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In this article, we investigate the self-heating effect (SHE) of the Complementary FET (CFET) device and propose a cross-coupled thermal network model. For the investigation of thermal behavior, the intra- and inter-device crosstalk of CFET is evaluated qualitatively through the defined crosstalk coefficient. The results indicate that CFETs have more severe intra-device thermal crosstalk, almost twice that of CMOS. Moreover, the vertical structure makes the heat dissipation path of CFET devices significantly different in the two transition states (inputs “1” and “0”). Based on the thermal behavior characteristics of CFET and the necessity of high-precision and rapid prediction of thermal characteristics of the devices, a thermal network model is proposed, which can quickly respond to the heat source and be extended at the array level. In the last part, we analyze the influence of load capacitance and operating frequency on the self-heating of CFET, and SHE-related reliability lifetime is predicted based on the lattice temperature obtained from the thermal network. The prediction results show that the bias temperature instability (BTI) lifetime of CFET degrades by 84% compared with standard CMOS. [ABSTRACT FROM AUTHOR]

In this letter, a new method based on the temperature dependence of gate leakage current for accurately characterizing thermal crosstalk is proposed and performed on the advanced silicon-on-insulator (SOI) MOSFETs. The developed technique enables to capture the pure thermal crosstalk effect as it excludes the self-heating impact during the measurement. Moreover, it is proven robust over a large range of gate voltages regardless of the difference of device types, which is demonstrated on a pair of devices with a shared port. The accuracy of the thermal crosstalk measurement benefits in determining the overall thermal performance of the nano-scaled circuits under the mutual heating impacts. It offers a possible hardware solution to thermal monitor and management. [ABSTRACT FROM AUTHOR]

With technology node scaling down to 5 nm, the narrow device geometry confines the material thermal conductivity and further aggravates the self-heating effect in gate-all-around (GAA) transistors. In this paper, we investigate the self-heating of horizontally stacked three-layer GAA nanosheet transistors by 3-D finite-element modeling (FEM) simulation. The anisotropic thermal conductivity of nanosheets with the dependence of silicon thickness and temperature is implemented in the FEM simulator to evaluate thermal behavior accurately. The impact of layout design on thermal properties is investigated comprehensively from single device to device arrays with implication on electrical performance. The results indicate that the width of nanosheet is the key parameter to make the tradeoffs between self-heating and electrical characteristic. Meanwhile, the optimizations of layout design are given to suppress the thermal effects, including self-heating, nonuniformity of temperature, and thermal crosstalk at device level. This paper will provide guidelines for layout design, thermal management, device performance, and thermal-aware reliability prediction in the GAA-stacked structure. [ABSTRACT FROM AUTHOR]