1. Electrochemically Grown ZnO Nanorods as Antireflective Layer for Silicon Thin-Film Solar Cells in n-i-p Configuration
- Author
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Nowak, R.-E., Juilfs, M., Geißendörfer, S., Vehse, M., Von Maydell, K., and Agert, C.
- Subjects
THIN FILM SOLAR CELLS ,Silicon-based Thin Film Solar Cells - Abstract
29th European Photovoltaic Solar Energy Conference and Exhibition; 1933-1936, Light management concepts for the improvement of the absorption in silicon thin-film solar cells in n-i-p configuration mainly focus on the modification of the rear surface and are often expensive or limited to laboratory scale. In this work, we use electrochemical deposition to grow a ZnO nanorod antireflective layer on the front surface in n-i-p type silicon thin-film solar cells in different configurations (a-Si:H on glass, μc-Si:H on flexible metal substrate and a-Si:H/μc-Si:H tandem cells on glass). Our results show an enhanced quantum efficiency by implementation of the nanorod antireflective layer. As no deposition chambers and high temperatures are needed, the process is cost-effective and can be applied on industrial scale. Although the nanorods are grown directly on the terminated cell in aqueous solution, the electrical properties of the cell are not deteriorated by the deposition step.
- Published
- 2014
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