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In this paper, results of surface modification, using a laser-produced plasma source of extreme ultraviolet, and the extreme ultraviolet induced low temperature plasmas, are presented. It was shown that irradiation of different materials by intense extreme ultraviolet pulses results in strong changes of the surface morphology. Examples of micro- and nanostructures obtained this way are presented. It was also demonstrated that a dual action of the radiation pulses and low temperature plasmas allows to modify a molecular structure of exposed materials. [ABSTRACT FROM AUTHOR]

In this work we present recent results on nanoscale imaging in the extreme ultraviolet and soft X-ray spectral ranges, describing three novel imaging systems dedicated for high spatial resolution imaging of nanoscale objects with the extreme ultraviolet and soft X-ray radiations. The extreme ultraviolet and soft X-ray full field microscopes operate at 13.8 nm and 2.88 nm wavelengths and are capable of imaging of nanostructures with a sub-50 nm spatial resolution. A soft X-ray contact microscope operates in the "water-window" spectral range from 2.3 to 4.4 nm wavelength, to obtain images of an internal structure of the investigated object in a thin surface layer of soft X-ray light sensitive photoresist. The development of such compact imaging systems may, in the near future, be important from the point of view of new research related to biological, material science, and nanotechnology applications. Such preliminary applications are also shown in the studies of biological samples, including carcinoma cells, diatoms, and neurons. [ABSTRACT FROM AUTHOR]

Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected. [ABSTRACT FROM AUTHOR]

In this work, spectral investigations of photoionized He plasmas were performed. The photoionized plasmas were created by irradiation of helium stream, with intense pulses from laser-plasma extreme ultraviolet (EUV) source. The EUV source was based on a double-stream Xe/Ne gas-puff target irradiated with 10 ns/10 J Nd:YAG laser pulses. The most intense emission from the source spanned a relatively narrow spectral region below 20 nm, however, spectrally integrated intensity at longer wavelengths was also significant. The EUV radiation was focused onto a gas stream, injected into a vacuum chamber synchronously with the EUV pulse. The long-wavelength part of the EUV radiation was used for backlighting of the photoionized plasmas to obtain absorption spectra. Both emission and absorption spectra in the EUV range were investigated. Significant differences between absorption spectra acquired for neutral helium and low temperature photoionized plasmas were demonstrated for the first time. Strong increase of intensities and spectral widths of absorption lines, together with a red shift of the K-edge, was shown. [ABSTRACT FROM AUTHOR]

In this paper an efficient micromachining of poly(vinylidene fluoride) (PVDF) by direct photo-etching with a laser-plasma EUV (extreme ultraviolet) source was demonstrated for the first time. Mass spectroscopy was employed to investigate the ablation products and revealed emission of numerous molecular species of C-containing fragments of the polymer chain. Chemical surface changes after irradiation were investigated using X-ray photoelectron spectroscopy (XPS). The XPS spectra obtained for PVDF samples, irradiated with low and high EUV fluence, indicate significant differences between chemical structures in near-surface layers. It was shown that irradiation with low fluence results in defluorination and thus carbon enrichment of the polymer in near-surface layer. In contrary, irradiation with high fluence leads to intense material ablation and hardly modifies the chemical structure of the remaining material. [ABSTRACT FROM AUTHOR]

Abstract: In this work, a 10Hz laser-plasma extreme ultraviolet (EUV) source built for surface processing of polymers is presented. The source is based on a double-stream gas puff target created in a vacuum chamber synchronously with the pumping laser pulse. The target is formed by pulsed injection of Kr, Xe or a KrXe gas mixture into a hollow stream of helium. The EUV radiation is focused using a grazing incidence gold-plated ellipsoidal collector. Spectrum of the reflected radiation consists of a narrow feature with intensity maximum at 10–11nm wavelength and a long-wavelength spectral tail up to 70nm. The exact spectral distribution depends on a gas applied for plasma creation. To avoid strong absorption of the EUV radiation in a residual gas present in the chamber during the source operation a two step differential pumping system was employed. The system allows for polymer processing under relatively high vacuum conditions (10−5 mbar) or in a reactive gas atmosphere. Polymer samples can be irradiated in a focal plane of the EUV collector or at some distance downstream the focal plane. This way fluence of the EUV beam at the polymer surface can be regulated. [Copyright &y& Elsevier]

Abstract: In this work a laser-plasma EUV source based on a gas puff target was used for micro- and nanostructuring of polyethylene terephthalate (PET), polyethylene naphthalate (PEN) and poly-oxydiphenylene-pyromellitimide (Kapton HN) foils. The plasma radiation was focused using a gold-plated grazing incidence ellipsoidal collector. The collector allowed for effective focusing of Kr plasma radiation from the wavelength range λ =9–70nm. The polymer foils were irradiated in the focal plane or at some distance downstream the focal plane of the EUV collector. The surface morphology of the irradiated polymer samples was investigated using a scanning electron microscope (SEM) and the chemical changes by X-ray photoelectron spectroscopy (XPS). Different kinds of micro- and nanostructures created in near-surface layers of the polymers were obtained. The form of the structures depends on the type of polymer and the EUV exposure. In case of PEN even a single shot was sufficient to obtain visible changes in surface morphology. In case of Kapton clearly visible surface modification requires tens of EUV pulses. To investigate the changes in the chemical structure XPS spectra, corresponding to the valence band of the polymer samples, were measured. Significant differences were revealed in the XPS spectra of irradiated and not-irradiated polymers showing decrease of functional groups containing oxygen was indicated. [Copyright &y& Elsevier]

In this work, the radiation from a laser-plasma extreme ultraviolet (EUV) source based on a double-stream gas-puff target was used for surface modification of polyethylene terephthalate (PET). The spectrum of the wide band radiation focused with a gold-coated ellipsoidal collector consisted of a narrow feature with maximum at 10 nm and a long-wavelength tail up to 70 nm. The PET samples were mounted in the focal plane of the EUV collector or at some distance downstream this plane and irradiated for 0.1 s-2 min with 10-Hz repetition rate. The polymer samples after irradiation were rinsed in acetone. Surface morphologies of the PET samples after irradiation were investigated using a scanning electron microscope and atomic force microscope. Different kinds of surface micro- and nanostructures were created as a result of irradiation depending on the EUV fluence and number of pulses. Acetone treatment of the polymer samples after irradiation resulted in formation of additional nanostructures. In this case the nanostructures were revealed even after exposure with a single EUV pulse. [ABSTRACT FROM AUTHOR]

We have investigated the influence of oriented microstructures at modified polyethylene terephthalate (PET) on the adhesion and alignment of Chinese hamster ovary (CHO) cells. For surface modification, the PET foils were exposed to the radiation of a laser-plasma extreme ultraviolet (EUV) source based on a double-stream gas-puff target. The emission of the plasma was focused onto the samples by means of a gold-plated ellipsoidal collector. The spectrum of the focused radiation covered the wavelength range from 9 to 70 nm. The PET samples were irradiated with the EUV pulses at a repetition rate of 10 Hz in a high vacuum. For control experiments, PET samples were also irradiated in air with the light of a 193 nm ArF-excimer laser. Different kinds of surface microstructures were obtained depending on the EUV or laser fluence and pulse number, including oriented wall- and ripple-type structures with lateral structure periods of a few µm. The surface morphology of polymer samples after the irradiation was investigated using a scanning electron microscope (SEM). Changes in chemical surface structure of the irradiated samples were investigated using X-ray photoelectron spectroscopy (XPS). We demonstrated that the cells show good adhesion and align along oriented wall- and ripple-type microstructures on PET surfaces produced by the EUV irradiation. [ABSTRACT FROM AUTHOR]

Extreme ultraviolet (EUV) radiation is the electromagnetic radiation ranging from vacuum ultraviolet to soft X-rays. A single EUV photon carries enough energy to ionize any atom or molecule. The penetration depth of the radiation in any material is very short, ranging from tens to hundreds nanometers. Intense EUV pulses can remove material from the surface or modify its morphology or/and chemical structure. In this work, the radiation from a laser-plasma EUV source based on a double-stream gas-puff target was used for surface modification of polyethylene terephthalate (PET). The PET samples were irradiated with the EUV pulses emitted from krypton plasma and focused with a gold-plated ellipsoidal collector. The spectrum of the focused radiation covered the wavelength range from 9 to 70 nm. The PET samples were irradiated for 1 s–2 min at a 10-Hz repetition rate. Surface morphology of polymer samples after irradiation was investigated using a scanning electron microscope. Changes in chemical surface structure of the irradiated samples were investigated using an X-ray photoelectron spectroscopy. Different kinds of surface microstructures were obtained depending on the EUV fluence in a single pulse and the total EUV fluence. XPS measurements also revealed a modification of the chemical structure. [ABSTRACT FROM AUTHOR]

Extreme ultraviolet (EUV) covers wavelength range from about 5 nm to 50 nm. That is why EUV is especially applicable for imaging and patterning on nanometer scale length. In the paper periodic nanopatterning realized by interference lithography and high resolution holographic nanoimaging performed in a Gabor in-line scheme are presented. In the experiments a compact table top EUV laser was used. Preliminary studies on using a laser plasma EUV source for nanoimaging are presented as well. [ABSTRACT FROM AUTHOR]

The surface modification of polyethylene terephthalate (PET) polymer films has been performed by irradiation of extreme ultraviolet photons to investigate the effect of surface structuring on wettability control. For biomedical engineering applications, surface structuring and wettability control of PET films could enhance the polymer biocompatibility by promoting cell adhesion and consequently proliferation. The PET films are irradiated with laser plasma extreme ultraviolet source based on double stream gas puff target under different environments. The extreme ultraviolet modified PET film surfaces are characterized by atomic force microscopy and WCA goniometer. The extreme ultraviolet surface modification resulted in the formation of nano- and microstructuring on the polymer surfaces. The surface structuring consequently increased WCA making the PET surfaces more hydrophobic. The results demonstrate the direct relationship between surface roughness and hydrophobicity for extreme ultraviolet modified PET samples. [ABSTRACT FROM AUTHOR]

Extreme ultraviolet (EUV) radiation is absorbed in a thin surface layer of any material. Irradiation of material samples with intense EUV pulses may cause different surface changes. Some of them, especially connected with material desorption, can be clearly visible using an optical or electron microscope. Other changes concerning crystal structure or chemical composition may not be visible under the microscope. They can however be detected using the EUV radiation itself. In this paper a new method of measurement of surface changes by irradiation with a laser-plasma EUV source is presented. The radiation was collected and focused on a material surface using a specially designed multifoil collector. Radiation scattered or excited in the material was detected with the use of a Wolter-type mirror coupled to a back-illuminated CCD camera. Depending on material samples, images with different intensity distributions were registered. For some samples, the intensity distributions of the images obtained before and after irradiation were slightly different. The intensity differences in such cases allowed us to obtain differential images. The appearance of such images was assumed to be evidence of surface changes. [ABSTRACT FROM AUTHOR]

A laser-plasma extreme ultraviolet source equipped with grazing incidence and Mo/Si collectors was used for surface modification of selected polymers. Surface morphology after irradiation was investigated. Different forms of nanostructures were obtained depending on polymer and irradiation conditions. [ABSTRACT FROM AUTHOR]