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202. Development of precision Wolter mirrors for solar x-ray observations

204. Single-nanometer focusing of hard x-rays by Kirkpatrick–Baez mirrors

210. Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm

214. Erratum: Breaking the 10 nm barrier in hard-X-ray focusing

215. Breaking the 10 nm barrier in hard-X-ray focusing

216. Novel Scheme of Figure-Error Correction for X-ray Nanofocusing Mirror

218. High-resolution diffraction microscopy using the plane-wave field of a nearly diffraction limited focused x-ray beam

219. Wavefront Control System for Phase Compensation in Hard X-ray Optics

220. Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm

221. Development of adaptive mirror for wavefront correction of hard x-ray nanobeam

222. Focusing mirror for x-ray free-electron lasers

224. Direct determination of the wave field of an x-ray nanobeam

227. Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

228. Efficient focusing of hard x rays to 25nm by a total reflection mirror

230. Hard X-ray Focusing less than 50nm for Nanoscopy/spectroscopy

231. Fabrication of X-ray Mirror for Hard X-ray Diffraction Limited Nanofocusing

232. Development of a Scanning X-ray Fluorescence Microscope Using Size-Controllable Focused X-ray Beam from 50 to 1500nm

234. High-spatial-resolution scanning x-ray fluorescence microscope with Kirkpatrick-Baez mirrors

235. At-wavelength figure metrology of total reflection mirrors in hard x-ray region

237. At-wavelength figure metrology of hard x-ray focusing mirrors

240. Hard x-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy

241. Element Array by Scanning X-ray Fluorescence Microscopy after Cis-Diamminedichloro-Platinum(II) Treatment

242. Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50nm

243. Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors

244. Relative angle determinable stitching interferometry for hard x-ray reflective optics

245. Focusing Hard X-rays to Sub-50 nm Size by Elliptically Figured Mirror

246. Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evaluation of Focusing Properties

247. Stitching Interferometry for Surface Figure Measurement of X-ray Reflective Optics

248. Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement

249. Microstitching interferometry for nanofocusing mirror optics

250. Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics

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