1. Scaling of the Nonlocal Spin and Baseline Resistances in Graphene Lateral Spin Valves.
- Author
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Hu, Jiaxi, Stecklein, Gordon, Deen, David A., Su, Qun, Crowell, Paul A., and Koester, Steven J.
- Subjects
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SPIN valves , *GRAPHENE , *CHEMICAL vapor deposition , *THERMOELECTRIC effects , *SPIN polarization , *NUCLEAR spin , *N-type semiconductors - Abstract
Graphene lateral spin valves (LSVs) are promising devices for future memory and magnetic field sensing applications. In this article, we study the dependence of the nonlocal spin resistance, $\Delta {R}_{{\text {NL}}}$ , and the baseline resistance, ${R}_{{\text {BS}}}$ , as a function of the graphene channel width, ${W}$. The scaling trend is quantitatively assessed by using graphene deposited by chemical vapor deposition, which provides a large number of devices with consistent performance. As ${W}$ is scaled from 10 to $0.5~\mu \text{m}$ , the change in $\Delta {R}_{{\text {NL}}}$ matches the theory of contact-induced spin relaxation with a current spin polarization of 3%–5% and a spin diffusion length of $\lambda _{s} = 1.5$ – $2.5~\mu \text{m}$. We also observe a systematic and dramatic decrease in ${R}_{{\text {BS}}}$ , which we attribute to the reduction in charge current spreading. However, we find in the narrowest devices that a small ${R}_{{\text {BS}}}$ remains that arises due to thermoelectric effects, and this trend is confirmed using gate voltage- and charge current-dependent analyses. Finally, we introduce a nonideality factor, ${m} = \vert {R}_{{\text {BS}}} / \Delta {R}_{{\text {NL}}}\vert $ , as a figure of merit to describe the suppression of the baseline relative to the spin signal. In an LSV with ${L} = {1.5}\,\,\mu \text{m}$ , ${W} = {0.5}\,\,\mu \text{m}$ , and n-type conduction, the nonideality factor is as low as ${m} = {0.0252}\,\,\pm \,\,0.0202$ at room temperature showing that nearly ideal bipolar and symmetric spin signals can be achieved in graphene LSVs. [ABSTRACT FROM AUTHOR]
- Published
- 2019
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