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FeCoCu alloy films has been electrodeposited on gold (Au)-coated silicon substrates on three electrodes set up at varying deposition potential − 1.0 V, − 1.2 V, and − 1.5 V. Cyclic voltammetry (CV) measurement confirms that there is no peak during the co-deposition of Fe, Co, and Cu. Nevertheless, for the corresponding element, the dissolution occurred with absolute anodic peaks. With an increase of deposition potential, the morphology of the grains of the films changes from round shape to nodal shape, while the size of the grains has also been changed. Energy-dispersive x-ray spectroscopy (EDS) measurements confirm the change in the composition of all three elements in the films, as the deposition potential changes from − 1.0 to − 1.5 V, the film composition becomes Fe19Co71Cu10, Fe40Co45Cu15 , and Fe57Co33Cu10, respectively. X-ray diffraction (XRD) patterns showed that the crystal structure of electrodeposited FeCoCu films have a mixture of body-centered cubic (bcc) and face-centered cubic structure (fcc). A vibrating sample magnetometer was used for magnetic measurements. The saturation magnetization and coercivity (Hc) increases as the deposition potential increases. The easy axis of the films lies parallel to the film plane and shows anisotropic behavior. The variation in the magnetic properties of the FeCoCu films were attributed to the change in the elemental composition of the films caused by the deposition potential. [ABSTRACT FROM AUTHOR]

This research investigates the electronic and optical properties of Cu₂O nanostructures deposited under different pH conditions and their implications for semiconductor applications. We performed a comprehensive electrochemical characterization using Mott-Schottky (M-S) analysis to determine the type of conductivity, charge carrier density, and flat-band potential of Cu₂O thin films. The results indicated that Cu₂O deposited at pH 5.4 exhibited n-type conductivity with a peak charge carrier density of 1.01 × 1015 cm− 3, while Cu₂O deposited at pH 10 showed p-type conductivity with a carrier density of 2.07 × 1017 cm− 3. Results showed that the prepared Cu2O thin films were influenced by the pH and displayed different semiconductor, crystal, and morphological properties. The optical absorption edge appeared around 459 nm which indicates the formation of Cu2O and the band gap energy was estimated using Tauc plot. Photoluminescence (PL) spectroscopy was utilized to identify and characterize defect states within the band gap, revealing significant peaks related to copper and oxygen vacancies, as well as metastable defects. The energy band diagrams and Schottky barrier potential calculations provided insights into the charge transfer mechanisms at the semiconductor-electrolyte interface. Finally, the performance of p-Cu₂O/n-Cu₂O homojunctions was evaluated through I-V characterization, demonstrating typical p-n junction behavior and a conversion efficiency of 0.374%. This study highlights the influence of deposition conditions on the electronic properties of Cu₂O and underscores the importance of optimizing these parameters for enhanced performance in photoelectrochemical devices. [ABSTRACT FROM AUTHOR]

Enormous scientific interests focused on the improvement of the electrocatalytic activity of counter electrodes for their application in dye-sensitized solar cells (DSSCs). In this regards, we have elaborated a novel gold and platinum (AuPt) nanostructures via direct and indirect electrodeposition techniques; the first one is cyclic voltammetric, while the second one is a combination of amperometric and potentiostatic methods. The as-prepared AuPt nanomaterials, which were characterized by XRD, XPS, SEM, and CA, and electrochemical analysis such as cyclic voltammetry, electrochemical impedance spectroscopy, and Tafel polarization were employed as counter electrode in dye sensitized solar cells. The AuPt counter electrode prepared by cyclic voltammetric technique was the best electrocatalytic activity toward I 3 - / I - reduction, low charge transfer resistance of 9.2 Ω cm2, and good chemical and electrochemical stability in the electrolyte. The assembled cell with the Au/Pt electrode provided a maximum power density of 2.35 mW cm−2 with an efficiency of 2.35% under back illumination of 100 mW cm−2 and AM 1.5 G. [ABSTRACT FROM AUTHOR]

In this study, we successfully synthesized semiconductor thin films of Cu2FeSnS4 (CFTS) using the electrodeposition method. We delved into the mechanisms of electrochemical nucleation and growth, shedding light on these processes. Utilizing potentiostatic current-density-time transient measurements and in situ electrochemical impedance spectroscopy (EIS), we explored the nucleation and growth mechanisms of Cu2FeSnS4 (CFTS) thin films, deposited from an aqueous solution under various applied potentials. Cyclic voltammetry was employed to investigate the electrochemical behaviors of Cu-Fe-Sn-S precursors in a trisodium citrate medium. Chronoamperometry and EIS analysis were conducted to delve deeply into the deposition mechanism and surface electrode-electrolyte phenomena. Furthermore, the study explored the impact of Fe2+ concentration on structural morphology and optical properties. X-ray diffraction and Raman analysis unveiled the stannite structure within the obtained Cu2FeSnS4 thin film, alongside the presence of secondary phases in the CFTS elaborated at both lower and higher concentrations of Fe2+. SEM images reveal that the sulfurized CFTS C2 (0.01 M of Fe2+) sample has a surface morphology with irregular particles. EDS mapping and EDX analysis confirm that the elemental concentrations of Cu, Fe, Sn, and S in the CFTS C2 thin films closely match the desired stoichiometry for Cu2FeSnS4. UV-visible spectroscopy revealed a suitable bandgap energy within the range of 1.5 eV for the film deposited with a Fe2+ concentration of 0.01 M. [ABSTRACT FROM AUTHOR]

Bifunctional devices combining display and energy storage capabilities are crucial for next-generation optoelectronic technology. This study investigates the application of nickel oxide (NiO) thin films for bifunctional electrochromic energy storage systems. The amorphous Ni(OH) 2 thin films were electrodeposited with a focus on their time-dependent properties. The Scharifker-Hills model revealed a mixed nucleation process during the electrodeposition. The deposited thin films were examined for their physicochemical properties using X-ray diffraction (XRD), micro-Raman spectroscopy, X-ray photoelectron Spectroscopy (XPS), and morphological studies. Rietveld refinement of the XRD pattern confirmed a cubic NiO polycrystalline phase, while XPS identified Ni3+ as the dominant oxidation state. Significant morphological changes were observed with the varying deposition time. The NiO electrode deposited for 120 minute exhibited optimal characteristics including the highest areal capacitance of 161.77 mF/cm2, along with excellent cyclic stability of 96.54 % even after 2000 cyclic voltammetry cycles. The electrochromic study demonstrated optical modulation ranging within 55–82 % at 532 nm, with a maximum coloration efficiency of 86.90 cm2/C. This research demonstrates the viability of NiO thin films as bifunctional electrochromic energy storage systems and the advancement of optoelectronic devices that integrate display and energy storage functionalities. [ABSTRACT FROM AUTHOR]

Pinhole defects in thin films can significantly degrade their physical and chemical properties and act as sites for electrochemical corrosion. Therefore, the development of methods for the preparation of pinhole-free films is crucial. Electrodeposition, recognised for its efficiency and cost-effectiveness, shows great potential for applications in electrochemistry, biosensors, solar cells and electronic device fabrication. This review aims to elucidate the role of nucleation and growth models in understanding and optimising the electrodeposition process. Key parameters, such as crystal structure, orientation, surface morphology and defect control, are highlighted. In addition, the causes of pinhole defects, the effects of impurities and the potential and electrolyte composition on the deposited films are discussed. In particular, methods for minimising pinhole defects and two exemplary cases for a compact layer in relatively large-scale perovskite solar cells and nano-scale ultramicroelectrodes are discussed, exploring the influence of surface morphology, thickness and fabrication size under current common film preparation experiments. Finally, the critical aspects of controlled preparation, theoretical and technological advances, and the ongoing challenges in the field are provided. [ABSTRACT FROM AUTHOR]

Stainless steel codeposition on a low-cost substrate is crucial because of economic factors. In this work, codeposition of FeCrNi thin film was successfully prepared galvanostatically from a novel environmentally friendly mixed complex (glycine-formate) bath on a steel surface. The novel bath is characterized by using environmentally benign Cr(III) rather than Cr(IV), at pH 7, applying low current density (id) at 25 °C, and finally producing crack-free nanostructured FeCrNi films with up to 18% Cr. The obtained FeCrNi thin film has a composition resembling that of stainless steel 304 (Ni 8% and Cr ~ 18%). The study was carried out using potentiodynamic polarization curves, chronoamperometric analysis, and anodic linear stripping voltammetry (ALSV), complemented by a scanning electron microscope and X-ray diffraction analysis. The atomic absorption test showed an acceptable range of Cr content (from 13.76 to 18.75 At. %) depending on the practical circumstances. The Cr% is enhanced slightly by decreasing the id and pH or raising the temperature. At deposition times of 20 and 60 min, the Cr content slightly decreased with increasing id. For example, the Cr content decreased from 17.88% (at 0.48 mA cm−2) to 13.98% (at 2.41 mA cm−2) and decreased from 17.14% (at 0.48 mA cm−2) to 13.94% (at 2.41 mA cm−2) respectively. The deposition of FeCrNi films has been characterized by instantaneous nucleation followed by 3D growth under charge transfer control. The phases were polycrystalline, and their grain size value was 8.93 nm. At a relatively high current density (2.41 mA cm−2), the coatings' surface morphology became uniform, extremely smooth, and nearly devoid of micro-cracks. However, a low bath pH of 4.0 results in observed multiple pits of varying sizes. [ABSTRACT FROM AUTHOR]

Nickel electrodeposition is a widely utilized method for creating thin films on various substrates with various desirable attributes. Recently, there has been a growing interest in developing nickel composite coatings that incorporate additional elements or particles into the nickel matrix to enhance their properties. These composite coatings offer superior corrosion resistance, hardness, tribological, and other functional benefits compared with pure nickel coatings. Some of the recent advancements in electrodeposited nickel composite coatings include improved wear resistance, enhanced mechanical properties, and better corrosion resistance. Researchers have discovered that reinforcing the nickel matrix with Al2O3, SiC, ZrO2, WC, and TiO2 particles to obtain nickel composite coatings can significantly enhance all these important functional properties of various substrates. The uniform distribution of these particles within the nickel matrix acts as a barrier to wear and tear. Studies have also shown that nickel composite coatings with those particles exhibit superior mechanical properties, including increased hardness. These particles help to refine the grain size of the nickel matrix and deter movements that may cause defects, leading to greater mechanical strength. Moreover, nickel composite coatings offer improved protection against corrosion compared with pure nickel coatings. This review provides a detailed discussion of nickel composite coatings with regard to their comparative advantages compared with pure nickel coatings on different substrates. [ABSTRACT FROM AUTHOR]

The purpose of this study was to investigate the effect of annealing temperature on the structural, morphological, and electrochemical properties of tungsten trioxide (WO3) films, fabricated via electrodeposition and annealed at 50 °C, 250 °C, and 450 °C. Structural analysis using X-ray diffraction (XRD) revealed temperature-induced modifications, transitioning from amorphous to crystalline phases. Morphological studies by field emission scanning electron microscopy (FESEM) demonstrated an increase in grain size with temperature (31 nm, 48 nm, and 53 nm) and the formation of cracks at higher annealing temperatures. Electrochemical characterization showed that the WO3 film annealed at 250 °C exhibited superior redox activity, enhanced ion diffusion, and excellent reversibility. Optical studies highlighted its exceptional performance, with 79.35% optical modulation, a coloration efficiency of 97.91 cm2/C, and rapid switching times (9.8 s for coloration and 7.5 s for bleaching). Furthermore, long-term cycling tests confirmed minimal degradation after 5000 cycles, demonstrating durability. This work provides a comprehensive understanding of the annealing temperature's impact on WO3 films and underscores the novelty of achieving optimal electrochromic (EC) performance through temperature tuning, advancing the design of energy-efficient smart materials. [ABSTRACT FROM AUTHOR]

This work reports the electrochemical fabrication of thin films comprising polyaniline nanofibers (PANI) in conjunction with graphene oxide (GO) and reduced graphene oxide (rGO) on ITO substrate, along with examining the electrochemical properties, with a focus on the influence of the substrate and electrolyte in the electrodeposition methods. The study explores the electrochemical characteristics of these thin films and establishes a flexible framework for their application in diverse sectors such as sensors, supercapacitors, and electronic devices. It analyzes the impact of the substrate and electrolyte in electrodeposition techniques. The effects were studied using techniques such as cyclic voltammetry and chronoamperometry. The fabrication process of PANI/GO and PANI/rGO thin films involved the integration of rGO within PANI via electropolymerization, conducted under sulfuric acid. GO was synthesized by modifying the well-known Hummers' method and characterized by X-ray diffraction (XRD), and Fourier transform infrared spectroscopy (FTIR). SEM showed the diameters of the formed PANI were between 40 and 150 nm, which helped to intertwine the rGO nanosheets with PANI nanofibers to form thin films. The electrochemical behavior of the PANI/rGO thin films was examined using cyclic voltammetry (CV) and chronoamperometry in different electrolytes, including sulfuric acid (H₂SO₄) and potassium nitrate (KNO₃). The CV profiles exhibited distinct oxidation and reduction peaks, with variations in the voltammogram morphology attributed to the nature of the electrolyte and the substrate employed during the electrodeposition process. These results highlight the critical role of both the substrate and electrolyte in governing the electrochemical performance of PANI/rGO thin films. The findings from this study demonstrate a versatile approach for the fabrication of PANI/graphene-based thin films with tunable electrochemical properties, and such a strategy has great application to fabricating other thin film composites for supercapacitors or other control source frameworks requiring enhanced charge storage and electrochemical responsiveness. [ABSTRACT FROM AUTHOR]

Metal-organic frameworks (MOFs) with redox-active metal ions and a variety of organic linkers have been widely investigated as prospective electrode materials for supercapacitors. Here, we generate uniformly dense spherical particles on a nickel foam substrate by a simple and binder-free one-step electrodeposition method by adjusting the deposition conditions. The active cobalt in the Co-MOF thin films can provide a large number of redox sites for the electrochemical reaction, while the uniform binder-free Co-MOF structure can keep enough contact area with the electrolyte to reduce the ion transport resistance. As-prepared CTB-0.9 (Co-MOF with a deposition voltage of − 0.9 V) thin film has a specific capacitance of 797.5 F g−1 at a current density of 1 A g−1, exhibiting excellent electrochemical properties. An asymmetric supercapacitor with CTB-0.9 as the positive material and activated carbon as the negative material also demonstrates competitive electrochemical performances, which has a high energy density of 34.3 Wh Kg−1 at a power density of 36,317.6 W Kg−1. This work may open up an effective approach to realize the electrosynthesis of Co-MOF films, promoting the utilization of Co-based MOFs in energy storage and conversion fields. [ABSTRACT FROM AUTHOR]

Electrochromic (EC) materials allow for dynamic tuning of optical properties via an applied electric field, presenting great potential in energy-efficient technologies, such as smart windows for effective light and temperature regulation. The precise control of precursor concentration has proven to be a powerful approach in tailoring the physicochemical properties of semiconducting metal oxides. In this study, we employed a one-step electrodeposition technique to fabricate tungsten oxide (WO3) thin films, systematically exploring how varying precursor concentrations influence the material's characteristics. X-ray diffraction analysis revealed significant changes in diffraction patterns, reflecting subtle structural modifications due to concentration variations. Additionally, scanning electron microscopy revealed significant changes in the microstructure, showing a progression from small nanogranules to larger agglomerations within the film matrix. The W-25 mM thin film delivered exceptional EC performance, efficiently accommodating lithium ions while showcasing superior EC properties. The optimized electrode, denoted as W-25 mM, showcased exceptional EC metrics, featuring the highest optical modulation at 82.66%, outstanding reversibility at 99%, and a notably high coloring efficiency of 83.01 cm2/C. These findings emphasize the importance of precursor concentration optimization in enhancing the EC properties of WO3 thin films, contributing to the advancement of high-performance, energy-efficient materials. [ABSTRACT FROM AUTHOR]

By changing the electroplating deposition duration, such as 15, 30, 45, and 60 minutes, the NiAg thin films have been synthesised by electrodeposition on copper substrate at a uniform current density of 1 A/dm2. The NiAg thin films were adhered to the substrate at a consistent electrolytic solution temperature of 30°C, and the created electrolyte's pH was maintained within a range of 7 to 8. EDAX, XRD, and SEM techniques have all been used to investigate the structural investigation of electrodeposited NiAg thin films. The FCC crystal structure can be seen by the X-ray diffraction analysis pattern, which indicates that the average crystalline size of the NiAg-coated thin films was between 31 and 64 nm. Images of coated thin films taken with a scanning electron microscope show that, even with longer deposition times, the surface morphology of electrodeposited NiAg thin films is consistent. The Vibrating Sample Magnetometer (VSM) examination was used to investigate the magnetic characteristics. With a greater saturation magnetization of 7.6930 × E-3 emu/cm3 and a lower coercivity of 92 Oe, the NiAg film deposited at 15 minutes shows a better soft magnetic nature. According to the electrochemical analyses of plated NiAg thin films, the NiAg film coated at the 60-minute deposition period showed the lowest corrosion rate, measuring 0.047286 mm/year with a polarization resistance of 3900.9 O. NiAg thin films' mechanical and magnetic characteristics make them suitable to produce MEMS and NEMS based devices. [ABSTRACT FROM AUTHOR]

Electrodeposition of cuprous oxide thin film is becoming a more and more important method, but higher content of Cu2+ and uneven grain size in cuprous oxide thin films fabricated by direct current (DC) electrodeposition lead to serious reduction of transmission and electron transport capacity of the films. To solve these problems, bidirectional pulse electrodeposition (BPD) was applied in this paper to prepare cuprous oxide thin films and the variety on the photo-electrical properties has been presented. The results indicated that grain uniformity of films fabricated by BPD was improved significantly, the grain size distribution range reduced from 5–50 nm to 10–30 nm, the roughness of the films decreased from 5.83 to 5.26 nm, and the proportion of Cu+ in the resulted films increased from 59.21 to 69.61%. The transmittance of films at 550 nm increased from 65.21 to 70.17%, and the surface resistances of the resulted films decreased from 15.7–18.1 to 10.9–11.7 Ω. This method provided a basis for the production of higher-purity and higher-performance thin Cu2O films. [ABSTRACT FROM AUTHOR]

In this study, an electrochemical technique was used to deposit nickel oxide on stainless steel (SS) substrates with varying amounts of the precursor nickel nitrate (N1-0.5M, N2-1M and N3-1.5M), and nickel hydroxides Ni(OH)2 are electrodeposited on the SS substrate. After that, they were subjected to heat treatment to become a homogeneous nickel oxide nanoparticle layer. The deposited films were performed for the structural and morphological analysis by X-ray diffraction, scanning electron microscopy and FTIR. The maximized N3 film exhibited the highest specific capacitance value of 514 F g−1 at 5 mV s−1 in 1 M KOH aqueous electrolyte with great rate capability, resulting in prolonged cycling. [ABSTRACT FROM AUTHOR]

The concept of nanostructuring and doping of hematite (α‐Fe2O3) photoanodes have been widely engaged towards improving their photoelectrocatalytic (PEC) response. Here, a FeCl3‐based solution was modified with 0–10 % polyethylene glycol (PEG) 400 and used as an electrolyte for the electrodeposition of nanostructured α‐Fe2O3 thin films. The electrolyte containing 10 % PEG was further used to prepare Mn‐doped α‐Fe2O3 films by adding 1, 3, 6, and 10 % of MnCl2.4H2O with respect to the molarity of FeCl3. The addition of 10 % PEG into the electrolyte limited particle agglomeration and yielded the best PEC response among the pristine films. The 3 % Mn‐doped α‐Fe2O3 photoanodes produced the highest photocurrent, yielding 2.2 and 6.1‐fold photocurrent enhancement at 1.23 V and 1.5 V vs. RHE respectively, over the pristine films. The improved PEC response is linked to the reduced particle agglomeration and improved charge transport properties observed for the films. Density functional theory (DFT) calculations of the formation energies yielded negative values for the Mn‐doped α‐Fe2O3, which implies that the materials are thermodynamically stable after doping. This work introduces a new pathway for the electrodeposition of doped α‐Fe2O3 films and underscores the roles of Mn‐doping in boosting their PEC response. [ABSTRACT FROM AUTHOR]

In this article, the SnO2/Cu2O p-n heterojunction composite thin films were successfully prepared. XRD, SEM, XPS, UV-Vis DRS, PL and electrochemical tests are adopted to characterize and analyze the structure, composition and photoelectric properties of the SnO2/Cu2O. The influence of the copper ion concentration in the electrolyte solution on the performance of the samples was studied. Methylene blue was considered as the target degradation molecule to evaluate the photocatalytic performance of the prepared samples. The results show that the forbidden band width of the SnO2/Cu2O increases obviously, and the photoluminescence intensity decreases on the contrary. The formation of SnO2/Cu2O p-n heterojunction effectively improves photogenerated carrier separation. The catalytic performance of the photocatalyst was enhanced. Photocatalytic evaluation showed that the degradation rate of SnO2/Cu2O to the methylene blue reached 93.7%. [ABSTRACT FROM AUTHOR]

ZnO films were obtained by electrodeposition technique from commercial Zn2+ solutions and those obtained from spent alkaline batteries. The type of counterion and pH impact directly on the structural, morphological, and optical properties of the electrodeposited ZnO films. The morphological and crystallographic orientation differences observed by X‐ray diffraction (XRD) analysis and high‐resolution field emission scanning electron microscopy (HR‐FESEM), demonstrates the influence of the type and origin of precursors used in the ZnO synthesis process. Those samples grown from commercial nitrate solutions exhibit nanocolumns revealing a preferential growth in the (002) direction. On the other hand, random growth (hexagonal plates, agglomerations, clusters, etc.) is observed in samples obtained through recycled solutions. All deposited samples achieved a transparency close to 80 % and an optical band gap of around 3.30 eV. The as‐deposited films were evaluated toward the photodegradation capacity of methylene blue (MB) for potential technological applications. Results exhibit that samples prepared from recycled ZnCl2 solutions presented more than 80 % degradation per mass of ZnO. This work demonstrates a virtuous circle since ZnO films are deposited by a facile and scalable technique from discarded batteries and used for MB photodegradation. Furthermore, the simplicity of recovery of these substrates after application makes them an attractive and pragmatic option for a range of water treatment applications. Synopsis: Zinc from depleted alkaline batteries is reused to obtain ZnO thin films that remove contaminating dyes from water. [ABSTRACT FROM AUTHOR]

The primary purpose of this article is to synthesize electrochemically a binary semiconductor material ZnS that is generally used for manufacturing solar cells. It has been shown that the properties and composition of the deposits are closely linked to the synthesis conditions, namely the applied potential, the electrolyte concentration and its composition. The electrodeposition was realized from an acidic medium with a pH ranging from 3.5 to 4.5 and containing respectively 0.02 M of zinc chloride (ZnCl2), 0.02 M of sodium thiosulphate (Na2S2O3), and 0.15 M of trisodium citrate (Na3C6H5O7) as complexing agent. The deposition mechanism of ZnS binary alloys was investigated using various electrochemical techniques. ZnS thin films were electrochemically deposited on a tin-doped indium oxide (ITO) substrate in one single step, at a potential of −1 V/SCE. The effects of the concentration ratio ([zinc]/[sulfur]) on the electrochemical, optical, and compositional properties of thin films as well as their surface morphology were also investigated. [ABSTRACT FROM AUTHOR]

We have demonstrated a low-cost and simple method for the fabrication of large-area films using the electrodeposition technique. Fairly superior quality CuIn(Ga)Se2 (CIGS) films were deposited by a one-step electrodeposition method using a salt bath followed by annealing in an argon atmosphere at 550 °C for 1 h. The X-ray analyses demonstrate that the films are crystalline in nature, having a chalcopyrite phase. However, the conversion efficiencies are found to be lower compared to other methods. Our results indicate that CIGS films can be produced effectively via a one-step electrodeposition method. The observed morphology can have a great impact on solar cell efficiency. With suitable modifications, this simple and cheaper manufacturing process will be the best alternative method to the vacuum deposition technique for the fabrication of reliable and flexible CIGS solar cells in the near future. [ABSTRACT FROM AUTHOR]

The presence of metallic cadmium in the electrodeposited cadmium sulfide (CdS) films is a persistent problem that leads to low photoactivity. Changing the deposition mode is a way to address this problem and thus increase the photoelectrochemical performance. Herein, the effect of the deposition mode on the composition of the CdS films prepared under the same deposition parameters is investigated for the first time. In addition, the influence of the time‐off duration on the properties of the electrodeposited thin films is studied. The results of the X‐Ray diffraction, UV–vis spectroscopy, atomic force microscopy, and photoelectrochemical characterizations reveal that the pulse‐deposited CdS films show enhanced microstructural, optical, and morphological properties as compared to that of the film deposited under direct mode. The CdS thin film deposited at time‐off duration of 0.5 s is composed of a pure CdS phase following a mixture of cubic and hexagonal lattice structure. This sample shows a smooth surface, high absorption in UV and visible light and an intense photoresponse of 90 μA under visible light. [ABSTRACT FROM AUTHOR]

In this work, we investigated the effect of substrate on the structural, morphological, and magnetic properties of electrodeposited CoNi thin films from a chloride bath. Three samples of CoNi films were deposited at room temperature onto different substrates: FTO, ITO, and Cu. Electrochemical studies were performed using cyclic voltammetry experiments. Energy-dispersive X-ray spectroscopy (EDX) showed that all the samples had a cobalt content of more than 80%. X-ray diffraction (XRD) spectra revealed that the films deposited on Cu had a face-centered cubic (FCC) phase, while those deposited on ITO and FTO had a mixture of hexagonal close-packed (HCP) and FCC phases. The lattice parameter (a) and crystallite size (D) were strongly dependent on the substrate. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to observe the morphology of the films. All the samples had a granular morphology with spherical grains, but the roughness and surface distribution varied with the substrate. The magnetic properties of the films, such as coercivity (Hc) and squareness (S), were investigated using a vibrating sample magnetometer (VSM). The results showed that Hc and S were both affected by the substrate and the film composition. Overall, our results showed that the substrate had a significant effect on the structural, morphological, and magnetic properties of electrodeposited CoNi thin films. These findings could be used to design and optimize CoNi thin films for specific applications. [ABSTRACT FROM AUTHOR]

This paper presents a novel ultrasonic-assisted electrodeposition process of Mn-doped NiCo2O4 onto a commercial nickel foam in a neutral electroplating bath (pH = 7.0) under an ultrasonic power of 1.2 V and 100 W. Different sample properties were studied based on their crystallinity through X-ray diffraction (XRD), morphology was studied through scanning electron microscopy (SEM), and photodegradation was studied through ultraviolet–visible (UV–Vis) spectrophotometry. Based on the XRD results, the dominant crystallite phase obtained was shown to be a pure single NiCo2O4 phase. The optical properties of the photocatalytic film showed a range of energy band gaps between 1.72 and 1.73 eV from the absorption spectrum. The surface hydroxyl groups on the catalytic surface of the Mn-doped NiCo2O4 thin films showed significant improvements in removing methyl red via photodegradation, achieving 88% degradation in 60 min, which was approximately 1.6 times higher than that of pure NiCo2O4 thin films. The maximum hydrogen rate of the composite films under 100 mW/cm2 illumination was 38 μmol/cm2 with a +3.5 V external potential. The electrochemical performance test also showed a high capacity retention rate (96% after 5000 charge–discharge cycles), high capacity (260 Fg−1), and low intrinsic resistance (0.8 Ω). This work concludes that the Mn-doped NiCo2O4 hybrid with oxygen-poor conditions (oxygen vacancies) is a promising composite electrode candidate for methyl red removal, hydrogen evolution, and high-performance hybrid supercapacitor applications. [ABSTRACT FROM AUTHOR]

Green hydrogen generation technologies are currently the most pressing worldwide issues, offering promising alternatives to existing fossil fuels that endanger the globe with growing global warming. The current research focuses on the creation of green hydrogen in alkaline electrolytes utilizing a Ni-Co-nano-graphene thin film cathode with a low overvoltage. The recommended conditions for creating the target cathode were studied by electrodepositing a thin Ni-Co-nano-graphene film in a glycinate bath over an iron surface coated with a thin copper interlayer. Using a scanning electron microscope (SEM) and energy-dispersive X-ray (EDX) mapping analysis, the obtained electrode is physically and chemically characterized. These tests confirm that Ni, Co, and nano-graphene are homogeneously dispersed, resulting in a lower electrolysis voltage in green hydrogen generation. Tafel plots obtained to analyze electrode stability revealed that the Ni-Co-nano-graphene cathode was directed to the noble direction, with the lowest corrosion rate. The Ni-Co-nano-graphene generated was used to generate green hydrogen in a 25% KOH solution. For the production of 1 kg of green hydrogen utilizing Ni-Co-nano-graphene electrode, the electrolysis efficiency was 95.6% with a power consumption of 52 kwt h−1, whereas it was 56.212. kwt h−1 for pure nickel thin film cathode and 54. kwt h−1 for nickel cobalt thin film cathode, respectively. [ABSTRACT FROM AUTHOR]

Ni thin films were synthesized through the electrodeposition method from three different electrolytes in absence and presence of the magnetic field. They were assessed as electrocatalysts for hydrogen evolution reaction (HER). Herein, we have studied the difference of the electrocatalytic activity of the fabricated materials towards HER in case of using them as fresh samples after the deposition process directly and after keeping them in boxes for 3 weeks (old samples). Moreover, we have studied the changes of the contact angle in case of the fresh and old samples. The old fabricated Ni films from the three electrolytes have shown higher catalytic performance. Moreover, the old and fresh fabricated Ni thin film from citrate has the smallest overpotential value of 234 mV and 288 mV, respectively in comparing with other films. The scanning electron microscope, X-Ray, Atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS) were used for films characterization. [Display omitted] • Different morphologies of Ni films depends on the changing of the electrolyte and magnetic field. • Old samples gives higher catalytic performance towards HER. • The more hydrophobic properties of the surface, the more its catalytic activity towards HER. • The deposited film from citrate under the magnetic field possesses the highest kinetics to HER. [ABSTRACT FROM AUTHOR]

A non-enzymatic glucose sensor using a nickel particles/polyaniline composite has been synthesized on an indium tin oxide electrode. The PAni thin films were deposited onto the ITO surfaces using a repeated potential cycling technique in an aqueous solution containing aniline, sulfuric acid, and lithium perchlorate. Nickel particles were incorporated into the PAni/ITO surfaces using chronopotentiometry. Scanning electron micrograph and X-ray diffraction were employed to investigate the surface morphology and structure of the Ni-PAni composite, while Ultraviolet–visible spectroscopy was used to study the optical properties. The modified electrode was electrochemically characterized using cyclic voltammetry and impedance spectroscopy. The effect of PAni thin film thickness on the nickel deposition process has also been studied. Nickel was chosen due to its reduction potential being within the range where the PAni layer is in a reduced, non-conducting state. The electroactivity of the Ni-PAni/ITO electrode was evaluated through cyclic voltammetry and chronoamperometry and explored its potential for electrocatalytic glucose oxidation in an alkaline (NaOH) electrolyte. Excellent linearity in the peak oxidation current of glucose within the concentration range from 0.02 mM to 9 mM was observed with a high linear regression coefficient of 0.997. The Ni-PAni/ITO electrode displayed a high sensitivity of 215.8 mA mM−1 cm−2 in addition to the fast response time, which is less than 2 s. These results suggest that the Ni-PAni composite has the potential to be an effective electrode material to develop a cost-effective glucose sensor. Schematic illustration of the preparation of Ni-polyaniline electrode for glucose sensing Research Highlights: Nickel nanoparticles were incorporated in the polyaniline thin films by chronopotentiometry method. The prepared Ni-polyaniline hybrids materials exhibit high sensitivity of 215.8 mA mM−1 cm−2 low-response time (2 s), good linearity in the concentration range from 0.1 mM to 12 mM, and low detection limit (0.01mM, S/N = 3). The good analytical performance, low cost, and facile fabrication method make this new electrode material promising for the development of effective glucose sensors. [ABSTRACT FROM AUTHOR]

A new lactate bath was proposed to deposit Co–Cu thin alloy films in nanostructure form onto a steel cathode. The deposition bath contained CuSO4.5H2O, CoSO4.7H2O, CH3CHOHCOOH, and anhydrous Na2SO4 at pH 10. The effects of [Co2+]/[Cu2+] molar ratios, lactate ion concentration, current density (CD), and bath temperature on cathodic polarization, cathodic current efficacy (CCE), composition, and structure of the Co–Cu alloys were investigated. The new bath had a high cathodic current efficiency of 85%, which increased with the applied CD. However, it decreased as the temperature increased. The produced coatings have an atomic percentage of Cu ranging from 19.8 to 99%. The deposition of the Co–Cu alloy belonged to regular codeposition. The Co content of the deposit increased with the amount of Co2+ ions in the bath, lactate concentration, and current density but decreased as the temperature increased. Cobalt hexagonal close-packed (HCP) and copper-rich, face-centered cubic (FCC) Co–Cu phases combine to form the polycrystalline structure of the electrodeposited Co–Cu alloy. The average crystallite size ranges between 46 and 89 nm. An energy dispersive X-ray (EDX) examination confirmed that the deposit contained Cu and Co metals. The throwing power and throwing index of the alkaline lactate bath were evaluated and found to be satisfactory. [ABSTRACT FROM AUTHOR]

The electrodeposition of polyaniline films is usually carried out in acid solutions such as hydrochloric acid, perchloric acid or sulfuric acid, and more rarely in organic acids such as camphorsulfonic acid (CSA). In this study, the impact of the presence of a surfactant in the electrolytic solution based on hydrochloric acid or CSA was evaluated by successively using anionic (sodium dodecyl sulfate, SDS), cationic (cetyltrimethylammonium bromide, CTAB), and non-ionic (Tritonx100) surfactants. Whatever the surfactant and the acid used, the electrochemical oxidation of aniline has successfully led to the formation of a thick polyaniline (PANI) film through a quasi-reversible reaction controlled by the diffusion of aniline monomers. The nature of the surfactant was shown to affect physico-chemical properties of the film, in particular its morphological features (morphology, thickness, roughness), electrochemical activity, specific capacitance, and conductivity. For example, PANI films containing SDS had a spongy morphology when PANI films containing Tritonx100 had a more fibrous and compact structure. Glow Discharge Optical Emission Spectroscopy (GDOES) experiments also highlighted differences depending on the acid used since chloride anions, fromHCl,were present only on the top surface of the PANI films when camphorsulfonate anions were present everywhere throughout the polymer film, which impacts the doping process and electrochemical activity of the films. Moreover, the specific capacitance of the PANI/CSA films is higher and more sensitive to current density variation than the one of PANI/HCl films. Finally, electrochemical impedance experiments evidenced that the conductivity of PANI films electrodeposited from CSA solutions was much higher than the one of PANI films prepared from HCl solutions, and highly dependent on the nature of the surfactant, the most conductive films being obtained in the presence of SDS and Tritonx100. Therefore, the originality of this work comes from the possibility of modulating the conductivity, capacitance and electroactivity of electrodeposited polyaniline films using surfactants of different polarity, and from the determination of the distribution of ions in the films using the GDOES technique, which is rarely used to characterise organic films. [ABSTRACT FROM AUTHOR]

CIGS thin film solar cells have attracted extensive attention due to their high conversion efficiency (the highest conversion efficiency of 23.35%). The electrodeposition method is widely used to prepare CIGS thin films because of its simple process, fast deposition rate, low equipment cost and high material utilization rate. However, the aggregation of Ga, poor crystallinity and the interface recombination led the poor conversion efficiency of 17.3%. In this work, pulsed optic-thermal coupling process was employed to improve the film quality and device performance. With the pulsed optic-thermal coupling process, the surface temperature of film could rise to 550 ℃ in few seconds, which suppressed the prefer reactions between In-Se and Ga-Se. Large-grained CIGS thin films were prepared with fine grains at the back contact eliminated, which improved the crystallinity. The performance of CIGS thin film solar cells was also improved with a conversion efficiency of 9.14% being obtained with the optimized pulsed optic-thermal coupling process. [ABSTRACT FROM AUTHOR]

Chromium electrodeposition from hexavalent Cr (VI) aqueous solutions for Cr thin films and coatings has been vastly used for distinct purposes, due to the attractive appearance and outstanding mechanical, wear and corrosion properties of the resulting coatings. Regardless, its toxicity led to the implementation of European legislation to rescript its use, such as the European Norms Regulation on the Registration, Evaluation, Authorisation, and Restriction of Chemicals (REACH) and Restriction of Certain Hazardous Substances (RoHS). Thus, a replacement for Cr VI must be found, however, it would be important that the resulting films keep their characteristics. In the literature chromium electrodeposition from trivalent chromium (Cr III) aqueous solutions has been proposed and tested, however, its mechanical and optical properties are not comparable with the ones of Cr VI-based coatings and an alternative method is then required as Cr III alone does not deliver the necessary requirements. In this work, a combination of Cr III electrodeposition (ECD) in conjugation with a physical vapour deposition (PVD) multilayered coating of Cr, N, and C is explored to provide a coating capable of fulfilling the industry requirements. Subjecting the developed samples to a Neutral Salt Spray Test (ISO 9227:2027), shows that both the Cr III and Cr III + PVD coatings have similar results regarding corrosion resistance. Moreover, impedance electrochemical spectroscopy demonstrates the coating porosity as the critical point opening the door to further improvements. Aesthetically, applying the PVD layers allows for replicating the former shiny and black chromed look and expands to more different and appealing colours. Hence, this innovative alternative, based on the use of trivalent chromium by electro-deposition followed by PVD coatings, has proven potential to substitute the hexavalent chromium ECD process, while being a viable and sustainable alternative and expanding its use through different colours. [ABSTRACT FROM AUTHOR]

The present work describes the effect of deposition temperatures and pH values on structural, morphological, and electrochemical properties of cuprous oxide (Cu2O) thin films deposited on the conductive SnO2 glass substrates by using electrodeposition technique in an acidic system. The chronoamperometry curve of the solution was tested on an electrochemical workstation. X-ray diffraction patterns indicate that the deposited films have better crystallinity which is deposited at the deposition temperature of 50 °C and pH value of 5–6. Scanning electron microscopy displays that surface morphology of the deposited films varied greatly with the deposition temperature and pH value rising. The results of quantitative study of the target product films by Energy Dispersive Spectrometer (EDS) show that they are all in line with the element content ratio of Cu2O. By measuring the resistivity and conductivity of the deposited films, it was found to be in the semiconductor range. [ABSTRACT FROM AUTHOR]

The microscopic arrangement of alloys has a significant influence on their electrical, thermal, mechanical, and catalytic properties. In this respect, we have developed nickel-cobalt alloy films by electrodeposition on an ITO glass substrate while examining nucleation and growth processes during the first steps of electrocrystallization. Energy Dispersive X-ray Spectroscopy (EDX) approved stoichiometry (1,1) of the alloy elaborated. X-ray diffraction (XRD) showed that the Co-Ni binary electrodeposited at different potentials crystallizes in a cubic structure that belongs to the Pm3̅m space group. From chronoamperometry and cyclic voltammetry curves, we concluded that the Co-Ni/ITO system is quasi-reversible, with diffusion of Ni2+ and Co2+ cations being the controlling step. The ascending part of the current-time transients investigation has shown that the Ni-Co electrodeposition mechanism is characterized by instantaneous nucleation in line with 3D growth. This result is confirmed by comparison of the experimental chronoamperometry data with the theoretical models of Scharifker and Hills on the one hand, and Bewick, Fleischmann, and Thirsk on the other. [ABSTRACT FROM AUTHOR]

In this study, a two-electrode electrodeposition technique was employed to grow thin films of antimony selenide (Sb2Se3) on glass/fluorine-doped tin oxide (FTO) substrates. The highest quality thin films were consistently obtained within the range of 1600 mV to 1950 mV. Subsequent electrodeposition experiments were conducted at discrete voltages to produce various layers of thin films. Photoelectrochemical cell (PEC) measurements were performed to characterize the semiconductor material layers, leading to the identification of both p-Type and n-Type conductivity types. Optical absorption spectroscopic analysis revealed energy bandgap values ranging from 1.10 eV to 1.90 eV for AD-deposited Sb2Se3 samples and 1.08 eV to 1.68 eV for heat-treated Sb2Se3 samples, confirming the semiconducting nature of the Sb2Se3 material. Additionally, other characterization techniques, including X-ray diffraction analysis, reveal that the AD-deposited layers are almost amorphous, and heat treatment shows that the material is within the orthorhombic crystalline system. Heat-treated layers grown at ~1740 mV showed highly crystalline material with a bandgap nearing the bulk bandgap of Sb2Se3. Raman spectroscopy identified vibrational modes specific to the Sb2Se3 phase, further confirming its crystallinity. To explore the thin-film morphology, Scanning Electron Microscopy (SEM) was employed, revealing uniformly deposited material composed of grains of varying sizes at different voltages. Energy Dispersive X-ray analysis (EDX) confirmed the presence of antimony and selenium in the material layers. [ABSTRACT FROM AUTHOR]

Simplified two-electrode electrochemical deposition technique with glass/tin-doped indium oxide (glass/ITO) has been used to grow Mg-doped CdS thin films. As precursors, CdCl2, MgCl2 and Na2S2O3 were utilized. To study the physico-chemical properties of the obtained Mg-doped CdS thin-film instruments such as grazing incidence X-ray diffraction and Raman spectroscopy for structural analysis, UV–Vis spectrophotometry for optical properties and scanning probe microscopy for morphological properties have been used. It is observed from grazing incidence X-ray diffraction (GIXRD) data that the films are polycrystalline with only hexagonal phase. Because more metallic ions are deposited on the substrate, the material becomes more crystalline and increases the intensity of distinctive peaks observed. From the obtained optical characterization, it is observed that deposition time significantly influences the bandgap of the film. As deposition time raised from 10 to 25 min the bandgap decreases from 2.44 to 2.39 which makes the film to become more transparent and absorbs less light at shorter deposition times. According to scanning electron microscope (SEM) images, the surface morphology is uniform with tightly packed grains, and as deposition time goes on the grain shapes become less apparent. [ABSTRACT FROM AUTHOR]

The substance Ag3SbS3 could be a viable option guaranteeing extraordinary performance for electrodes with high storage capacity, but also for solar cell absorbents. For optimal manufacturing, Ag3SbS3 thin films were electrodeposited on Fluorine-Tin Oxide (FTO) and then sulfurized at different temperatures. Structurally, XRD and RAMAN analyses confirmed that hexagonal polycrystallization of the Ag3SbS3 phase is only effective for sulfurization at 475 °C. After elaboration, the thin films were analyzed morphologically, optically and electrochemically to better define their physicochemical performances. Cyclic voltammetry (CV) analysis proved that the co-electrodeposited Ag3SbS3/FTO electrode has a pseudo-capacitor behavior in Li2CO3 (0.5 M) under the [− 700, 0 mV] potential window, developing a specific capacitance of more than 810 F/g. Furthermore, the galvanostatic charge–discharge (GCD) confirms this pseudo-capacitor behavior and that by varying the current from 1 to 5 mA, the specific energy decreases slightly from 14.5 to 11.1 Wh kg−1 to the inverse of the specific power, which varies from 175.1 to 875.3 W. k g−1. Finally, the DFT calculation executed within the framework of generalized gradient approximation (GGA) with a modified Becke-Johnson exchange–correlation potential (mBJ) predicts results extremely comparable to those discovered experimentally and which are precisely an optical gap and an absorption coefficient of the order of 105 cm−1 and 1.62 eV, respectively. All of this enabled us to conclude that Ag3SbS3 possesses the physicochemical characteristics to make it an attractive option in the disciplines of supercapacity as well as photovoltaic. [ABSTRACT FROM AUTHOR]

In this investigation, a nanostructured Cu2O thin film absorber layer is electrodeposited, exploring the impact of varying negative applied voltages and deposition time. Notably, the Cu2O thin film demonstrated optimal absorbance at −0.95 V, contrasting sharply with a minimum at −0.97 V. The authors' findings underscore that the peak absorbance was achieved at −0.95 V, coinciding with the lowest transmittance observed after 80 min of deposition, aligning with a maximal absorption coefficient of 21 × 103 cm−1. At a deposition time of 5 min, the Cu2O thin film exhibited a noteworthy maximum Urbach energy of 2.00 eV and a minimum steepness parameter of 0.013. In contrast, the lowest Urbach energy was recorded at 0.34 eV, with the highest steepness parameter occurring at an applied voltage of 0.93 V. Furthermore, this study revealed a gradual increase in the refractive index with higher applied voltages, reaching its pinnacle at −1.5 V. These results collectively emphasize the nuanced interplay between applied voltage, deposition time and the optical properties of the nanostructured Cu2O thin film. The observed trends hold significant implications for optimizing the performance of thin film absorber layers, particularly in the context of enhancing absorbance and tailoring optical characteristics for specific applications. [ABSTRACT FROM AUTHOR]

Electrodeposition is a long-lasting and efficient process to generate thin or thick films on conductive supports. It is mainly based on electrochemically induced redox reactions involving electroactive precursors, which are intended to form solid deposits onto the electrode surface. More recently, a rather counterintuitive approach has emerged by exploiting electrochemistry to generate non-electroactive and non-conductive thin films (e.g., sol–gel derived materials), based on the electrogeneration of a catalyst that is likely to induce indirectly the formation of a thin film (i.e., without direct electron transfer with the precursors). This account summarizes the major advances made by our group in this field, focusing primarily on electro-induced sol–gel bioencapsulation and electro-assisted self-assembly of oriented and functionalized mesoporous silica films.

Thin films of cadmium telluride (CdTe) have attained the attention of researchers due to the potential application in solar cells. However, cost-effective fabrication of solar cells based on thin films along with remarkable efficiency and control over optical properties is still a challenging task. This study presents an analysis of the structural, optical and electrical properties of undoped and Cu-doped CdTe thin films fabricated on ITO coated glass substrates using an electrodeposition process with a focus on practical applications. Electrolytes of cadmium (Cd), tellurium (Te) and copper (Cu) are prepared with a low molarity of 0.1 M. Thin films are deposited by keeping current density in the range of 0.12–0.3 mA/cm2. Copper doping is varied (2-10 wt%) for the optimized sample. X-ray diffraction crystallography indicates that both undoped CdTe and Cu-doped CdTe films crystallize into a dominant hexagonal lattice. Direct energy band gap is observed for both undoped and doped conditions. The study revealed a drop in the optical band gap energy to ∼1.46 eV with the increase in doping (Cu) concentration from 2 to 10 wt%. Increase in mobility and conductivity is observed with the increase in current density of the deposited undoped CdTe thin films. Whereas, Cu doping of 6 wt% produced thin films with acceptable mobility and conductivity for the doped samples. Furthermore, photoluminescence (PL) spectroscopy unveiled a multitude of emission peaks encompassing the visible spectrum, arising from the combination of electrons and holes through both direct and indirect recombination processes. Findings of this study suggest that chemically produced CdTe thin films would be suitable for use as low-cost applications pertaining to solar cells.

The electrodeposition of polyaniline films is usually carried out in acid solutions such as hydrochloric acid, perchloric acid or sulfuric acid, and more rarely in organic acids such as camphorsulfonic acid (CSA). In this study, the impact of the presence of a surfactant in the electrolytic solution based on hydrochloric acid or CSA was evaluated by successively using anionic (sodium dodecyl sulfate, SDS), cationic (cetyltrimethylammonium bromide, CTAB), and non-ionic (Tritonx100) surfactants. Whatever the surfactant and the acid used, the electrochemical oxidation of aniline has successfully led to the formation of a thick polyaniline (PANI) film through a quasi-reversible reaction controlled by the diffusion of aniline monomers. The nature of the surfactant was shown to affect physico-chemical properties of the film, in particular its morphological features (morphology, thickness, roughness), electrochemical activity, specific capacitance, and conductivity. For example, PANI films containing SDS had a spongy morphology when PANI films containing Tritonx100 had a more fibrous and compact structure. Glow Discharge Optical Emission Spectroscopy (GDOES) experiments also highlighted differences depending on the acid used since chloride anions, from HCl, were present only on the top surface of the PANI films when camphorsulfonate anions were present everywhere throughout the polymer film, which impacts the doping process and electrochemical activity of the films. Moreover, the specific capacitance of the PANI/CSA films is higher and more sensitive to current density variation than the one of PANI/HCl films. Finally, electrochemical impedance experiments evidenced that the conductivity of PANI films electrodeposited from CSA solutions was much higher than the one of PANI films prepared from HCl solutions, and highly dependent on the nature of the surfactant, the most conductive films being obtained in the presence of SDS and Tritonx100. Therefore, the originality of this work comes from the possibility of modulating the conductivity, capacitance and electroactivity of electrodeposited polyaniline films using surfactants of different polarity, and from the determination of the distribution of ions in the films using the GDOES technique, which is rarely used to characterise organic films.

The hereby work presents the iron-nickel alloys electroplated on the different metallic substrates (aluminium, silver, brass) using galvanostatic deposition, with and without presence of the external magnetic field (EMF). The films were obtained in the same electrochemical bath composition - mixture of iron and nickel sulphates (without presence of additives) in the molar ratio of 2 : 1 (Ni : Fe), the electric current density (50.0 mA/cm2), and the time (3600 s). The mutual alignment of the electric (E) and magnetic field (B) was changeable - parallel and perpendicular. The source of EMF was a set of two permanent magnets (magnetic field strength ranged from 80 mT to 400 mT). It was analysed the surface microstructure, composition, morphology, thickness and the mechanical properties (roughness, work of adhesion). The surface morphology and the thickness of films were observed by Scanning Electron Microscopy (SEM) and Confocal Laser Scanning Microscopy (CLSM). The elemental composition of all FeNi films was measured using Wavelength Dispersive X-Ray Fluorescence (WDXRF). The crystalographic analysis of the deposits was carried out by X-Ray Diffraction. Depending on the used substrate, modified external magnetic field orientation influenced the tribological and physio-chemical properties of the deposited layers. The diamagnetic substrates and EMF application reduced the FeNi thickness and the average crystallites size, in contrast to the paramagnetic substrate. Parallel EMF increased the value of the tribological parameters for CuZn and Ag but decreased for Al. The content of FeNi structure was rising in the case of diamagnetic substrate and the dependence was opposite on the paramagnetic substrate. [ABSTRACT FROM AUTHOR]

The n- type silicon nanowires with vertically aligned different lengths and diameters were produced from the commercial n-type silicon wafers with orientation using the metal assisted chemical etching method. Then, in order to fabricate p-type cuprous oxide/n-type silicon nanowire heterojunctions, the p‑type cuprous oxide thin films were electrodeposited on the produced n-silicon nanowires. The X-ray diffraction patterns revealed that both the n-type silicon nanowires and p-type cuprous oxide/n-type silicon nanowire heterojunctions have cubic structure with a single phase. The cross-section field emission scanning electron microscopy images clearly showed the formation of the nanowires that have different lengths and diameters changing with the etching time. The optical characterizations by ultraviolet-visible-near infrared region spectrometry indicated that the reflectivity values of silicon nanowires and p-cuprous oxide/n-type silicon nanowire heterojunctions are much lower that of n-type silicon wafer. In addition, the diode performances of the heterojunctions were determined by current–voltage measurements and their ideality factors were found to be changed considerably depending on the structure of nanowires. [ABSTRACT FROM AUTHOR]