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The process characteristics, the surface chemistry, and the resulting film properties of Ru deposited by atomic layer deposition from (ethylbenzyl)(1-ethyl-1,4-cyclohexadienyl)Ru(0) (EBECHRu) and O2 are discussed. The surface chemistry was characterized by both combustion reactions as well as EBECHRu surface reactions by ligand release. The process behavior on TiN starting surfaces at 325 °C was strongly influenced by Ti(O,N)x segregation on the growing Ru surface with consequences for both the growth per cycle as well as the film properties. For optimized process conditions, the films showed high purity with low C and O concentrations of the order of 1020 at./cm3. Higher deposition temperature led to strong (001) fiber texture of the films on SiO2 starting surfaces. Annealing in forming gas improved the crystallinity and led to resistivity values as low as 11 μΩcm for Ru films with a thickness of 10 nm. [ABSTRACT FROM AUTHOR]

Thethermal chemistry of methylcyclopentadienyl manganese tricarbonyl(MeCpMn(CO)3) on silicon oxide surfaces was characterizedby a combination of analytical techniques, including gas chromatography/massspectrometry (GC–MS), temperature-programmed desorption (TPD),infrared absorption spectroscopy, and X-ray photoelectron spectroscopy(XPS). The compound was found to be fairly stable, but to be ableto dissociatively chemisorb on the surface via the loss of one ormore carbonyl ligands followed by the oxidative addition of a surfacesilanol group. Further activation leads to the loss of the aromaticligand, at temperatures above approximately 575 K. This takes placeprimarily via the addition of a hydrogen atom to the MeCp ligand toform methylcyclopentadiene, which is released to the gas phase, buta small competing channel starts at slightly lower temperatures thatyields fulvene, and/or possibly benzene, after molecular rearrangement.The clean nature of the chemistry seen here for the methylcyclopentadienylMn complex makes it a good candidate as a precursor in the chemicaldeposition of metal thin films. However, the high stability and thehigh temperatures required for its decomposition do introduce somelimitations. [ABSTRACT FROM AUTHOR]