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We demonstrate a hybrid memory device with both memory and selector characteristics by using Al2O3 (memory) and TiO2 (selector) layers. The proposed device exhibits tunable threshold voltage characteristics based on the length of the residual conductive filament (CF) in the Al2O3 layer. To confirm the switching characteristics, the stability of the metallic CFs in each of the Al2O3 and TiO2 layers is investigated via electrical measurements. Our findings reveal that the CF in the TiO2 layer, which acts as a selector device, spontaneously ruptures. In contrast, a stable residual CF is observed in the Al2O3 layer, which acts as a memory device. Furthermore, we confirm that the tunable threshold voltage characteristics relate to the different tunneling gap distance from the residual CF in Al22O3. These results enable the hybrid memory device to achieve a high on–off ratio, high selectivity, and low leakage current without integrating an additional selector device, thereby enabling implementation of a high-density three-dimensional cross-point array. [ABSTRACT FROM AUTHOR]

In this paper, we demonstrate the linear conductance-change characteristics of a conductive-bridging RAM (CBRAM) to be employed as an artificial synapse device in neuromorphic systems. The CBRAM with a bilayer electrolyte structure (${\mathrm {Cu/Cu}}_{{2}-{x}}\text{S}$ / $\mathrm {WO}_{{3}-{x}}$ /W) exhibits analog switching behavior during the depression process due to the well-controlled dissolution of the conductive filament. To analyze the origin of this motion, we investigate the effective voltage applied to $\mathrm {Cu}_{{2}-{x}}\text{S}$ and $\mathrm {WO}_{{3}-{x}}$. Our findings reveal that $\mathrm {Cu}_{{2}-{x}}\text{S}$ , acting as a voltage divider, helps in suppressing the large voltage drop in $\mathrm {WO}_{{3}-{x}}$ , where the formation/dissolution of filament occurs. Furthermore, due to the diode-like characteristics of $\mathrm {Cu}_{{2}-{x}}\text{S}$ and the division of voltage drop between $\mathrm {WO}_{{3}-{x}}$ and $\mathrm {Cu}_{{2}-{x}}\text{S}$ , an optimum programming energy is applied to $\mathrm {WO}_{{3}-{x}}$ during the depression process. This leads to linear conductance-change characteristics under identical pulses. However, abrupt conductance-change characteristics are observed during the potentiation process. Thus, we use only the device characteristics of the depression part for the neuromorphic system. An excellent classification accuracy is achieved due to the linear conductance-change characteristics and optimized pulse conditions. [ABSTRACT FROM AUTHOR]

In this letter, we demonstrate the conductive-bridging RAM (CBRAM) with excellent multi-level cell (MLC) and linear conductance characteristics for an artificial synaptic device of neuromorphic systems. Our findings show that inherent characteristics of CBRAM can achieve the linear conductance and MLC characteristics as a product of an integer unit of the conductance. However, uncontrolled metal-ion injection into the switching layer results in a significant degradation of device uniformity, leading to degradation in the classification accuracy. Thus, we introduce a multi-layer CBRAM configuration (Cu/HfO2/Ta/Cu2S/W) to control the ionic motion in electrolytes. As a result of device engineering, highly improved classification accuracy is achieved using CIFAR-10 data set. [ABSTRACT FROM PUBLISHER]

In this letter, we demonstrate a self-limited conductive-bridging random access memory (CBRAM) that removes the necessity for external current compliance in a one selector–one resistor (1S1R) architecture. The standard Ge2Sb2Te5 (GST) is used as a CBRAM switching layer. In addition, Te-rich GST is also considered. Their performance is then compared. Both samples exhibit self-limited on-current characteristics, and the on-currents of the standard GST and Te-rich GST are ~300 and \sim 20~\mu \textA , respectively. The observed self-limited characteristics are caused by the Te in the GST layer because in the presence of Te, Cu tends to form a more stable CuTe phase that restrict Cu filament growth. Furthermore, to confirm the feasibility of crossbar array applications, the 1S1R device is evaluated using a Ag/TiO2-based threshold selector device reported in our previous work. Hence, we confirm leakage current reduction, a uniform resistance distribution, and stable retention characteristics in the 1S1R configuration with no external current compliance. [ABSTRACT FROM AUTHOR]