1. Cluster coarsening in zinc oxide thin films by postgrowth annealing.
- Author
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Tan, S. T., Sun, X. W., Zhang, X. H., Chua, S. J., Chen, B. J., and Teo, C. C.
- Subjects
THIN films ,SURFACES (Technology) ,THICK films ,SURFACE coatings ,ELECTRON microscopy ,SOLID state physics ,CRYSTAL growth ,ELECTRIC currents - Abstract
Postgrowth annealing was carried out on ZnO thin films grown by metal-organic chemical-vapor deposition. It was found from the scanning electron microscopy and atomic force microscopy measurements that the morphology of the thin films changed drastically after annealing. The as-grown thin films consist of fine nanoscale-sized sheets with random orientation. Upon annealing at 800 °C, the ZnO nanosheets changed to three-dimensional nanoneedles. The different types of the mass transport mechanisms are discussed and correlated with the experimental results. A coarsening kinetics developed by Lifshitz and Slyozov [J. Phys. Chem. Solids 19, 35 (1961)] and Wagner [Z. Elektrochem. 65, 581 (1961)] was used to estimate the activation energy of the coarsening process. The activation energy of the Ostwald ripening in ZnO films was estimated in the first attempt, and the value is at around 1.33 eV. Hall effect and photoluminescence measurements were carried out to investigate the effect of coarsening on electrical and optical properties of the ZnO thin films. [ABSTRACT FROM AUTHOR]
- Published
- 2006
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