1. Multilayer relaxation of the Cu(210) surface
- Author
-
Ismail, S. Chandravakar, and D. M. Zehner
- Subjects
Oscillation ,Analytical chemistry ,Charge density ,chemistry.chemical_element ,Surfaces and Interfaces ,Condensed Matter Physics ,Copper ,Surfaces, Coatings and Films ,Crystallography ,Electron diffraction ,Transition metal ,chemistry ,Materials Chemistry ,Stress relaxation ,Relaxation (physics) ,Surface reconstruction - Abstract
Low-energy electron diffraction (LEED) I – V has been utilized to determine the surface structure of Cu(2 1 0). The surface structure is found to exhibit multilayer relaxation following the trend − − + (− is contraction and + is expansion in the interlayer spacing). The magnitude of interplanar relaxation is found to be damped, where | Δd 12 |>| Δd 23 |>| Δd 34 |, etc. This kind of behavior is quite different from that observed on Al(2 1 0) [Phys. Rev. B 38 (1988) 7913], where the magnitude of interplanar relaxation in the third interlayer is larger than that in the second interlayer (i.e., | Δd 23 | Δd 34 |). The difference of damped multilayer relaxation behavior of Cu(2 1 0) and Al(2 1 0) could be related to a charge density oscillation perpendicular to the surface.
- Published
- 2002
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