1. Development of dual-beamline photoelectron momentum microscopy for valence orbital analysis.
- Author
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Kenta Hagiwara, Eiken Nakamura, Seiji Makita, Shigemasa Suga, Shin-ichiro Tanaka, Satoshi Kera, and Fumihiko Matsui
- Subjects
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PHOTOELECTRONS , *ATOMIC orbitals , *MOMENTUM space , *SOFT X rays , *MICROSCOPY , *PHOTOEMISSION - Abstract
The soft X-ray photoelectron momentum microscopy (PMM) experimental station at the UVSOR Synchrotron Facility has been recently upgraded by additionally guiding vacuum ultraviolet (VUV) light in a normal-incidence configuration. PMM offers a very powerful tool for comprehensive electronic structure analyses in real and momentum spaces. In this work, a VUV beam with variable polarization in the normal-incidence geometry was obtained at the same sample position as the soft X-ray beam from BL6U by branching the VUV beamline BL7U. The valence electronic structure of the Au(111) surface was measured using horizontal and vertical linearly polarized (s-polarized) light excitations from BL7U in addition to horizontal linearly polarized (p-polarized) light excitations from BL6U. Such highly symmetric photoemission geometry with normal incidence offers direct access to atomic orbital information via photon polarization-dependent transition-matrix-element analysis. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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