915 results on '"De Gendt, Stefan"'
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52. Resist reflow methodology development to investigate interfacial interactions
53. Extraction of roughness measurements from thin resists with low signal-to-noise-ratio (SNR) SEM images by applying deep learning denoiser
54. Growth and integration challenges for carbon nanotube interconnects
55. Growth mechanisms of interfacial carbon layers at the epitaxial Al2O3(0001)/Cu(111) interface as application for epitaxial film lift-off.
56. In-situ ATR-FTIR for dynamic analysis of superhydrophobic breakdown on nanostructured silicon surfaces
57. YOLOv8 for defect inspection of hexagonal directed self-assembly patterns: a data-centric approach
58. SEMI-CenterNet: a machine learning facilitated approach for semiconductor defect inspection
59. (Invited) Integrated Perovskites Oxides on Silicon: From Optical to Quantum Applications
60. (Dielectric Science & Technology Thomas Callinan Award) Materials and Processes As Enablers for Moore Moore and Beyond Moore Technologies
61. Thermal Annealing of Graphene Implanted with Mn at Ultralow Energies: From Disordered and Contaminated to Nearly Pristine Graphene
62. Low-voltage aberration-corrected SEM metrology of thin resist for high-NA EUVL
63. Enhanced nucleation of Ni nanoparticles on TiN through H3BO3-mediated growth inhibition
64. Electrical characterization of CNT contacts with Cu Damascene top contact
65. Area-Selective Deposition of AlOx and Al-Silicate for Fully Self-Aligned Via Integration.
66. Correlation between number of walls and diameter in multiwall carbon nanotubes grown by chemical vapor deposition
67. Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography
68. Understanding Selectivity Loss Mechanisms in Selective Material Deposition by Area Deactivation on 10 nm Cu/SiO2 Patterns
69. Correction to Doping Graphene with Substitutional Mn
70. Integrated Perovskites Oxides on Silicon: From Optical to Quantum Applications
71. EUV lithography line-space pattern rectification using block copolymer directed self-assembly: a roughness and defectivity study
72. Integration and electrical characterization of carbon nanotube via interconnects
73. Carbon nanotube–carbon nanotube contacts as an alternative towards low resistance horizontal interconnects
74. Au3-Decorated graphene as a sensing platform for O2 adsorption and desorption kinetics
75. Growth Dynamics of Epitaxial Interfacial Carbon Layers at the Epitaxial Al2o3(0001)/Cu(111) Interface for Scalable High-Quality Graphene Transfer Applications
76. Code Generation Using Machine Learning: A Systematic Review
77. Bond Defects in Graphene Created by Ultralow Energy Ion Implantation
78. Oxygen incorporation in TiN for metal gate work function tuning with a replacement gate integration approach
79. (Invited) Area-Selective Atomic Layer Deposition for Interconnect Applications
80. (Invited) Selective Metal Deposition for Advanced Metallization Schemes
81. Tuning the spintronic properties of graphene with atomically precise Au clusters
82. Breakdown of Universal Scaling for Nanometer-Sized Bubbles in Graphene
83. Optimizing YOLOv7 for semiconductor defect detection
84. Au3-Decorated graphene as a sensing platform for O2 adsorption and desorption kinetics.
85. Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography
86. Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide
87. Nanomechanical Characterization of Organic Surface Passivation Films on 50 nm Patterns during Area-Selective Deposition
88. Role of Stronger Interlayer van der Waals Coupling in Twin‐Free Molecular Beam Epitaxy of 2D Chalcogenides
89. (Invited) Atomic-Scale Investigations on the Wet Etching of Group IV Semiconductors in Acidic H2O2 Solution: The Case Ge Versus Si-Ge
90. Power spectral density as template for modeling a metal-oxide nanocluster resist to obtain accurate resist roughness profiles
91. Multicomponent Covalent Chemical Patterning of Graphene
92. Silicon Compatible Emerging Materials, Processes, and Technologies for Advanced CMOS and Post- CMOS Applications 11
93. A CMOS Compatible Carbon Nanotube Growth Approach
94. High Mobility Channel Materials and Novel Devices for Scaling of Nanoeelectronics beyond the Si Roadmap
95. Extraction of roughness measurements from thin resists with low signal-to-noise-ratio (SNR) SEM images by applying deep learning denoiser
96. Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems
97. Doping Graphene with Substitutional Mn
98. Surface Chemistry and Nanoscale Wet Etching of Group IV Semiconductors in Acidic H2O2 Solutions
99. Understanding the impact of Cu surface pre-treatment on Octadecanethiol-derived self-assembled monolayer as a mask for area-selective deposition
100. Aqueous chemical solution deposition of ultrathin lanthanide oxide dielectric films
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