51. Highly sensitive positive-working molecular resist based on new molecule
- Author
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Shigeki Hattori, Tetsuro Nakasugi, Arisa Yamada, Satoshi Saito, Koji Asakawa, and Takeshi Koshiba
- Subjects
Aqueous solution ,Materials science ,Molecular electronics ,Condensed Matter Physics ,Photochemistry ,Highly sensitive ,chemistry.chemical_compound ,Resist ,chemistry ,Cathode ray ,Organic chemistry ,Molecule ,Electrical and Electronic Engineering ,Glass transition ,Benzene - Abstract
A highly sensitive positive-working molecular resist based on a new molecule, 1,3,5-tris[p-(p-hydroxyphenyl)-phenyl]benzene (THTPPB), was designed and synthesized. THTPPB showed a high glass transition temperature (Tg) of 145°C. Some acid-leaving groups were attached to THTPPB to realize positive-working performance developed by an alkaline aqueous developer. 70nm line-and-space (1:1) positive tone pattern was fabricated with high sensitivity (
- Published
- 2009
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