Search

Control of the formation of dust particles in a silane deposition plasma is very important for avoiding electrical shunts in devices, such as thin film silicon solar cells. In this work we present a noninvasive in situ method for identification of the plasma regime, based on optical emission spectroscopy (OES), which can be applied to silane/hydrogen plasmas at low substrate temperatures. By monitoring the OES spectra as a function of the position perpendicular to the plasma electrodes we developed a method to identify the transition of a plasma from the dust free to a dusty regime, which was confirmed by TEM images of layers deposited in both regimes. Using this technique we mapped this transition as a function of applied forward very-high frequency (VHF) power and hydrogen dilution at different substrate temperatures. The advantage of this technique is that the experiment is insensitive to optical transmission loss at the viewport due to deposition of silicon films. As the transition from the dust free to the dusty regime is substrate temperature dependent and the transition from amorphous to nanocrystalline growth mainly depends on hydrogen dilution, a limited parameter window has been defined in which dust-free amorphous silicon can be deposited at low substrate temperatures. A single simple OES technique can be used for in situ monitoring of amorphous to nanocrystalline transition as well as the onset of the dusty regime in a thin film silicon cell fabrication process. [ABSTRACT FROM AUTHOR]

In thin-film silicon research, it is essential to have an accurate and fast method for the determination of the thickness and material properties of layers down to 20 nm thick. We report on the interpretation of optical measurements by spectroscopy of reflection and transmission in the range 400–1000 nm. A method is developed to fit these spectra based on the O’Leary–Johnson–Lim model and material properties obtained from thicker layers. These results are correlated with the results obtained from other techniques for accurate thickness measurements. We conclude that a reliable fit of the optical measurements is possible down to a layer thickness of 20 nm. [ABSTRACT FROM AUTHOR]

Nanostructured thin silicon-based films have been deposited using the hot-wire chemical vapour deposition (HWCVD) technique at the University of the Western Cape. A variety of techniques including optical and infrared spectroscopy, Raman scattering spectroscopy, X-rays diffraction (XRD) and transmission electron microscopy (TEM) have been used for characterisation of the films. The electrical measurements show that the films have good values of photoresponse, and the photocurrent remains stable after several hours of light soaking. This contribution will discuss the characteristics of the hydrogenated nanocrystalline silicon thin films deposited using increased process chamber pressure at a fixed hydrogen dilution ratio in monosilane gas. [ABSTRACT FROM AUTHOR]