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Your search keyword '"Celis, J.P."' showing total 6 results
Start Over Author "Celis, J.P." Topic physics
6 results on '"Celis, J.P."'

1. Using scaling laws to understand the growth mechanism of atomic layer deposited W[N.sub.x][C.sub.y] films on methyl-terminated surfaces

Author

Hoyas, A.. Martin, Whelan, C.M., Schuhmacher, J., Landaluce, T. Fernandez, Vanhaeren, D., Maex, K., and Celis, J.P.

Subjects
Atomic force microscopy -- Usage, Tungsten compounds -- Atomic properties, Tungsten compounds -- Electric properties, Nitrides -- Atomic properties, Nitrides -- Electric properties, Carbides -- Atomic properties, Carbides -- Electric properties, Monomolecular films -- Design and construction, Physics
Abstract

Atomic layer deposition (ALD) of tungsten nitride carbide (W[N.sub.x][C.sub.y]) on methyl terminated self-assembled monolayers (SAMs) is studied. SAM substrates give extended transient regimes of different lengths during which the film growth is nonlinear and the ALD films grow in the form of islands and show fractal properties.

Published
2006

2. Residual stresses of diamond and diamondlike carbon films

Author

E. Liu, L. Li, Blanpain, B., and Celis, J.P.

Subjects
Diamond films -- Electric properties, Diamond films -- Structure, Raman spectroscopy -- Usage, Physics
Abstract

The internal stresses of different diamond and diamondlike carbon (DLC) coatings are evaluated. Higher compressive residual stresses in the DLC films are noticed that are also related to their chemical bonding nature as well as their microstructures.

Published
2005

3. Structural study of nanometric electrodeposited Co films using 59Co NMR

Author

Cerisier, M., Attenborough, K., Jedryka, E., Wojcik, M., Nadolski, S., Haesendonck, C. Van, and Celis, J.P.

Subjects
Thin films, Multilayered -- Research, Physics
Abstract

Research into the structure of two series of Co films with thicknesses of between 5 nm and 400 nm is presented. It is concluded that the overall structure of nanometric Co films produced by electrodeposition is made up of a very high qualicy fcc phase and a very faulted hcp phase in around equal proportions.

Published
2001

4. Enhancement of the nucleation of smooth and dense nanocrystalline diamond films by using molybdenum seed layers

Author

Buijnsters, J.G., Vazquez, L., van Dreumel, G.W.G., ter Meulen, J.J., van Enckevort, W.J.P., and Celis, J.P.

Subjects
Molybdenum -- Chemical properties, Diamond crystals -- Chemical properties, Diamonds -- Chemical properties, Physics
Abstract

The article presents a new approach, which employs the molybdenum seed layers for the enhancement of the nucleation of smooth, as well as the dense nanocrystalline diamond (NCD) films. The coating of the films via Si substrate is shown to be extremely beneficial for enhancing the nucleation kinetics of the diamonds on the films.

Published
2010

5. The impact of the density and type of reactive sites on the characteristics of the atomic layer deposited W[N.sub.x][C.sub.y] films

Author

Martin, Hoyas A., Travaly, Y., Schuhmacher, J., Sajavaara, T., Whelan, C.M., Eyckens, B., Richard, O., Giangrandi, S., Brijs, B., Vandervorst, W., Maex, K., Celis, J.P., Jonas, A.M., and Vantomme, A.

Subjects
Tungsten compounds -- Electric properties, Nitrides -- Electric properties, Chemical reactions -- Analysis, Physics
Abstract

The growth of tungsten nitride carbide W[N.sub.x][C.sub.y] films obtained from layer deposition using triethylboron, tungsten hexafluoride, and ammonia precursors is determined by the density and type of reactive sites. A transient regime is not observed for W[N.sub.x][C.sub.y] growth on hydrogen-terminated silicon with the initial growth being dominated by the reduction of tungsten hexafluoride to tungsten.

Published
2006

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