201. AlGaAs/GaAs double‐heterojunction high electron mobility transistors grown by low‐pressure organometallic vapor phase epitaxy
- Author
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D. Ackley, N. Nouri, Yung‐Yi Tu, D. Kasemset, C. Colvard, and Rong-Ting Huang
- Subjects
Electron mobility ,Materials science ,Hall effect ,Saturation current ,Transconductance ,Analytical chemistry ,General Physics and Astronomy ,Field-effect transistor ,Heterojunction ,High-electron-mobility transistor ,Epitaxy - Abstract
AlGaAs/GaAs double‐heterojunction high electron mobility transistors (DHHEMTs) grown by low‐pressure organometallic vapor phase epitaxy are reported in this communication. The magnetic field‐dependent Hall effect measurement was used to characterize the sheet carrier density and electron mobility of the two‐dimensional electron gas (2‐DEG). At 77 K the sheet carrier density and the electron mobility were 1.38×1012 cm−2 and 52 900 cm2 /V s, respectively, in a DHHEMT structure with an undoped Al0.28Ga0.72As spacer layer of 120 A, while they were 7.12×1011 cm−2 and 65 100 cm2 /V s, respectively, in a comparable single‐heterojunction HEMT structure. DHHEMT’s with 0.5‐μm‐gate length and 75‐μm‐gate width have been fabricated with dc saturation current of 500 mA/mm and dc transconductance of 250 mS/mm. These results are comparable to those produced with molecular‐beam epitaxy.
- Published
- 1990