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In this paper, first generation back-contact back-junction (BC-BJ) silicon solar cells with cell efficiencies well above eta = 20% were fabricated. The process sequence is industrially feasible, requires only one high-temperature step (co-diffusion), and relies only on industrially available pattering technologies. The silicon-doping is performed from pre-patterned solid diffusion sources, which allow for the precise adjustment of phosphorus-and boron-doping levels. Based on the investigated process technologies, BC-BJ solar cells with gap and without gap between adjacent n+-and p+-doped areas were processed. On the one hand, a strong reduction of the process effort is possible by omitting the gap regions. On the other hand, parasitic tunneling currents through the narrow space charge region may occur. Hence, deep doped areas were realized to avoid tunneling currents in gap-free BC-BJ cells. This paper finishes with a detailed characterization of the manufactured cells including important cell measurements like I-V, SunsVOC, quantum efficiency, and an analysis of the cell specific fill factor losses.

Photoluminescence (PL) imaging is a promising characterization technique for rating and sorting of multicrystalline silicon (mc-Si) as-cut wafers concerning to their material quality. It is inline applicable and yields high resolution images showing recombination active defects from crystallization which influence solar cell performance. In this contribution the basic concepts in ongoing work concerning relevant defects, rating results, statistics, algorithms and general approaches for the rating are summarized. Since 2009 wafers are sorted into five quality classes at Fraunhofer ISE. Details on the rating criteria are given and three examples for application are presented: (i) the impact of edge contaminations on the solar cell results, (ii) a comparison of wafer suppliers based on random samples from a statistical basis of 10,000 wafers and (iii) the results of an advanced rating and sorting of wafers for the manufacturing of highly efficient MWT-PERC solar cells. The results confirm that PL imaging can be used for a very precise rating of material quality.

Carrier mobility in silicon plays a crucial role for photovoltaic applications. While the influence of doping on mobility in standard monocrystalline silicon is well understood, recent research has been focused on the effects of crystal defects in multicrystalline (mc) silicon and of the presence of both acceptors and donors in compensated silicon, both introducing additional scattering centers influencing carrier mobility. In this work measurements of the majority carrier mobility have been carried out in two blocks of compensated multicrystalline silicon. Confirming existing results we come to the conclusion that with increasing compensation level mobilities may be significantly lower than predicted by Klaassen's mobility model, which is basically suited for the description of mobilities in compensated silicon as it accounts for scattering on both acceptors and donors. However, as this model is based on mobility data from uncompensated silicon, a compensation-related reduction of screening is not taken into account sufficiently. To describe mobilities in compensated silicon, a modification of Klaassen's mobility model based on published mobility data in compensated silicon is suggested.

In this paper we measure, spatially resolved, the efficiency potential of multicrystalline material. The excess carrier lifetime in the bulk affects the open-circuit voltage, the short-circuit current and the fill factor of a solar cell differently as different injection conditions apply. Therefore, we measure the bulk lifetime injection-dependent and analyze each IV -parameter separately. Furthermore, multicrystalline wafers with laterally varying bulk recombination need a spatially resolved analysis to explore the impact of large grains or dislocation clusters on the efficiency. The crucial information we need is the spatially resolved injection-dependent bulk lifetime. For this purpose, we use lifetime calibrated photoluminescence imaging with a varying generation rate. Measuring a surface passivated wafer after the important high temperature steps of a solar cell process ensures that we attain the bulk recombination that is relevant for the solar cell. Combining this information with a cell simulation, we deduce the maximum efficiency for every image point. We also discuss how to obtain global values from these images and investigate the effect of charge currents flowing laterally through the emitter using Sentaurus Device and Spice network simulations. A comparison of these simulated global values to measured IV -parameters on finished solar cells shows good agreement between the two. A detailed analysis of two mc-wafers from different feedstock shows limiting IV -parameters in different regions, efficiency reductions due to dislocations and explains differences in the fill factor of two equally processed solar cells. The analysis shows that evaluating the material related efficiency limitation of silicon wafers has to be done at the efficiency level, as the lifetime at one generation level alone is not sufficient.

This paper is revisiting the problem of recombination on locally processed area (contacts, local doping …), based on the concept of point recombination rate (pLPA). The newly introduced effective point recombination rate (peff) can be easily determined from the effective surface recombination velocity. It also allows predictions and comparisons in most of the practical cases. Further analysis allows the separation of the influence of pLPA from the one of the transport of the carrier in a transparent way. Due to its simplicity, transparency and accuracy, the model proposed here is believed to be more suitable to recent local processing technology than the existing analytical models.

Microscopic laser-doped regions in advanced solar cell concepts are analyzed to determine the doping density and to identify the damage caused by the laser process. For these investigations, microphotoluminescence spectroscopy and micro-Raman spectroscopy are utilized to measure doping density, internal stress, and carrier lifetime with micrometer resolution. This analysis proves the high applicability of the microspectroscopic techniques for the characterization of laser-doped regions by analyzing the profile of the advanced local doping process and the laser-induced damage particularly at the edges of the highly doped regions.

Well suited and reliable values of the optical and electrical properties of thin indium tin oxide (ITO) films are needed in order to choose the optimal deposition parameters and to perform reliable modeling for solar cells design. In this work, a new method will be presented to evaluate the ITO transparency directly on silicon substrates. The effects of each deposition parameter that influences the ITO transparency and conductivity force a trade-off in the frame of values useful for SHJ solar cells. The deposition of our optimized ITO film on a textured wafer yields a weighted average reflectance as low as 4.4±0.2%. The deposition of an MgF2/ITO double-layer anti-reflection coating (DL-ARC) on textured cells increases the efficiency from 17.9%, measured immediately after contacts have been added to the ITO, to 18.4% after the MgF2 deposition. An annealing step at 200 °C for 10 min proved to further increase the efficiency up to 18.9%, for a total gain of 1%.

Reliable process control or predictions of solar cell efficiencies from minority carrier lifetimes on silicon wafers require precise lifetime measurements. For inhomogeneous material quality this implies the necessity of adequately averaged spatially resolved lifetime measurements. Materials such as, e.g. multicrystalline upgraded metallurgical grade silicon frequently feature relatively low lifetimes, high trap densities, and several material parameters (charge carrier mobilities and net dopant concentration) that are not straightforwardly predictable or measurable. As this may substantially compromise conventional lifetime measurements, we present a solely luminescence based lifetime imaging technique, which requires virtually no a priori information about material parameters. Our approach is based on a calibration of a wafer's photoluminescence image through a precise lifetime determination of a part of this wafer via quasi-steady-state photoluminescence. Carrier mobilities, net dopant concentration, and surface morphology leave the determination of lifetime virtually unaffected, the injection dependence of lifetime is properly taken into account, and lifetimes down to the timescale of a microsecond can be reliably measured.

In back-contact solar cells, both external polarities are located at the back surface of the device, which allows for higher photocurrent generation on cell level and reduced series resistance on module level, leading to higher energy conversion efficiencies compared to conventional solar cells and modules. However, the majority charge carriers, which are generated near the back emitter, have to flow laterally e.g. through the base in order to reach the external majority carrier contact. In the present work, we analyse the lateral series resistance by means of measurement and simulation for high-performance metal wrap through (HIP-MWT) solar cells. We compare theoretical models and experimental methods to extract the effective series resistance from simulated and measured current–voltage characteristics and show that lateral voltage variations significantly increase the local recombination current. If the width of the gap between the external majority carrier contacts is reduced from the typical value of 3.5 mm to ideally 0 mm, we expect an increase of the energy conversion efficiency of approximately 0.1%abs. for cells with three continuous rear emitter contacts on 125 mm×125 mm large silicon wafers. In a simulation study, the bulk doping concentration N A and the bulk lifetime are varied yielding an optimal base resistivity of 0.6 Ω cm–1.5 Ω cm for HIP-MWT solar cells based on Czochralski-grown silicon in the degraded state of the boron–oxygen defect and an optimal resistivity of less than 1.0 Ω cm for the case of bulk lifetimes larger than ~300 µs.

Current losses at surfaces play a crucial role in the optimization of high-efficiency silicon solar cells. We present a new approach to characterize the surface recombination activity of interdigitated-back-contact (IBC) silicon solar cells by comparing experimental and simulated photoluminescence images (PL). The different recombination properties of the p- and n-doped regions of IBC cells in combination with the operating condition lead to contrast profiles in the PL image that vary with bias voltage. We achieve a good matching of experimental and simulated data for the investigated cells enabling the analysis of how sensitive the simulated contrast patterns are to changes in the surface recombination at the emitter, back- and front-surface-field and if a better matching of the experimental PL images is possible. Using these PL images in combination with simulations around the open circuit voltage Voc the determination of surface recombination velocities S and emitter saturation currents J0 on finished cells is made possible for the first time. This approach also opens a new path towards loss analysis of finished PERL, PERC, MWT and other silicon solar cells.

We present improvements and calibrations for boron and phosphorus doping models, which allow highly predictive simulations of various doping processes used for solar cells. Besides boron doping from a boron tribromide (BBr3) source and phosphorus doping from a phosphorus oxychloride (POCl3) source, oxidation and implantation processes for solar cell applications are simulated. The use of one set of model parameters for different doping techniques improves the calibration quality, ensures the generality of the model and allows a separation of the physical mechanisms influencing the dopant diffusion process. The simulations are compared to measured depth profiles of a large number of processes, which vary in time and temperature. In addition to excellent agreement to measured doping profiles, the sheet resistances and emitter depths of almost hundred diffusion processes are in good consistency with the simulations. Multiple experiments to optimize doping profiles regarding the shape, surface concentration or sheet resistance can thus be avoided.

Photoluminescence-based imaging is most commonly used to measure the excess minority carrier density and its corresponding lifetime. By using appropriate surface treatments, this high-resolution imaging technique can also be used for majority carrier concentration determination. The mechanism involves effectively pinning the minority excess carrier density, resulting in a dependence of the photoluminescence intensity on only the majority carrier density. Three suitable surface preparation methods are introduced in this paper: aluminum sputtering, deionized water etching, and mechanical abrasion. Spatially resolved dopant density images determined using this technique are consistent with the images obtained by a well-established technique based on free carrier infrared emission. Three applications of the technique are also presented in this paper, which include imaging of oxygen-related thermal donors, radial dopant density analysis, and the study of donor-related recomb ination active defects. These applications demonstrate the usefulness of the technique in characterizing silicon materials for photovoltaics.

Broad range injection-dependent carrier lifetime measurements in crystalline silicon are most relevant for both defect level spectroscopy, and for the investigation of recombination properties of novel solar cell technologies. The approach presented in this paper combines a determination of the effective carrier lifetime via time-dependent (quasi-steady-state) photoluminescence with a steady-state photoluminescence lifetime scan over a broad range of excess carrier densities. Thereby, the power of a virtually artifact-free time-domain approach is combined with the high sensitivity of steady-state photoluminescence at extremely low injection conditions. Time-dependent fluctuations of dark photocurrent measurements are identified as the essential source of uncertainty under such low injection. A measurement design which eliminates this source of uncertainty is presented and tested. Lifetime measurements at excess carrier densities as low as 10 8 cm −3 are shown in detail.

The passivation mechanisms and qualities of Al2O3, SiNx, SiO2 and a-Si:H( i ) on p - and n -type silicon are investigated by quasi-steady-state photoluminescence measurements. This technique allows effective lifetime measurements in an extremely large injection range between 1010 cm-3 and 1017 cm-3. The measurements are discussed focusing on injections below 1012 cm-3 in order to determine the most effective passivation layer for solar cells arranged for indoor applications. Fixed negative charges in the passivation layer cause field-effect passivation due to band bending leading to either accumulation or inversion at the passivation layer/silicon interface. Accumulation causes a stable passivation quality at low level injection. Inversion leads to effective lifetime losses similar to the losses in the space charge region. On p -type silicon the most effective surface passivation at low injections is provided by Al2O3 or a-Si:H( i ). The n -type silicon samples passivated with a-Si:H( i ) show the best effective lifetimes. SiNx and SiO2 show lifetimes one order of magnitude below a-Si:H( i ). Al2O3 on n -type is the most effective passivation at high injections around 1015 cm-3. Due to inversion losses at low level injections the passivation quality decreases more than two orders of magnitude for injections around 1010 cm-3.

An accurate quantitative description of the Auger recombination rate in silicon as a function of the dopant density and the carrier injection level is important to understand the physics of this fundamental mechanism and to predict the physical limits to the performance of silicon based devices. Technological progress has permitted a near suppression of competing recombination mechanisms, both in the bulk of the silicon crystal and at the surfaces. This, coupled with advanced characterization techniques, has led to an improved determination of the Auger recombination rate, which is lower than previously thought. In this contribution we present a systematic study of the injection-dependent carrier recombination for a broad range of dopant concentrations of high-purity $n$-type and $p$-type silicon wafers passivated with state-of-the-art dielectric layers of aluminum oxide or silicon nitride. Based on these measurements, we develop a general parametrization for intrinsic recombination in crystalline silicon at 300 K consistent with the theory of Coulomb-enhanced Auger and radiative recombination. Based on this improved description we are able to analyze physical aspects of the Auger recombination mechanism such as the Coulomb enhancement.

We present a qualitative method for series resistance imaging that generates lateral current flow in solar cells without electrical contacting. The applicability of the method is demonstrated on a multicrystalline silicon solar cell, and the results are briefly discussed with respect to lifetime artifacts and injection dependence of the series resistance distribution. The method overcomes one of the major drawbacks of state-of-the-art series resistance imaging methods, which require electrical contacting for current injection or extraction. It allows for all-contactless measurements, reduces the cell breakage rate, and simplifies the measurement setup and sample handling.

Micro-Raman (μRS) and micro-photoluminescence spectroscopy (μPLS) are demonstrated as valuable characterization techniques for fundamental research on silicon as well as for technological issues in the photovoltaic production. We measure the quantitative carrier recombination lifetime and the doping density with submicron resolution by μPLS and μRS. μPLS utilizes the carrier diffusion from a point excitation source and μRS the hole density-dependent Fano resonances of the first order Raman peak. This is demonstrated on micro defects in multicrystalline silicon. In comparison with the stress measurement by μRS, these measurements reveal the influence of stress on the recombination activity of metal precipitates. This can be attributed to the strong stress dependence of the carrier mobility (piezoresistance) of silicon. With the aim of evaluating technological process steps, Fano resonances in μRS measurements are analyzed for the determination of the doping density and the carrier lifetime in selective emitters, laser fired doping structures, and back surface fields, while μPLS can show the micron-sized damage induced by the respective processes.

Minority carrier lifetime is the most crucial material parameter for the performance of a silicon solar cell. While numerous methods exist to determine carrier lifetime on solar cell precursors prior to metallization, only very few techniques are capable of implicitly extracting effective minority carrier lifetimes from metallized silicon samples. In this paper, a measurement technique for effective minority carrier lifetime on silicon solar cells and metallized cell precursors via quasi-steady-state photoluminescence is presented. The setup requirements for this measurement technique are elaborated, experimental evidence of the reliability of such measurements down to carrier lifetimes in the range of a microsecond is provided, and a lifetime calibration of spatially resolved photoluminescence images of solar cells via the presented measurement technique is sketched. Finally, the very good agreement between the obtained effective carrier lifetime and the corresponding open circuit voltage of a solar cell is demonstrated.

Photoluminescence Imaging has been proven to be very useful for the characterization of silicon material characterization. By detecting emitted photons from the band-to-band recombination with a CCD camera information about the excess carrier density is gained. Besides carrier lifetime spatially resolved concentration measurements of the most prominent metallic impurities, namely interstitial iron and chromium, can be obtained in boron doped silicon. These measurements are based on a careful preparation of different metastable chemical states of the species under test by appropriate temperature and illumination conditions. Interstitial chromium as well as iron may reversibly bind to boron which changes their electrical defect parameters and thus the injection dependent carrier lifetime. From PL-images in both states the specific quantitative point defect concentration can be extracted. An analysis of the depth dependent carrier profiles gives an estimation on systematic errors, ideal measurement conditions, and a correction procedure for non-ideal measurement conditions. This contribution summarizes the state-of-the-art of impurity imaging methods with PL and introduces new aspects on quantitative PL-analysis of silicon material. A possible impact of lateral carrier diffusion on measurement errors is discussed by simulations of the carrier density distribution around extended defects. We present spatially resolved PL-measurements of the BO-defect concentration which expand the analysis of specific impurities. Being the most prominent factor which limits the carrier lifetime in Czochralski silicon this defect proves to significantly reduce material quality in multicrystalline silicon, too. For the separation of the impact of different metastable species present in the same sample a sequence of conditioning steps and measurements is proposed. Combining all techniques on the detection of metastable defects the quantitative impact of the specific detected impurity concentrations on the electrical material quality is deduced and can be tracked during solar cell processing resulting in a comprehensive analysis of efficiency-limiting defects in silicon.

Comparison of the open-circuit voltage (external voltage V(oc,ext)) determined by Suns-V(oc) measurements with the implied voltage V(oc, impl) determined by transient photoconductance decay lifetime measurements can yield a quick and easy analysis of silicon heterojunction (SHJ) solar cells, especially in regard to finding the optimum doping concentration of the emitter layer [or back surface field (BSF)]. A sufficiently high doping concentration of the emitter and BSF is mandatory to extract the internal Fermi-level splitting and thus the internal voltage, at the solar cell contacts. However increasing the concentration of doping gases during the deposition of doped amorphous silicon layers results in a reduction of the interface passivation quality and Voc, impl. The best trade off is realized when the ratio of V(oc,ext) to V(oc,impl) (external/internal V(oc)-ratio zeta) reaches a saturation value near 1 upon increasing the doping concentration. AFORS-HET (Automat FOR Simulation of HETerostructures) simulations resulted in the conclusion that the characteristics of the external/internal Voc-ratio are mainly determined by the active doping concentration (doping minus defect concentration).

The purpose of this paper is a detailed comparison of selected luminescence and lock-in thermography (LIT) results on one exemplary sample and the drawing of corresponding conclusions. Our focus is on solar cells, but some investigations on wafers will be discussed as well. The comparison will help to decide which characterization tools are needed to solve technological problems. It will be demonstrated that luminescence imaging may widely replace LIT with respect to the analysis of recombination-active bulk defects, cracks, series resistance, and junction breakdown sites. However, some important investigations can be done only by LIT. LIT allows for a quantitative analysis of different kinds of leakage currents both under forward and under reverse bias, enabling a reliable analysis of local I-V characteristics. It is shown that LIT and luminescence imaging are complementary to each other and should be used in combination.

In this paper, we present a method to quickly evaluate the long-term effects of copper-containing metal stack systems for silicon solar cell front–side metallization. Copper diffusion, which is detrimental for the solar cell performance, is accelerated by exposing the cell to thermal stress. In this paper, we suggest to quantify the degree of copper diffusion into the cell by the very fast Suns-VOC technique, measuring the pseudo fill factor pFF. Using three or more different temperatures, and assuming a certain loss in pFF corresponds to a certain depth of diffusion, the effective activation energy for copper diffusion for a given system can be extracted from an Arrhenius plot of the measured data. An extrapolation into temperature regions typical for solar cell modules under outdoor conditions allows an estimation of the fill factor loss for any operation time and temperature. Compared to time- and cost-intensive methods such as transmission electron microscopy or secondary-ion mass spectrometry, this kind of investigation requires only sparse equipment and can typically be done in 1 week per stack system. © 2010 The Electrochemical Society. DOI: 10.1149/1.3466984 All rights reserved.

Ultrathin (7 nm) atomic layer deposited Al2O3 layers and high-deposition-rate plasma-enhanced chemical vapor deposited AlOx layers have been applied and characterized as rear-surface passivation for high-efficiency silicon solar cells. The excellent efficiency values (up to 21.3%-21.5%) demonstrate that both aluminum oxide deposition processes have a very high potential comparable to the reference cells with SiO2 passivation. The high voltages (similar to 680 mV), the excellent long-wavelength quantum efficiency, and the high short-circuit currents of these cells (similar to 40 mA/cm(2)) are a proof for the low rear-surface recombination velocity and excellent internal rear-surface reflection.

The electrical breakdown of silicon solar cells at low reverse currents has recently gained increased attention. In this study we investigate the physical properties of prebreakdown sites with high resolution spectroscopy techniques. These techniques comprise the measurement of the electroluminescence under reverse voltage, microphotoluminescence spectroscopy, and micro-Raman spectroscopy. The measurements show very high levels of stress at the prebreakdown sites, an increase in the breakdown size with applied reverse bias and redshift in the breakdown electroluminescence spectrum with increasing onset voltage. The results are tentatively explained by a lower bandgap energy at the breakdown sites, which could be caused by stress.

A method for analyzing the power losses of solar cells is presented, supplying a complete balance of the incident power, the optical, thermodynamic, and electrical power losses and the electrical output power. The involved quantities have the dimension of a power density (units: W/m(2)), which permits their direct comparison. In order to avoid the over-representation of losses arising from the ultraviolet part of the solar spectrum, a method for the analysis of the electrical free energy losses is extended to include optical losses. This extended analysis does not focus on the incident solar power of, e. g., 1000 W/m(2) and does not explicitly include the thermalization losses and losses due to the generation of entropy. Instead, the usable power, i.e., the free energy or electro-chemical potential of the electron-hole pairs is set as reference value, thereby, overcoming the ambiguities of the power balance. Both methods, the power balance and the free energy loss analysis, are carried out exemplarily for a monocrystalline p-type silicon metal wrap through solar cell with passivated emitter and rear (MWT-PERC) based on optical and electrical measurements and numerical modeling. The methods give interesting insights in photovoltaic (PV) energy conversion, provide quantitative analyses of all loss mechanisms, and supply the basis for the systematic technological improvement of the device.

Minority carrier mobility is a crucial transport property affecting the performance of semiconductor devices such as solar cells. Compensation of dopant species and novel multicrystalline materials call for accurate knowledge of minority carrier mobility for device simulation and characterization. Yet, measurement techniques of minority carrier mobility are scarce, and published data scatter significantly even on monocrystalline material. In this paper, the determination of minority carrier mobility from self-consistent quasi-steady-state photoluminescence measurements of effective carrier lifetime is presented. The measurement design is distinguished by a limitation of carrier recombination through minority carrier transport—with excess carrier generation and recombination confined to opposite interfaces, respectively. Minority carrier mobility is inferred from the minority carrier diffusion coefficient via the Einstein relation. An experimental proof of concept on monocrystalline p-type material is provided, showing good agreement with state-of-the-art data and models. Considerations for the applicability of the method to compensated and multicrystalline silicon materials are discussed.

Knowledge of the carrier mobility in silicon is of utmost importance for photovoltaic applications, as it directly influences the diffusion length and thereby the cell efficiency. Moreover, its value is needed for a correct quantitative evaluation of a variety of lifetime measurements. However, models that describe the carrier mobility in silicon are based on theoretical calculations or fits to experimental data in monocrystalline silicon. Multicrystalline (mc) silicon features crystal defects such as dislocations and grain boundaries, with the latter possibly leading to potential barriers through the trapping of charge carriers and thereby influencing the mobility, as shown, for example, by Maruska [Appl. Phys. Lett. 36, 381 (1980)]. To quantify the mobilities in multicrystalline silicon, we performed Hall measurements in p-type mc-Si samples of various resistivities and different crystal structures and compared the data to majority carrier Hall mobilities in p-type mo nocrystalline floatzone (FZ) silicon. For lack of a model that provides reliable values of the Hall mobility in silicon, an empirical fit similar to existing models for conductivity mobilities is proposed based on Hall measurements of monocrystalline p-type FZ silicon. By comparing the measured Hall mobilities obtained from mc silicon with the corresponding Hall mobilities in monocrystalline silicon of the same resistivity, we found that the mobility reduction due to the presence of crystal defects in mc-Si ranges between 0 and 5 only. Mobility decreases of up to 30 as reported by Peter [Proceedings of the 23rd European Photovoltaic Solar Energy Conference, Valencia, Spain, 1-5 September 2008], or even of a factor of 2 to 3 as detected by Palais [Mater. Sci. Eng. B 102, 184 (2003)], in multicrystalline silicon were not observed.

Excellent surface passivation of crystalline silicon (c-Si) is desired for a number of c-Si based applications ranging from microelectronics to photovoltaics. A plasma-enhanced chemical vapor deposition double layer of amorphous silicon-rich oxynitride and amorphous silicon nitride (SiN x) can provide a nearly perfect passivation after subsequent rapid thermal process (RTP) and light soaking. The resulting effective minority carriers' lifetime (eff) is close to the modeled maximum on p-type as well as on n-type c-Si. Restrictions on the RTP of passivated surfaces, typical of other common passivation schemes (e.g., amorphous Si), are relieved by this double layer. Harsher thermal treatments can be adopted while still obtaining salient passivation. Furthermore, characterization of the same, such as, surface photovoltage, capacitance voltage, and electron paramagnetic resonance, enables the reproducibility and the understanding of the passivation scheme under test. It is s hown that the strong quality of surface passivation is ensured by a mechanism that emits electrons from shallow donor states in the passivation layer system and therefore creates a positive field effect.