1. Picosecond laser source at 3.4 microns for laser material processing of polymers
- Author
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Florian Elsen, Hans-Dieter Hoffmann, Sebastian Nyga, Anika Röhrig, and Bernd Jungbluth
- Subjects
chemistry.chemical_classification ,Materials science ,business.industry ,Physics::Optics ,Pulse duration ,Polymer ,Laser ,Optical parametric amplifier ,law.invention ,Pulse (physics) ,Wavelength ,Optics ,chemistry ,law ,Physics::Atomic Physics ,business ,Beam (structure) ,Ultrashort pulse laser - Abstract
We present a laser beam source with average output powers of up to 15 W and pulse energies of up to 50 μJ at a wavelength of 3.4 μm based on a frequency converted ultrashort pulse laser. The laser beam source consists of a commercially available ultrashort pulse laser with a pulse duration of 10 ps and a downstream multi-stage optical parametric frequency converter based on large-aperture PPLN crystals. Different output powers, pulse energies, conversion efficiencies and beam qualities are achieved depending on the design of the multi-stage setup. In addition, we present some results of processing experiments on different polymer films obtained with the laser beam source presented here.
- Published
- 2020
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