151. Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy.
- Author
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Maw, W., Stevens, F., Langford, S. C., and Dickinson, J. T.
- Subjects
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SILICON nitride , *ATOMIC force microscopy - Abstract
Nanometer scale single asperity tribochemical wear of silicon nitride was examined by measuring the wear of atomic force microscope tips translated against a variety of substrates in aqueous solutions. We show that the chemical nature of the substrate plays an important role: significant wear was observed only when the substrate surface is populated with appropriate metal-hydroxide bonds. Mica and calcite substrates, whose water-exposed cleavage surfaces lack these bonds, produced little if any tip wear. As a function of contact force F[SUBN] and scan duration t, the length of the tips in this work decreases approximately as (F[SUBN]t)[SUP0.5]. We propose that pressure-induced intermediate states involving hydroxyl groups form on both the tip and the substrate; chemical reactions subsequently form transient bridging chemical bonds that are responsible for tip wear. [ABSTRACT FROM AUTHOR]
- Published
- 2002
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