1. A General Approach for the Performance Assessment of Nanoscale Silicon FETs.
- Author
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Jing Wang, Solomon, Paul M., and Lundstrom, Mark
- Subjects
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METAL oxide semiconductor field-effect transistors , *SEMICONDUCTORS , *FIELD-effect transistors , *NANOSCIENCE , *METAL semiconductor field-effect transistors , *ELECTROSTATIC induction - Abstract
Various nonplanar, multigate field-effect transistors (FET) structures have been reported that offer better gate con- trol than planar MOSFETs. In the nanometer regime, however, multigate (nanowire) structures also suffer strong quantum con- finement, which causes deleterious effects such as large threshold voltage variation. In this paper, we propose a general approach to compare planar versus nonplanar FETs with the consideration of both electrostatic integrity (gate control) and quantum confinement (the so-called "EQ approach"). With this EQ approach, we show that the cylindrical wire FET and the planar double-gate MOSFET have approximately equal scaling capability for a (001)-oriented wafer, while the nonplanar wire structures are significantly better for other wafer orientations [e.g., (011)] where the effective mass in the confinement direction of the planar MOSFET is relatively small. [ABSTRACT FROM AUTHOR]
- Published
- 2004
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