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Abstract: A new exact formula to determine the substrate resistance and capacitance is presented in this work. It is derived from the solution of the Laplace equations for equivalent problems. It achieves the level of accuracy of standard electromagnetic methods while it is orders of magnitude faster than them. Equations for both rectangular and non-rectangular shapes of interconnect lines which apply to sub-micron technologies are presented. Both data from commercial simulators and measurement data obtained from a fabricated test chip are utilized in order to show the validity of the proposed formula. The results show that the proposed formula succeeds in computing the substrate's resistive and capacitive coupling. [Copyright &y& Elsevier]

In this paper, a new approach is presented for determining the substrate parameters of an arbitrary doping profile. It is general, technology independent, nonintrusive, and relies on simple direct-current measurements. A single measurement is required for uniform substrates, whereas two more measurements are needed for each additional layer in the multilayer case. Two different kernels are introduced for substrate resistance computation. One features a closed-form analytical solution of the Laplace equations defining the problem under study. The other relies on a geometric formulation of the current streamlines in order to compute the substrate resistance. Both simulations and measurements are exploited in order to show the validity of the proposed scheme. For measurements, data from literature are utilized and also data from a fabricated test chip. The results demonstrate that the proposed method succeeds in computing the substrate parameters fast and with high accuracy. In uniform substrates, the error falls to zero, whereas, in epitaxial substrates, the average error is kept bellow 4%. [ABSTRACT FROM AUTHOR]