon by thin amorphous silicon layers

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