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A one-dimensional two-stage focusing system using two deformable mirrors was constructed. To realize the precise elliptical shapes, the mirror deformations were finely adjusted using the pencil-beam scan, which is a method of wavefront measurement. X-rays of 10 keV energy were one-dimensionally focused to a full width at half maximum of 90 nm, which agrees well with the diffraction limit.

An achromatic and high-resolution hard X-ray microscope was developed, in which advanced Kirkpatrick-Baez mirror optics with four total-reflection mirrors was employed as an objective. A fine test pattern with a 100 nm feature size could successfully be resolved. Full-field imaging, in combination with X-ray absorption near edge structure (XANES) spectroscopy, was used to characterize tungsten particles. XANES spectra were obtained over the entire observation area, showing good agreement with the XANES spectrum of pure tungsten.

The relationships among pulsatile LH secretion pattern, estrogen secretion, and expression of the uterine estrogen receptor gene were examined throughout the estrous cycle in beagle bitches. In Experiment 1, blood samples were collected from 30 bitches every 10 min for 8 h from a cephalic vein during different phases of the estrous cycle. An increase in the mean plasma levels of LH occurred from mid to late anestrus (P < 0.01). The LH pulse frequency increased (P < 0.01) from late anestrus to proestrus, and was strongly correlated (r = 0.96, P < 0.001) with the mean plasma level of estradiol-17β (E2). In Experiment 2, middle uterine samples, including the myometrium and endometrium, from 18 bitches were taken at 6 stages of the estrous cycle. The total number of estrogen receptors and nuclear estrogen receptor and its mRNA levels in the uterus also increased (P < 0.01) from late anestrus to proestrus. Mean plasma E2 level and the number of uterine estrogen receptor were positively correlated (r = 0.81, P < 0.05). In Experiment 3, nine bitches were ovariectomized in mid anestrus. Two weeks later they received a single injection of 10 or 50 μg/kg, im,estradiol benzoate. The number of uterine estrogen receptor and their mRNA levels for ovariectomized bitches were low, but increased (P < 0.05) after treatment with a low dose of estradiol benzoate. These results suggest that increases in LH pulse frequency and estrogen secretion are associated with termination of anestrus and that subsequent enhancement of uterine estrogen receptor expression may be up-regulated by estradiol.

To determined the cellular kinetics of thymocyte subpopulations in DBA1 mice after whole-body 6.8 Gy X-irradiation, they were analyzed for the expression of several cell surface antigens using flow cytometry. The results show that i) The majority of thymocytes rapidly depleted by irradiation was CD4+8+ cells. ii) radioresistant CD4+8- and CD4-8+ survived 18-48 hr after X-irradiation were considered to be relatively mature type, since they expressed high levels of CD3 and LECAM-1. iii) CD3-positive cells were detected in CD4-8- cells at 72 hr after irradiation.

CD45 is cell surface glycoprotein and expressed on all haematopoietic cells except mature erythrocytes and platelets. Eight isoforms of CD45 are generated by alternative splicing of exons 4-6. B220 including all three exons is expressed specifically on pan-B cell lineage. Recently, it was reported that B220 was expressed on apoptotic T cells induced by staphylococcal enterotoxin B (SEB). In the present study, we investigated the expression of B220 on murine thymocytes after whole-body X-irradiation. We used the forward light scattering of flow cytometry as a parameter of cell size, and defined two populations; FSChigh (normal cell size) and FSClow (correspond to apoptotic cell in size) fraction. B220+ cells in FSChigh fraction reached a maximum value (35%) at 18 hr after irradiation. In FSClow fraction, 40-60% cells were positive for B220 at any time points. These results suggest that B220 is expressed on thymocytes in the pre-apoptotic stage, because B220 was expressed on not only FSClow cells but also FSChigh cells.

Fragile sites are non-randomly distributed chromosomal breaks and gaps observed in the cells cultivated under certain conditions. Feline fragile sites were analyzed using skin fibroblast strains after the treatments with aphidicolin and fluorodeoxyuridine in combination with caffeine. Three aphidicolin-induced fragile sites (A1q21, C2q13 and E1p21) as well as a folate-sensitive site (B1q14) were observed in all the 3 fibroblast strains tested for each treatment group. The loci in A1q21 and B1q14 are very close to that reported previously for peripheral blood lymphocytes and lung cells. Two chromosomal break points in C2q13 and E1p21 seem to be new fragile sites. Fifteen candidates for feline fragile sites were also assigned their locations in feline chromosomes. Both the incidence and distribution of feline fragile sites in skin fibroblasts seem to be different at least in part from those in lymphocytes.

Prohibitin is the protein which has an inhibitory function in cell growth, and its gene is suggested to be one of putative tumor suppressor genes. In this report, we described a partial cloning of prohibitin cDNAs from canine, feline, bovine, equine, and rabbit liver mRNAs by RT-PCR, and their homology analysis. The sequences of these RT-PCR products were compared with each other as well as those reported for human and rat. The homology in this region of prohibitin cDNA was approximately 90%, and the amino acid sequence of each RT-PCR product shared more than 95% identity. Therefore, it is concluded that all the RT-PCR products are a part of prohibitin cDNA of each animal.

We developed achromatic full-field hard X-ray microscopy on the basis of advanced Kirkpatrick-Baez mirrors consisting of four total-reflection mirrors. The microscope system consists of advanced Kirkpatrick-Baez mirrors as an objective, Kirkpatrick-Baez mirrors as a condenser and an X-ray CCD camera. The performance of the system was investigated using a Siemens star chart with a minimum resolution of 50 nm at BL29XUL of SPring-8 at 10 keV. As a result, a spatial resolution of ~150 nm was achieved. Also, no chromatic aberration was confirmed by taking images at an X-ray energy from 8 to 11.5 keV.

We evaluated the ablation threshold of silicon and synthetic fused silica, which are widely used as optical substrates such as those in X-ray mirrors. A focusing XFEL beam with a beam size of approximately 1 ?m at a photon energy of 10 keV was used. We confirmed that the ablation thresholds of these materials, which were 0.8 ?J/?m2 for the silicon and 4 ?J/?m2 for the synthetic fused silica, approximately agreed with the melting dose.

X-ray free electron lasers (XFELs) with intense and ultra-short pulse X-rays possibly induce damage to optical elements. We investigated the damage thresholds of optical materials by using focusing XFEL beams with sufficient power density for studying ablation phenomena. 1-μm focusing beams with 10 keV photon energy were produced at the XFEL facility SACLA (SPring-8 Angstrom Compact free electron LAser). The focusing beams irradiated samples of rhodium-coated substrate, which is used in X-ray mirror optics, under grazing incident condition.

We evaluated the irradiation damage induced to platinum/carbon multilayers induced by hard X-ray free-electron lasers (XFELs). In this study, in order to test the use of the platinum/carbon multilayers for future XFEL focusing applications, we evaluated the structures in almost exactly the condition in which they would actually be used. The X-ray reflectivity of the multilayers was measured by using XFELs, and a cross-section of the multilayer that was irradiated by an XFEL was observed by transmission electron microscopy. We used a non-monochromatic beam at a photon energy of 10 keV. We confirmed that the intensity of the conditions under which the multilayers are to be used is sufficiently lower than the breakdown threshold of platinum/carbon multilayers.

Compact advanced Kirkpatrick–Baez optics are used to construct a microscope that is easy to align and robust against vibrations and thermal drifts. The entire length of the imaging mirror system is 286 mm, which is 34% shorter than the previous model. A spatial resolution test is performed in which magnified bright-field images of a pattern are taken with an X-ray camera at an energy of 10 keV at the BL29XUL beamline of SPring-8. A line-and-space pattern having a 50- nm width could be resolved, although the image contrast is low.

We evaluated the ablation thresholds of optical materials by using hard X-ray free electron laser. A 1-µm-focused beam with 10-keV of photon energy from SPring-8 Angstrom Compact free electron LAser (SACLA) was irradiated onto silicon and SiO2 substrates, as well as the platinum and rhodium thin films on these substrates, which are widely used for optical materials such as X-ray mirrors. We designed and installed a dedicated experimental chamber for the irradiation experiments. For the silicon substrate irradiated at a high fluence, we observed strong mechanical cracking at the surface and a deep ablation hole with a straight side wall. We confirmed that the ablation thresholds of uncoated silicon and SiO2 substrates agree with the melting doses of these materials, while those of the substrates under the metal coating layer are significantly reduced. The ablation thresholds obtained here are useful criteria in designing optics for hard X-ray free electron lasers.

We developed micro-focusing Kirkpatrick-Baez (K-B) mirror optics for the X-ray free electron laser (XFEL) at the SPring-8 Angstrom Compact free electron Laser (SACLA) facility in Japan. The K-B focusing mirrors have a spatial acceptance of 600 × 600 μm2 and ultra-precision surfaces. A manipulator for precise alignment of the mirrors was also developed. The focusing properties for 10-keV X-rays were evaluated with a wire-scanning method. The focal beam size was determined to be 0.95 μm × 1.20 μm at the full width at half maximum. An increased power density of 1018 W/cm2 was achieved at the focal point. These properties were confirmed to be in good agreement with the designed value.

We report a fabrication method of an ultrathin silicon crystal as a beam splitter for the hard x-ray regime based on the Bragg diffraction operated in the symmetric Bragg geometry, and evaluation results of crystalline perfection at SPring-8. A sub-10-m thick Si(511) crystal was fabricated with a reactive dry etching method using atmospheric-pressure plasma. Following the evaluation of topography and diffractometry, the crystal was found to be strain-free, and capable of splitting a monochromatic x-ray beam into two branches with almost 1:1 splitting ratio.

An electrochemical polishing process for an n-GaN(0001) surface with a subsurface damage layer has been developed that involves irradiating with ultraviolet (UV) light and applying a voltage. In this method, a positively biased GaN substrate is exposed to UV light to oxidize its surface. The oxide layer does not dissolve in solution; rather it is chemically removed from the protruding region by a solid acid catalyst, which functions as a polishing pad. The wafer was prepared by mechanical polishing with diamond particles. Without a bias, the removal rate is quite low because photoinduced carriers are rapidly depleted through recombination at crystallographic defects. In contrast, when a bias is applied, photoinduced electrons and holes are forcibly separated so that they contribute to surface oxidation. Consequently, the damaged surface was effectively planarized when a bias was applied.

Recently, "metallomics," in addition to genomics and proteomics, has become a focus as a novel approach to identify sensitive fluctuations in homeostasis that accompany metabolic processes, such as stress responses, differentiation, and proliferation. Cellular elements and associated protein behavior provide important clues for understanding cellular and disease mechanism(s). It is important to develop a system for measuring the native status of the protein. In this study, we developed an original freeze-dried electrofocusing native gel over polyimide film (native-gel film) for scanning protein analysis using synchrotron radiation excited X-ray fluorescence (SPAX). To our knowledge, this is the first report detailing the successful mapping of metal-associated proteins of electrofocusing gels using X-ray fluorescence. SPAX can provide detection sensitivity equivalent to that of LA-ICP-MS. In addition to this increased sensitivity, SPAX has the potential to be combined with other X-ray spectroscopies. Our system is useful for further applications in proteomics investigating cellular element-associated protein behaviors and disease mechanisms.

Wavefront measurement for a hard-X-ray nanobeam using single-grating interferometry based on the Talbot effect and the Fourier transform method was demonstrated in the 1-km-long beamline of SPring-8. 10 keV X-rays were one-dimensionally focused down to 32 nm using a total-reflection elliptical mirror. An intentionally distorted wavefront was generated using a deformable mirror placed just upstream of the focusing mirror. The wavefront measured by interferometry was cross-checked with the phase retrieval method using intensity profiles around the beam waist. Comparison of the obtained wavefront errors revealed that they are in good agreement with each other and with the wavefront error estimated from the shape of the deformable mirror at a ~0.5 rad level.

Hiroki Nakamori, Satoshi Matsuyama, Shota Imai, Takashi Kimura, Yasuhisa Sano, Yoshiki Kohmura, Kenji Tamasaku, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi, "Experimental and simulation study of undesirable short-period deformation in piezoelectric deformable x-ray mirrors", Review of Scientific Instruments 83(5), 053701 (2012) https://doi.org/10.1063/1.4709499., To construct adaptive x-ray focusing optics whose optical parameters can be varied while performing wavefront correction, ultraprecise piezoelectric deformable mirrors have been developed. We computationally and experimentally investigated undesirable short-period deformation caused by piezoelectric actuators adhered to the substrate during mirror deformation. Based on the results of finite element method analysis, shape measurements, and the observation of x-ray reflection images, a guideline is developed for designing deformable mirrors that do not have short-period deformation errors. © 2012 American Institute of Physics.

S. Matsuyama, N. Kidani, H. Mimura, J. Kim, Y. Sano, K. Tamasaku, Y. Kohmura, M. Yabashi, T. Ishikawa, and K. Yamauchi "Development of a one-dimensional Wolter mirror for achromatic full-field x-ray microscopy", Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 813905 (28 September 2011); https://doi.org/10.1117/12.892987., SPIE Optical Engineering + Applications, 2011, San Diego, California, United States, We investigated a one-dimensional Wolter mirror (which consists of an elliptical mirror and a hyperbolic mirror) with the aim of developing an achromatic full-field X-ray microscope with a resolution of better than 50 nm. X-ray mirrors were ultraprecisely fabricated by elastic emission machining to give a figure accuracy of 2 nm (peak-to-valley). A one-dimensional Wolter mirror that had been precisely constructed was evaluated in terms of the point-spread function at the center of the field of view (FOV) and the FOV at an X-ray energy of 11.5 keV at BL29XUL of SPring-8. It was found to have a minimum resolution of 43 nm and a FOV equivalent to 12.1 μm. These results are highly consistent with calculation results. © 2011 SPIE.

Deterministic machining processes, in which the removal distribution is programmed on the basis of surface figure error, are used for fabricating ultra-precision optics. In these processes, numerically controlled (NC) machining is performed by the dwell-time control of a small removal spot by controlling the scan speed of the work table. Although their accuracy is very high, their throughput is low because of the long path of a raster scan. Thus, we propose an array-type removal system that can control the dwell time to realise high-throughput deterministic machining. We focused on plasma-process-based deterministic methods, and NC sacrificial plasma oxidation was selected as the method for use in the prototype apparatus with an electrode array system. Using the system, the thickness range of the top silicon layer of a silicon-on-insulator wafer was successfully improved by the NC process, and it was demonstrated that the electrode array system can be used for deterministic machining.

Takashi Kimura, Hidekazu Mimura, Soichiro Handa, Hirokatsu Yumoto, Hikaru Yokoyama, Shota Imai, Satoshi Matsuyama, Yasuhisa Sano, Kenji Tamasaku, Yoshiki Komura, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi , "Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm", Review of Scientific Instruments 81(12), 123704 (2010) https://doi.org/10.1063/1.3509384., In situ wavefront compensation is a promising method to realize a focus size of only a few nanometers for x-ray beams. However, precise compensation requires evaluation of the wavefront with an accuracy much shorter than the wavelength. Here, we characterized a one-dimensionally focused beam with a width of 7 nm at 20 keV using a multilayer mirror. We demonstrate that the wavefront can be determined precisely from multiple intensity profiles measured around the beamwaist. We compare the phase profiles recovered from intensity profiles measured under the same mirror condition but with three different aperture sizes and find that the accuracy of phase retrieval is as small as 12. © 2010 American Institute of Physics.

We studied an imaging system consisting of an elliptical mirror and a hyperbolic mirror [i.e., one-dimensional (1D) Wolter optics] to realize an achromatic full-field hard x-ray microscopy with a resolution better than 50 nm. We report the performance of this 1D Wolter optical system when the mirrors were ultraprecisely figured by elastic emission machining. Experiments to form a demagnified image (demagnification factor of 385) of a 10 μm slit were conducted at an x-ray energy of 11.5 keV at BL29XUL of SPring-8. The system could form a demagnified image with a resolution better than 50 nm over a 12.1 μm field.

Although beveling is essential for preventing the chipping of particles from the edge of a wafer during surface polishing, there is no high-efficiency beveling method for a silicon carbide wafer because of its hardness and chemical inertness. Thus, in this study, plasma etching using atmospheric-pressure plasma is applied for the beveling of a silicon carbide wafer. As a result, an initially square corner was well rounded within 20–30 min. The beveling rate was highest at the start of processing and decreased with increasing radius of curvature. It was proven that the beveling phenomenon was due to the electric-field concentration at the edge of the wafer as determined by calculating electric-field intensity.

Recently, silicon-on-insulator (SOI) metal–oxide–semiconductor field-effect transistors (MOSFETs) have attracted great interest from manufacturers of semiconductor devices because of their excellent electrical characteristics. According to International Technology Roadmap for Semiconductors 2007, a very uniform surface Si layer will be required in a few years; however, no production method has been identified. To achieve the required uniformity in surface Si layer thickness, a new method of numerically controlled sacrificial oxidation using atmospheric-pressure plasma was developed. This paper demonstrates a new electrode array system developed for rapid processing. A very uniform oxide with a peak-to-valley (PV) of 0.13 nm was obtained; the relationship of oxide thickness versus oxidation time is shown.

Nature Physics doi:10.1038/nphys1457; published online: 22 November 2009; corrected online: 2 December 2009. In the original article published online, all references to '4 μm downstream' should have been '12 μm downstream'; and in Fig. 3e,f the horizontal scale bar should have been '4 μm'. These changes have been made in all versions of the Letter.

To improve the performance of an X-ray nanobeam, we demonstrate the in situ determination and correction of the figure error of an elliptical mirror. The phase error profile on the mirror surface, which represents the figure error, is numerically reconstructed from the X-ray intensity distribution measured at the focal plane. The figure error is corrected by depositing a Pt film on the surface with subnanometer thickness controllability. Results of focusing experiments and subsequent analysis show a great improvement in focusing performance.

We have developed an advanced type of relative angle determinable stitching interferometry (RADSI) for hard x-ray nanofocusing mirrors. The surface metrology system consists of two types of optical interferometers. One is a microscope Michelson interferometer, which measures the local figure profile of the mirror surface, and the other is a large-area Fizeau interferometer, which determines the stitching angles between neighboring shots using a flat mirror. The surface figure profile of each of the one-shots and the stitching angles are measured at the same time. Precise measurement of local surface area and the stitching angles of 1×10-8 rad order were achieved using the developed system. To demonstrate the accuracy of the developed measurement system, we measured an elliptically figured mirror for hard x-ray nanofocusing. The mirror's surface shape has a curvature radius of a few meters. As a result, measurement reproducibility and reliability of less than PV 3 nm was achieved by using a 25 nm focusing mirror.

A highly precise adaptive optical system that can be used in the hard X-ray region was developed. To achieve highly precise control of the wavefront shape, we discussed an optical system with a bendable mirror of deformation accuracy better than 0.4 nm RMS. Using the system, we demonstrated the controllability of the wavefront of a 15 nm hard X-ray nanobeam. The intensity profile of the wavefront-modified beam was in good agreement with the wave-optically calculated profile.

Four ADP-ribosyltransferases that acted on non-muscle actin were purified more than 3,000-fold from rat brain extract. The molecular weights of these brain ADP-ribosyltransferases were 66,000 as estimated by sodium dodecyl sulfate-polyacrylamide gel electrophoresis and gel filtration on TSK gel G3000SW. The Km values for NAD were approximately 20 microM. These enzymes were not inhibited by thymidine or nicotinamide, but were inhibited by ADP and ADP-ribose. Two soluble ADP-ribosylation factors purified from rat brain had different effects on the four ADP-ribosyltransferases during the ADP-ribosylation of non-muscle actin. These ADP-ribosyltransferases modified not only actin but also the stimulatory guanine nucleotide-binding protein of adenylate cyclase, Gs, and another guanine nucleotide-binding protein in brain, Go. These findings suggest that the four brain ADP-ribosyltransferases are concerned with nerve functions in the central nervous system.

Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Soichiro Handa, Takashi Kimura, Yasuhisa Sano, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa, and Kazuto Yamauchi Phys. Rev. A 77, 015812 (2008)., We present a remarkably accurate method for determining the wave field of an x-ray nanobeam. The intensity profile of a beam was directly measured over a range of three orders of magnitude while its phase distribution was successfully recovered using an iterative algorithm. The evolution of the wave field along the beam propagation direction was precisely simulated, and there was good agreement with the experimental results.

Hidekazu Mimura, Hirokatsu Yumoto, et al. "Efficient focusing of hard x rays to 25nm by a total reflection mirror", Appl. Phys. Lett. 90(5), 051903 (2007) https://doi.org/10.1063/1.2436469., Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tunable focusing. The authors have developed a fabrication system for hard x-ray mirrors by developing elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. By using an ultraprecisely figured mirror, they realized hard x-ray line focusing with a beam width of 25 nm at 15 keV. The focusing test was performed at the 1-km -long beamline of SPring-8. © 2007 American Institute of Physics.

S. Matsuyama, H. Mimura, et al. "Development of scanning x-ray fluorescence microscope with spatial resolution of 30nm using Kirkpatrick-Baez mirror optics", Review of Scientific Instruments 77(10), 103102 (2006) https://doi.org/10.1063/1.2358699., We developed a high-spatial-resolution scanning x-ray fluorescence microscope (SXFM) using Kirkpatrick-Baez mirrors. As a result of two-dimensional focusing tests at BL29XUL of SPring-8, the full width at half maximum of the focused beam was achieved to be 50×30 nm2 (V×H) under the best focusing conditions. The measured beam profiles were in good agreement with simulated results. Moreover, beam size was controllable within the wide range of 30-1400 nm by changing the virtual source size, although photon flux and size were in a trade-off relationship. To demonstrate SXFM performance, a fine test chart fabricated using focused ion beam system was observed to determine the best spatial resolution. The element distribution inside a logo mark of SPring-8 in the test chart, which has a minimum linewidth of approximately 50-60 nm, was visualized with a spatial resolution better than 30 nm using the smallest focused x-ray beam. © 2006 American Institute of Physics.

S. Matsuyama, H. Mimura, et al. "Development of mirror manipulator for hard-x-ray nanofocusing at sub-50-nm level", Review of Scientific Instruments 77(9), 093107 (2006) https://doi.org/10.1063/1.2349594, X-ray focusing using Kirkpatrick-Baez (KB) mirrors is promising owing to their capability of highly efficient and energy-tunable focusing. We report the development of a mirror manipulator which enables KB mirror alignment with a high degree of accuracy. Mirror alignment tolerances were estimated using two types of simulators. On the basis of the simulation results, the mirror manipulator was developed to achieve an optimum KB mirror setup. As a result of focusing tests at BL29XUL of SPring-8, the beam size of 48 × 36 nm 2 (V×H) was achieved in the full width at half maximum at an x-ray energy of 15 keV. Spatial resolution tests showed that a scanning x-ray microscope equipped with the KB focusing system could resolve line-and-space patterns of 80 nm linewidth in a high visibility of 60%. © 2006 American Institute of Physics.

Yumoto H., Mimura H., Matsuyama S., et al. At-wavelength figure metrology of hard x-ray focusing mirrors. Review of Scientific Instruments, 77, 6, 063712 (2006) https://doi.org/10.1063/1.2216870, We have developed an at-wavelength wave-front metrology of a grazing-incidence focusing optical systems in the hard x-ray region. The metrology is based on numerical retrieval from the intensity profile around the focal point. We demonstrated the at-wavelength metrology and estimated the surface figure error on a test mirror. An experiment for measuring the focusing intensity profile was performed at the 1-km-long beamline (BL29XUL) of SPring-8. The obtained results were compared with the profile measured using an optical interferometer and were confirmed to be in good agreement with it. This technique is a potential method of characterizing wave-front aberrations on elliptical mirrors for sub-10-nm focusing. © 2006 American Institute of Physics.

S. Matsuyama, H. Mimura, et al. "Diffraction-limited two-dimensional hard-x-ray focusing at the 100nm level using a Kirkpatrick-Baez mirror arrangement", Review of Scientific Instruments 76(8), 083114 (2005) https://doi.org/10.1063/1.2005427., The spatial resolution of scanning x-ray microscopy depends on the beam size of focused x rays. Recently, nearly diffraction-limited line focusing has been achieved using elliptical mirror optics at the 100 nm level. To realize such focusing two-dimensionally in a Kirkpatrick-Baez system, the required accuracies of the mirror aligners in this system were estimated using optical simulators based on geometrical or wave-optical theories. A focusing unit fulfilling the required adjustment accuracies was constructed. The relationships between alignment errors and focused beam profiles were quantitatively examined at the 1 km long beamline (BL29XUL) of SPring-8 to be in good agreement with the simulation results. © 2005 American Institute of Physics.

Hirokatsu Yumoto, Hidekazu Mimura, Satoshi Matsuyama, Hideyuki Hara, Kazuya Yamamura, Yasuhisa Sano Kazumasa Ueno, Katsuyoshi Endo Yuzo Mori, Makina Yabashi, Yoshinori Nishino, Kenji Tamasaku, Tetsuya Ishikawa and Kazuto Yamauchi, "Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50nm", Review of Scientific Instruments 76(6), 063708 (2005) https://doi.org/10.1063/1.1922827., In this study, we designed, fabricated, and evaluated a hard x-ray focusing mirror having an ideally focused beam with a full width at half maximum in the intensity profile of 36 nm at an x-ray energy of 15 keV. The designed elliptically curved shape was fabricated by a computer-controlled fabrication system using plasma chemical vaporization machining and elastic emission machining, on the basis of surface profiles accurately measured by combining microstitching interferometry with relative angle determinable stitching interferometry. A platinum-coated surface was employed for hard x-ray focusing with a large numerical aperture. Line-focusing tests on the fabricated elliptical mirror are carried out at the 1-km -long beamline of SPring-8. A full width at half maximum of 40 nm was achieved in the focused beam intensity profile under the best focus conditions. © 2005 American Institute of Physics.

Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Kazuya Yamamura, Yasuhisa Sano, Kazumasa Ueno, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Kenji Tamasaku, Yoshinori Nishino, Tetsuya Ishikawa and Kazuto Yamauchi, "Relative angle determinable stitching interferometry for hard x-ray reflective optics", Review of Scientific Instruments 76(4), 045102 (2005) https://doi.org/10.1063/1.1868472, Metrology plays an important role in surface figuring with subnanometer accuracy. We have developed relative angle determinable stitching interferometry for the surface figuring of elliptical mirrors, in order to realize hard x-ray nanofocusing. In a stitching system, stitching angles are determined not by the general method using a common area between neighboring shots, but by the new method using the mirror's tilt angles measured at times when profile data are acquired. The high measurement accuracy of approximately 4 nm (peak-to-valley) was achieved in the measurement of a cylindrical surface having the same curvature as the elliptically designed shape to enable hard x-ray nanofocusing. © 2005 American Institute of Physics.

Nanofocused X-ray beams are necessary for nanometer-scale spatial microscopy analysis. X-ray focusing using a Kirkpatrick-Baez setup with two total reflection mirrors is a promising method, allowing highly efficient and energy-tuneable focusing. In this paper, we report the development of ultraprecise mirror optics and the realization of a nanofocused hard-X-ray beam. Fabricated mirrors having a figure accuracy of 2 nm peak to valley height give ideal diffraction-limited focusing at the hard X-ray region. The focal size, defined as the full width at half maximum in the intensity profile, was 36 nm ×48 nm at an X-ray energy of 15 keV.