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n-n isotype heterojunction of InGaN and bare Si (111) was formed by plasma assisted molecular beam epitaxy without nitridation steps or buffer layers. High resolution X-ray diffraction studies were carried out to confirm the formation of epilayers on Si (111). X-ray rocking curves revealed the presence of large number of edge threading dislocations at the interface. Room temperature photoluminescence studies were carried out to confirm the bandgap and the presence of defects. Temperature dependent I-V measurements of Al/InGaN/Si (111)/Al taken in dark confirm the rectifying nature of the device. I-V characteristics under UV illumination, showed modest rectification and was operated at zero bias making it a self-powered device. A band diagram of the heterojunction is proposed to understand the transport mechanism for self-powered functioning of the device. [ABSTRACT FROM AUTHOR]

GaN films were grown on c-plane sapphire by plasma-assisted molecular beam epitaxy (PAMBE). The effect of N/Ga flux ratio on structural, morphological, and optical properties was studied. The dislocation density found to increase with increasing the N/Ga ratio. The surface morphology of the films as seen by scanning electron microscopy shows pits on the surface and found that the pit density on the surface increases with N/Ga ratio. The room temperature photoluminescence study reveals the shift in band-edge emission toward the lower energy with increase in N/Ga ratio. This is believed to arise from the reduction in compressive stress in the films as is evidenced by room temperature Raman study. The transport studied on the Pt/GaN Schottky diodes showed a significant increase in leakage current with an increase in N/Ga ratio and was found to be caused by the increase in pit density as well as increase in dislocation density in the GaN films. [ABSTRACT FROM AUTHOR]

We report on the hybrid ZnO/AlN/Si heterostructure-based ultraviolet (UV) photodetectors with infrared- and visible-blind characteristics. The heterostructure was formed by depositing ZnO thin films on Si (111) substrate by introducing an AlN as an intermediate layer. The ZnO film has been grown epitaxially on the underlying substrate with the improved crystallinity and excellent optical properties. The vertical transport properties of the ZnO/AlN/Si heterojunction under dark and light illumination demonstrate the intrinsic infrared- and visible-blind characteristics with excellent ultraviolet responsivity. The heterostructure exhibits a high UV responsivity of 14.5 A/W with UV-to-Infrared rejection ratio of nearly 4 orders of magnitude. The vertical electrical transport properties across the heterostructure are dominated by the holes in the reverse bias condition, whereas the transport of electrons in the forward bias is hindered at the ZnO/AlN interface due to an existence of huge conduction band offset between ZnO and AlN layers. The AlN intermediate layer acts as an electron blocking layer which allows the hole to transport across the heterostructure in the reverse bias condition. [ABSTRACT FROM AUTHOR]

Studies have been carried out on the enhancement of responsivity and detectivity of the ZnO thin-films-based ultraviolet photodetectors by introducing an AlN buffer layer on silicon substrate. The ZnO film grown with AlN buffer layer established an epitaxial relation with the substrate and was found to show improved crystallinity with excellent optical properties. A strong and narrow photoluminescence emission was observed on the ZnO film grown with buffer layer, while a defect related broad emission was dominated on the film without buffer layer. The photodetectors showed a higher responsivity ( R\lambda ) of 1.03 \times 10^4 A/W with a specific detectivity ( D^\ast ) of 5.21 \times 10^12~ \text cm\cdot \text Hz^1/2\cdot \text W^\text -1 at an applied bias of 3 V due to their excellent crystal quality. [ABSTRACT FROM PUBLISHER]

This report focuses on the structural and optical properties of the GaN films grown on p-Si (100) substrates along with photovoltaic characteristics of GaN/p-Si heterojunctions fabricated with substrate nitridation and in absence of substrate nitridation. The high resolution X-ray diffraction (HRXRD), atomic force microscopy (AFM), Raman and photoluminescence (PL) spectroscopic studies reveal that the significant enhancement in the structural as well as in the optical properties of GaN epifilms grown with silicon nitride buffer layer when compared with the sample grown without silicon nitride buffer layer. The low temperature PL shows a free excitonic (FX) emission peak at 3.51 eV at the temperature of 5 K with a very narrow line width of 35 meV. Temperature dependent PL spectra follow the Varshni equation well and peak energy blue shifts by ~63 meV from 300 to 5 K. Raman data confirms the strain free nature and reasonably good crystallinity of the films. The GaN/p-Si heterojunctions fabricated without substrate nitridation show a superior photovoltaic performance compared to the devices fabricated in presence of substrate nitridation. The discussions have been carried out on the junction properties. Such single junction devices exhibit a promising fill factor and conversion efficiency of 23.36 and 0.12 %, respectively, under concentrated AM1.5 illumination. [ABSTRACT FROM AUTHOR]

We report the structural and optical properties of a-plane GaN film grown on r-plane sapphire substrate by plasma-assisted molecular beam epitaxy. High resolution X-ray diffraction was used to determine the out-of-plane and in-plane epitaxial relation of a-plane GaN to r-plane sapphire. Low-temperature photoluminescence emission was found to be dominated by basal stacking faults along with near-band emission. Raman spectroscopy shows that the a-GaN film is of reasonably good quality and compressively strained. [Copyright &y& Elsevier]

We have grown Ga deficient GaN epitaxial films on (0001) sapphire substrate by plasma-assisted molecular beam epitaxy and report the experimental evidence of room temperature ferromagnetic behavior. The observed yellow emission peak in room temperature photoluminescence spectra and the peak positioning at 300 cm-1 in Raman spectra confirms the existence of Ga vacancies. The x-ray photoelectron spectroscopic measurements further confirmed the formation of Ga vacancies; since the N/Ga is found to be >1. The ferromagnetism is believed to originate from the polarization of the unpaired 2p electrons of N surrounding the Ga vacancy. [ABSTRACT FROM AUTHOR]

Abstract: The n-type GaN layers were grown by plasma-assisted MBE and either intentionally doped with Si or unintentionally doped. The optical characteristics of a donor level in Si-doped, GaN were studied in terms of photoluminescence (PL) spectroscopy as a function of electron concentration. Temperature dependent PL measurements allowed us to estimate the activation energy of a Si-related donor from temperature-induced decay of PL intensity. PL peak positions, full width at half maximum of PL and activation energies are found to be proportional to the cube root of carrier density. The involvement of donor levels is supported by the temperature-dependent electron concentration measurements. [Copyright &y& Elsevier]

Abstract: Photoluminescence (PL) of high quality GaN epitaxial layer grown on β-Si3N4/Si (111) substrate using nitridation–annealing–nitridation method by plasma-assisted molecular beam epitaxy (PA-MBE) was investigated in the range of 5–300K. Crystallinity of GaN epilayers was evaluated by high resolution X-ray diffraction (HRXRD) and surface morphology by Atomic Force Microscopy (AFM) and high resolution scanning electron microscopy (HRSEM). The temperature-dependent photoluminescence spectra showed an anomalous behaviour with an ‘S-like’ shape of free exciton (FX) emission peaks. Distant shallow donor–acceptor pair (DAP) line peak at approximately 3.285eV was also observed at 5K, followed by LO replica sidebands separated by 91meV. The activation energy of the free exciton for GaN epilayers was also evaluated to be ∼27.8±0.7meV from the temperature-dependent PL studies. Low carrier concentrations were observed ∼4.5±2×1017 cm−3 by measurements and it indicates the silicon nitride layer, which not only acts as a growth buffer layer, but also effectively prevents Si diffusion from the substrate to GaN epilayers. The absence of yellow band emission at around 2.2eV signifies the high quality of film. The tensile stress in GaN film calculated by the thermal stress model agrees very well with that derived from Raman spectroscopy. [Copyright &y& Elsevier]