1. Micropore x-ray optics using anisotropic wet etching of (110) silicon wafers.
- Author
-
Ezoe Y, Koshiishi M, Mita M, Mitsuda K, Hoshino A, Ishisaki Y, Yang Z, Takano T, and Maeda R
- Subjects
- Anisotropy, Microscopy, Atomic Force, Physics methods, Scattering, Radiation, Semiconductors, Surface Properties, Hydroxides chemistry, Optics and Photonics, Potassium Compounds chemistry, Silicon chemistry, X-Rays
- Abstract
To develop x-ray mirrors for micropore optics, smooth silicon (111) sidewalls obtained after anisotropic wet etching of a silicon (110) wafer were studied. A sample device with 19 microm wide (111) sidewalls was fabricated using a 220 microm thick silicon (110) wafer and potassium hydroxide solution. For what we believe to be the first time, x-ray reflection on the (111) sidewalls was detected in the angular response measurement. Compared to ray-tracing simulations, the surface roughness of the sidewalls was estimated to be 3-5 nm, which is consistent with the atomic force microscope and the surface profiler measurements.
- Published
- 2006
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