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360 results on '"Chemical vapor deposition -- Methods"'

301. Researchers Submit Patent Application, 'Gas Supply Device, Film Forming Apparatus, Gas Supply Method, and Storage Medium', for Approval

Subjects
Patents -- Methods, Gas industry -- Intellectual property -- Methods, Natural gas -- Methods, Chemical vapor deposition -- Methods, Patent/copyright issue, Electronics
Abstract

By a News Reporter-Staff News Editor at Electronics Newsweekly -- From Washington, D.C., VerticalNews journalists report that a patent application by the inventors INOUE, Mitsuya (Yamanashi, JP); TAKADO, Makoto (Iwate, [...]

Published
2015

302. Creating amorphous films

Author

Petrich, Mark A.

Subjects
Solar cells -- Innovations, Amorphous semiconductors -- Innovations, Chemical vapor deposition -- Methods, Chemicals, plastics and rubber industries, Chemistry
Published
1989

303. 'Methods for Etching Silicon Using Hydrogen Radicals in a Hot Wire Chemical Vapor Deposition Chamber' in Patent Application Approval Process

Subjects
Silicon -- Methods -- Intellectual property, Patents -- Methods, Hydrogen -- Methods -- Intellectual property, Chemical vapor deposition -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- A patent application by the inventors CHATTERJEE, SUKTI (Cupertino, CA); NEMANI, SRINIVAS D. (Sunnyvale, CA), filed on November [...]

Published
2015

304. Patent Application Titled 'Method for Purifying Multi-Walled Carbon Nanotubes' Published Online

Subjects
Patents -- Methods, Nanotubes -- Methods, Chemical vapor deposition -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Yamamoto, [...]

Published
2015

305. 'Method for Recycling Organic Ruthenium Compound for Chemical Vapor Deposition' in Patent Application Approval Process

Subjects
Ruthenium -- Methods -- Intellectual property, Platinum group compounds -- Methods -- Intellectual property, Patents -- Methods, Thin films -- Methods -- Intellectual property, Chemical vapor deposition -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- A patent application by the inventors Harada, Ryosuke (Ibaraki, JP); Nabeya, Shunichi (Ibaraki, JP); Shigetomi, Toshiyuki (Ibaraki, JP); [...]

Published
2015

306. Patent Issued for Method for Growing Monocrystalline Diamonds

Subjects
Nitrogen (Chemical element) -- Methods -- Intellectual property, Patents -- Methods, Chemical vapor deposition -- Methods, Patent/copyright issue, Biological sciences, Health
Abstract

By a News Reporter-Staff News Editor at Life Science Weekly -- According to news reporting originating from Alexandria, Virginia, by NewsRx journalists, a patent by the inventor Misra, Devi Shanker [...]

Published
2015

307. Patent Application Titled 'Method for Producing Metal Oxide Film and Metal Oxide Film' Published Online

Subjects
Toshiba Corp. -- Intellectual property, Electronics industry -- Intellectual property -- Methods, Patents -- Methods, Chemical vapor deposition -- Methods, Patent/copyright issue, Electronics industry, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Shirahata, [...]

Published
2015

308. Patent Application Titled 'Device for Depositing Carbon Film and Method for Depositing Carbon Film' Published Online

Subjects
JTEKT Corp. -- Intellectual property, Chemical vapor deposition -- Methods, Automobile equipment and supplies industry -- Intellectual property -- Methods, Patents -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Suzuki, [...]

Published
2015

309. 'Method for Producing Metal Oxide Film and Metal Oxide Film' in Patent Application Approval Process

Subjects
Toshiba Corp. -- Intellectual property, Electronics industry -- Intellectual property -- Methods, Patents -- Methods, Chemical vapor deposition -- Methods, Patent/copyright issue, Electronics industry, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- A patent application by the inventors Shirahata, Takahiro (Tokyo, JP); Orita, Hiroyuki (Tokyo, JP); Hiramatsu, Takahiro (Tokyo, JP), [...]

Published
2015

311. Patent Application Titled 'Chemical Vapor Deposition Raw Material Comprising Organoplatinum Compound, and Chemical Vapor Deposition Method Using the Chemical Vapor Deposition Raw Material' Published Online

Subjects
Patents -- Methods, Raw materials -- Methods -- Intellectual property, Chemical vapor deposition -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Saito, [...]

Published
2015

312. Patent Application Titled 'Plasma-Enhanced Chemical Vapor Deposition Apparatus and Method of Manufacturing Display Apparatus Using the Same' Published Online

Subjects
Patents -- Methods, Chemical vapor deposition -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Lee, [...]

Published
2015

313. 'Chemical Vapor Deposition Process for Depositing Zinc Oxide Coatings, Method for Forming a Conductive Glass Article and the Coated Glass Articles Produced Thereby' in Patent Application Approval Process

Subjects
Zinc industry -- Intellectual property -- Methods, Patents -- Methods, Coatings -- Methods, Coatings industry -- Intellectual property -- Methods, Zinc oxide -- Methods, Chemical vapor deposition -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- A patent application by the inventors Wang, Yu (Greensboro, NC); Varanasi, Srikanth (Ottawa Hills, OH); Strickler, David Alan [...]

Published
2015

314. Patent Application Titled 'Method for Producing Metal Oxide Film and Metal Oxide Film' Published Online

Subjects
Toshiba Corp. -- Intellectual property, Electronics industry -- Intellectual property -- Methods, Patents -- Methods, Chemical vapor deposition -- Methods, Patent/copyright issue, Electronics industry, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Shirahata, [...]

Published
2015

315. 'Method of Growing High Quality, Thick SiC Epitaxial Films by Eliminating Silicon Gas Phase Nucleation and Suppressing Parasitic Deposition' in Patent Application Approval Process

Subjects
Silicon carbides -- Methods -- Intellectual property, Silicon -- Methods -- Intellectual property, Patents -- Methods, Epitaxy -- Methods, Chemical vapor deposition -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- A patent application by the inventors Sudarshan, Tangali S. (Columbia, SC); Song, Haizheng (Columbia, SC); Rana, Tawhid (Columbia, [...]

Published
2014

316. Patent Application Titled 'Method of Dressing an Abrasive Wheel Using a Polycrystalline Cvd Synthetic Diamond Dresser and Metho Dof Fabricating the Same' Published Online

Subjects
Patents -- Methods, Chemical vapor deposition -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventor Perkins, [...]

Published
2014

318. 'Pulsed Remote Plasma Method and System' in Patent Application Approval Process

Subjects
Chemical vapor deposition -- Methods, Patents -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- A patent application by the inventor Winkler, Jereld Lee (Gilbert, AZ), filed on March 8, 2013, was made [...]

Published
2014

319. Researchers Submit Patent Application, 'Cvd Apparatus, Method of Manufacturing Susceptor Using the Cvd Apparatus, and Susceptor', for Approval

Subjects
Toyo Tanso Company Ltd. -- Production processes -- Intellectual property, Chemical vapor deposition -- Methods, Epitaxy -- Methods, Patents -- Methods, Electrical equipment and supplies industry -- Production processes -- Intellectual property -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- From Washington, D.C., VerticalNews journalists report that a patent application by the inventors Kita, Masaaki (Kanonji-shi, JP); Kubota, [...]

Published
2014

320. Researchers Submit Patent Application, 'Cvd Apparatus, Method of Manufacturing Susceptor Using the Cvd Apparatus, and Susceptor', for Approval

Subjects
Toyo Tanso Company Ltd. -- Production processes -- Intellectual property, Chemical vapor deposition -- Methods, Epitaxy -- Methods, Patents -- Methods, Electrical equipment and supplies industry -- Production processes -- Intellectual property -- Methods, Patent/copyright issue, Electronics
Abstract

By a News Reporter-Staff News Editor at Electronics Newsweekly -- From Washington, D.C., VerticalNews journalists report that a patent application by the inventors Kita, Masaaki (Kanonji-shi, JP); Kubota, Takeshi (Kanonji-shi, [...]

Published
2014

321. Researchers Submit Patent Application, 'Modified Bubbling Transfer Method for Graphene Delamination', for Approval

Subjects
Chemical vapor deposition -- Methods, Electrical conductivity -- Methods, Graphite -- Methods -- Intellectual property, Laminated materials -- Methods -- Intellectual property, Patents -- Methods, Graphene -- Methods, Inorganic compounds -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- From Washington, D.C., VerticalNews journalists report that a patent application by the inventors Li, Xuesong (New York, NY); [...]

Published
2014

322. Patent Application Titled 'Gas Supply Device, Processing Apparatus, Processing Method, and Storage Medium' Published Online

Subjects
Tokyo Electron Ltd. -- Intellectual property, Chemical vapor deposition -- Methods, Natural gas -- Methods, Semiconductor production equipment industry -- Intellectual property -- Methods, Gas industry -- Intellectual property -- Methods, Patents -- Methods, Patent/copyright issue, Semiconductor production equipment industry, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventor TSUDA, [...]

Published
2014

323. Researchers Submit Patent Application, 'Thin Film Forming Method and Thin Film Forming Apparatus', for Approval

Subjects
Tokyo Electron Ltd. -- Intellectual property, Chemical vapor deposition -- Methods, Thin films -- Methods, Semiconductor production equipment industry -- Intellectual property -- Methods, Dielectric films -- Methods, Patents -- Methods, Patent/copyright issue, Semiconductor production equipment industry, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- From Washington, D.C., VerticalNews journalists report that a patent application by the inventors YAMAMOTO, Kazuya (Oshu-shi, JP); ITO, [...]

Published
2014

325. Patent Application Titled 'Method for Manufacturing Silicon-Containing Film' Published Online

Subjects
Chemical vapor deposition -- Methods, Silicon -- Production processes -- Methods -- Intellectual property, Patents -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Tomyo, [...]

Published
2014

326. 'Plasma Deposition Apparatus and Plasma Deposition Method' in Patent Application Approval Process

Subjects
Mitsubishi Electric Corp. -- Intellectual property, Chemical vapor deposition -- Methods, Thin films -- Methods, Dielectric films -- Methods, Patents -- Methods, Electrical equipment and supplies industry -- Intellectual property -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- A patent application by the inventor Hama, Atsuro (Tokyo, JP), filed on August 30, 2011, was made available [...]

Published
2014

329. Researchers Submit Patent Application, 'Spacer, Spacer Transferring Method, Processing Method and Processing Apparatus', for Approval

Subjects
Tokyo Electron Ltd. -- Intellectual property, Chemical vapor deposition -- Methods, Semiconductor production equipment industry -- Intellectual property -- Methods, Patents -- Methods, Patent/copyright issue, Semiconductor production equipment industry, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- From Washington, D.C., VerticalNews journalists report that a patent application by the inventors OYAMA, Katsuhiko (Oshu-shi, JP); TAKEUCHI, [...]

Published
2014

330. Researchers Submit Patent Application, 'Spacer, Spacer Transferring Method, Processing Method and Processing Apparatus', for Approval

Subjects
Tokyo Electron Ltd. -- Intellectual property, Chemical vapor deposition -- Methods, Semiconductor production equipment industry -- Intellectual property -- Methods, Electronics industry -- Intellectual property -- Methods, Patents -- Methods, Patent/copyright issue, Semiconductor production equipment industry, Electronics industry, Electronics
Abstract

By a News Reporter-Staff News Editor at Electronics Newsweekly -- From Washington, D.C., VerticalNews journalists report that a patent application by the inventors OYAMA, Katsuhiko (Oshu-shi, JP); TAKEUCHI, Yasushi (Oshu-shi, [...]

Published
2014

331. Researchers Submit Patent Application, 'Spacer, Spacer Transferring Method, Processing Method and Processing Apparatus', for Approval

Subjects
Chemical vapor deposition -- Methods, Semiconductor production equipment industry -- Intellectual property -- Methods, Patents -- Methods, Patent/copyright issue, Semiconductor production equipment industry, Tokyo Electron Ltd. -- Intellectual property
Abstract

By a News Reporter-Staff News Editor at Life Science Weekly -- From Washington, D.C., NewsRx journalists report that a patent application by the inventors OYAMA, Katsuhiko (Oshu-shi, JP); TAKEUCHI, Yasushi […]

Published
2014

332. Patent Application Titled 'Organic Ruthenium Compound for Chemical Vapor Deposition Raw Material and Production Method for Said Organic Ruthenium Compound' Published Online

Subjects
Thin films -- Methods -- Intellectual property, Chemical vapor deposition -- Methods, Raw materials -- Methods -- Intellectual property, Production management -- Methods, Dielectric films -- Methods -- Intellectual property, Ruthenium -- Methods -- Intellectual property, Patents -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Saito, [...]

Published
2014

333. 'Edge Ring Assembly for Plasma Processing Chamber and Method of Manufacture Thereof' in Patent Application Approval Process

Subjects
Lam Research Corp. -- Intellectual property -- Production processes, Chemical vapor deposition -- Methods, Semiconductor production equipment industry -- Intellectual property -- Production processes -- Methods, Patents -- Methods, Patent/copyright issue, Semiconductor production equipment industry, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- A patent application by the inventors Sant, Sanket P. (Fremont, CA); O'Neill, Robert Griffith (Fremont, CA), filed on [...]

Published
2014

334. 'Edge Ring Assembly for Plasma Processing Chamber and Method of Manufacture Thereof' in Patent Application Approval Process

Subjects
Lam Research Corp. -- Intellectual property -- Production processes, Chemical vapor deposition -- Methods, Semiconductor production equipment industry -- Intellectual property -- Production processes -- Methods, Electronics industry -- Intellectual property -- Production processes -- Methods, Patents -- Methods, Patent/copyright issue, Semiconductor production equipment industry, Electronics industry, Electronics
Abstract

By a News Reporter-Staff News Editor at Electronics Newsweekly -- A patent application by the inventors Sant, Sanket P. (Fremont, CA); O'Neill, Robert Griffith (Fremont, CA), filed on July 31, [...]

Published
2014

335. Sealing of micromachined cavities using chemical vapor deposition methods: characterization and optimization

Author

Liu, Chang and Tai, Yu-Chong

Subjects
Nanotechnology -- Usage, Chemical vapor deposition -- Methods, Sealing (Technology) -- Methods, Engineering and manufacturing industries, Science and technology
Abstract

This paper presents results of a systematic investigation to characterize the sealing of micromachined cavities using chemical vapor deposition (CVD) methods. We have designed and fabricated a large number and variety of surface-micromachined test structures with different etch-channel dimensions. Each cavity is then subjected to a number of sequential CVD deposition steps with incremental thickness until the cavity is successfully sealed. At etch deposition interval, the sealing status of every test structure is experimentally obtained and the percentage of structures that are sealed is recorded. Four CVD sealing materials have been incorporated in our studies: LPCVD silicon nitride, LPCVD polycrystalline silicon (polysilicon), LPCVD phosphosilicate glass (PSG), and PECVD silicon nitride. The minimum CVD deposition thickness that is required to successfully seal a microstructure is obtained for the first time. For a typical Type-1 test structure that has eight etch channels - each 10 [[micro]meter] long, 4 [[micro]meter] wide, and 0.42 [[micro]meter] tall - the minimum required thickness (normalized with respect to the height of etch channels) is 0.67 for LPCVD silicon nitride, 0.62 for LPCVD polysilicon, 4.5 for LPCVD PSG, and 5.2 for PECVD nitride. LPCVD silicon nitride and polysilicon are the most efficient sealing materials. Sealing results with respect to etch-channel dimensions (length and width) are evaluated (within the range of current design). When LPCVD silicon nitride is used as the sealing material, test structures with the longest (38 [[micro]meter]) and widest (16 [[micro]meter]) etch channels exhibit the highest probability of sealing. Cavities with a reduced number of etch channels seal more easily. For LPCVD PSG sealing, on the other hand, the sealing performance improves with decreasing width hut is not affected by length of etch channels.

Published
1999

336. Deposition of amorphous silicon films by hot-wire chemical vapor deposition

Author

Feenstra, K.F., Schropp, R.E.I., and Van der Weg, W.F.

Subjects
Amorphous substances -- Research, Silicon -- Research, Chemical vapor deposition -- Methods, Physics
Abstract

Device-quality a-Si:H films were deposited through hot-wire chemical vapor deposition. The effects of deposition parameters on the film growth and characteristics were investigated. A heat transport model was developed to correct for the heating of the substrate by the filaments. It was observed that films deposited at high deposition temperatures are under a high compressive stress. The hydrogen incorporation in the layer was affected by hydrogenation of subsurface layers.

Published
1999

337. Genus bets on circuit technology

Author

Reisch, Marc

Subjects
Genus Inc. -- Management, Semiconductor industry -- Management, Chemical vapor deposition -- Methods, Chemicals, plastics and rubber industries, Engineering and manufacturing industries
Published
1991

338. Carbon/carbon, protected/protected

Author

Dietrich, Herbert

Subjects
Silicon carbide -- Production processes, Carbon -- Protection and preservation, Chemical vapor deposition -- Methods, Business, Engineering and manufacturing industries
Abstract

In recognition of the need to develop viable protective coatings for carbon/ carbon (C/C) components, oxidation resistant coatings are being developed using pilot and production scale chemical vapor deposition (CVD) [...]

Published
1991

339. SiO2 coating system debuts for rigid PET

Subjects
Eastapac Co. -- Product information, Plastic containers -- Innovations, Polyethylene terephthalate -- Usage, Chemical vapor deposition -- Methods, Quartz -- Usage, Packaging industry -- Product information, Thin films -- Innovations, Business, Containers and packaging industries
Published
1991

340. Clean grown nanotubes

Author

Ellis, Meagan

Subjects
Nanotubes -- Research, Chemical vapor deposition -- Methods, Business, Chemicals, plastics and rubber industries, University of Warwick -- Works
Published
2008

341. Diamonds are a chemist's best friend

Subjects
Chemical vapor deposition -- Methods, Diamond crystals -- Product development, Diamonds -- Product development, Business, Computers and office automation industries, Carnegie Institution of Washington -- Product development
Abstract

The details on Carnegie Institution, which used chemical vapor deposition methods to develop single-crystal diamond, are presented.

Published
2005

342. Patent Application Titled 'Cvd Apparatus and Cvd Method' Published Online

Subjects
Chemical vapor deposition -- Methods, Patents -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors XU, [...]

Published
2013

345. Patent Application Titled 'Method for Growing White Color Diamonds by Using Diborane and Nitrogen in Combination in a Microwave Plasma Chemical Vapor Deposition System' Published Online

Subjects
Chemical vapor deposition -- Methods, Chemical tests and reagents -- Methods -- Intellectual property, Patents -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Misra, [...]

Published
2013

349. 'PCVD Method and Apparatus' in Patent Application Approval Process

Subjects
Chemical vapor deposition -- Methods, Patents -- Methods, Patent/copyright issue, Government, Political science
Abstract

By a News Reporter-Staff News Editor at Politics & Government Week -- A patent application by the inventors Milicevic, Igor (Helmond, NL); van Stralen, Mattheus Jacobus Nicolaas (Tilburg, NL); Hartsuiker, [...]

Published
2013

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