1. Origin and annealing of deep-level defects in GaNAs grown by metalorganic vapor phase epitaxy.
- Author
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Gelczuk, Ł., Stokowski, H., DŁbrowska-Szata, M., and Kudrawiec, R.
- Subjects
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ANNEALING of semiconductors , *METAL organic chemical vapor deposition , *EPITAXY , *BAND gaps , *THERMAL oxidation (Materials science) - Abstract
Deep-level defects were investigated by deep level transient spectroscopy on the as-grown and annealed GaNAs layers of various nitrogen (N) contents. The unintentionally doped (uid) GaNAs layers were grown by metalorganic vapor phase epitaxy with N=1.4%, 2.0%, 2.2%, and 2.4% on GaAs substrate. The possible origin and evolution of the deep-level defects upon annealing were analyzed with the use of the GaNAs band gap diagram concept [Kudrawiec et al., Appl. Phys. Lett. 101, 082109 (2012)], which assumes that the activation energy of donor traps decreases with N-related downward shift of the conduction band. On the basis of this diagram and in comparison with previous results, the N-related traps were associated with (N-As)As or (N-N)As split interstitials. It was also proposed that one of the electron traps and the hole trap, lying at the same level position in the bandgap of the annealed uid-GaNAs layers, can both act as one generation-recombination center partially responsible for poor optical properties of this alloy. [ABSTRACT FROM AUTHOR]
- Published
- 2016
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