Zein is one of the most important food compositions as-Generally Recognized As Safe (GRAS). Wet milling was often used to extract the zein from the processing byproducts of corn starch. The current zein is widely applied as the low-value feed protein, due mainly to the low water solubility and the less essential amino acids. A high proportion of hydrophobic amino acids and abundant disulfide bonds can be expected to greatly contribute to the better film-forming property of zein. However, the practical application of zein can be confined to the disordered arrangement in the form of random strands in the aqueous ethanol solution, leading to the unstable structure of zein film. Fortunately, the uniform electric induction assisted with the cold plasma pretreatment can be applied to induce the zein micelles to be self-assembly deposited on the Indium Tin Oxide (ITO) glass substrate using the amphoteric dissociation. Smaller particle size and better electrochemical characteristics can be achieved for the zein film after the cold plasma pretreatment. The deposition efficiency of zein can also be improved during the electric induction process. In this study, an optimal preparation was proposed for the electric-induced deposited zein film that was assisted by plasma pretreatment. Specifically, the plasma pretreatment conditions were set to obtain the proper particle size of zein micelles, with the generation voltage of 65 V, the input current of (1.0±0.2) A, and the treatment duration of 3 min. The influence of electric induction parameters was studied under the treatment condition of the zein concentration (30, 50, 100, 125, and 15.0 mg/mL), pH values (6, 7, 8, 9, and 10), and electric current density (5, 7, 10, 15, and 20 A/m² ). A Box-Behnken experiment was also carried out to optimize the largest deposition rate on the ITO glass substrate. The single factor experiment showed that the deposition rate of zein film increased with the increasing concentration and pH of zein solution. The optimal conditions were achieved as follows: the zein concentration of 139.5 mg/mL, the zein solution pH of 8.17, and the electric current density of 14.3 A/m² . The deposition rate of zein reached 1.120 mg/cm² under the optimal conditions, which was significantly higher than the sample without the plasma pretreatment (0.483 mg/cm² ). It infers that the plasma treatment effectively enhanced the deposition rate of zein during electric induction. Scanning Electron Microscope (SEM) images indicated that smoother and much more uniform surface morphology was achieved in the electric-induced deposited zein film that was assisted by plasma pretreatment, compared with the untreated. Energy Dispersive Spectrum (EDS) analysis showed the In or Si element was not found in the electric-induced deposited zein film with the plasma pretreatment. More importantly, there was a similar profile of Fourier Transform Infrared spectroscopy (FTIR) spectra between the induced and untreated films, indicating no remarkable influence of the electric-induced deposition on the main structure of zein. The secondary structure of the protein was also drawn from the peak analysis of the amide I region (1 600-1 700 cm-1). It was found that the β-turn and random coil were transformed into the much more ordered β-folding and α-helix structure. In conclusion, the finding can lay the theoretical foundations to fabricate the zein film using electric induction. The high-value utilization of zein can be expected in the development of cold plasma in the protein modification field. The microstructure of electric-induced deposited zein film can also be further modified for specific use in the subsequent investigation. [ABSTRACT FROM AUTHOR]