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The luminescence efficiency of AlxGa1−xN quantum dots (QDs) and quantum wells (QWs), buried in AlN cladding layers and emitting in the ultraviolet range between 234 and 310 nm, has been investigated. The growth and optical properties have been done using similar aluminum composition (varying from 0.4 to 0.75) for both QDs and QWs. In order to compare as much as possible the optical properties, the QWs were fabricated with a growth time tuned such that the QW width is similar to the average height of the QDs. The photoluminescence (PL) showed emission ranging from 4 to 5.4 eV, putting into evidence differences in terms of full width at half maximum, PL intensity, and asymmetry of the line shape between QDs and QWs. The results show shorter wavelengths and a slightly narrower PL linewidth for QWs. To determine the light emission dependence with the electric field direction in the crystal, the evolutions of the emission diagrams for all samples were recorded along two orthogonal directions, namely, the "in-plane" (growth) and the "on-side" directions, from which the light emission was collected. For the whole QDs and QWs samples' series, the shapes of the emission diagram indicate emission in both in-plane and on-side directions, as evidenced by intra-valence band mixings caused by strain effects combined with the anisotropic Coulomb interactions that are particularly contributing to the polarization at wavelengths below 260 nm. Furthermore, the degree of polarization, determined for each sample, showed good agreement with results from the literature. [ABSTRACT FROM AUTHOR]

In this work, we investigate the impact of the quantum confined Stark effect and of the carrier localization on the internal quantum efficiency of polarized single or multiple In x Ga 1-x N/GaN quantum well(s), and semi-polar (11–22) multiple In x Ga 1-x N/In y Ga 1-y N quantum well. We find that increasing the influence of the quantum confined Stark effect at constant indium content with increasing the well-width induces a reduction of the internal quantum efficiency onsets for a decreasing value of the photoexcitation density. Similar but no so dramatic trend is reported when increasing the indium content and thus when increasing the localization of carriers to localized fluctuations of the chemical composition of the alloy. In addition, a change of the electric field internal to active layers (quantified by using time-resolved photoluminescence spectroscopy) realized by growing samples along a semi-polar orientation leads to experimental observation of a substantial enhancement of the threshold of photoexcitation density at which onsets the reduction of the internal quantum efficiency. A correlation is found through several orders of magnitude between the photoexcitation density P T for the onset of the collapse of IQE and the values of the photoluminescence radiative decay time τ rad . A scaling law is found in the investigated samples: P T ∼ τ rad - n with n = 3/2 ± 0.15 which evidences that quantum confined Stark effect is the main origin for the efficiency droop in nitride light-emitting diodes based on In x Ga 1-x N active layers. [ABSTRACT FROM AUTHOR]

Light-emitting devices based on high-Al content (Al,Ga)N suffer from high densities of dislocations or other point defects, counterbalanced by the carrier localization arising from disorder in the ternary alloy. One way to improve the internal quantum efficiency is the controlled Si-doping of Al xGa1− xN/Al yGa1− yN multi-quantum wells, which was assigned to the reduction of point defects by reduction of internal strains, for some ideal concentration of Si. Time-resolved photoluminescence (TR-PL) can be used [S. F. Chichibu et al., Appl. Phys. Lett. 99, 051902 (2011)] to try and correlate the observed PL time-decays with the density of defects, in relation with the nonradiative recombination probability of photoexcited carriers. We present TR-PL studies of MOVPE-grown Si-doped Al xGa1− xN/Al yGa1− yN multi-quantum wells with typical values of x = 0.6 and y = 0.7 and of Al xGa1− xN epilayers with x up to 0.86. High-Al content MQWs and epilayers exhibit similar bi-exponential PL decay dynamics, with the slower component rapidly quenched when T is increased. The fast decay component remains in the nanosecond range at all temperatures and the PL intensity loss is limited by carrier localization. [ABSTRACT FROM AUTHOR]

The effect of thermal annealing on In0.25Ga0.75N/GaN quantum wells grown by molecular beam epitaxy at 550 °C is investigated. A strong increase in the 300 K photoluminescence (PL) intensity is observed for samples annealed at 880 °C, while degradation occurs for higher temperatures. The improvement of the optical properties is ascribed to higher internal quantum efficiency (IQE), as indicated by temperature-dependent and time-resolved PL experiments. The effect of carrier localization due to possible quantum dot formation via indium clustering is ruled out based on high-resolution transmission electron microscopy imaging. IQE improvement is thus attributed to a reduction of point defects upon annealing. [ABSTRACT FROM AUTHOR]